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Dielectric loss

About: Dielectric loss is a research topic. Over the lifetime, 20296 publications have been published within this topic receiving 349254 citations.


Papers
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Journal ArticleDOI
TL;DR: Li2O-MoO3-B2O3 glasses with different concentrations of CuO (ranging from 0 to 12 ǫ) were prepared by X-ray diffraction, scanning electron microscopy and differential scanning calorimetry Optical absorption, luminescence, ESR, IR and dielectric properties have been investigated as mentioned in this paper.

114 citations

Journal ArticleDOI
TL;DR: In this paper, the authors have grown epitaxial strontium titanate films on lanthanum aluminate substrates at a range of oxygen pressures and substrate temperatures using a microwave ring resonator and a flip-chip technique.
Abstract: We have grown epitaxial strontium titanate films on lanthanum aluminate substrates at a range of oxygen pressures and substrate temperatures. The complex dielectric function was measured as a function of temperature and electric field bias using a microwave ring resonator and a flip-chip technique. The films having the highest dielectric constant were grown with an oxygen pressure of 600 mTorr and showed large grains in the plane of the film. The small-signal dielectric constant of these films could be changed by a factor of 4 by applying an electric field. The films with the highest dielectric constant showed increased losses, but an improved figure of merit for application to tunable circuits.

114 citations

Journal ArticleDOI
Xiaoxiao Chen1
TL;DR: In this paper , a magnetic ferrite CuFe2O4/MoS2 composite was constructed to achieve a wide effective absorption bandwidth (EAB) of 8.16 GHz (9.84 GHz −18 GHz) at 2.3 mm, when the optimum reflection loss is −40.33 dB.

113 citations

Journal ArticleDOI
TL;DR: In this paper, the loss of amorphous hydrogenated silicon nitride (a-SiNx:H) is measured at 30 mK and 5 GHz using a superconducting LC resonator down to energies where a single photon is stored, and analyzed with an independent two-level system defect model.
Abstract: The loss of amorphous hydrogenated silicon nitride (a-SiNx:H) is measured at 30 mK and 5 GHz using a superconducting LC resonator down to energies where a single-photon is stored, and analyzed with an independent two-level system defect model. Each a-SiNx:H film was deposited with different concentrations of hydrogen impurities. We find that quantum-regime dielectric loss tangent tan δ0 in a-SiNx:H is strongly correlated with N–H impurities, including NH2. By slightly reducing x we are able to reduce tan δ0 by approximately a factor of 50, where the best films show tan δ0≃3×10−5.

113 citations

Journal ArticleDOI
TL;DR: In this paper, a chemical co-precipitation method was used to synthesize strontium hexaferrite doped with Zr-Zn to obtain a suitable signal to noise ratio for application in the magnetic recording media.

113 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
2023396
2022863
20211,013
20201,000
20191,097
20181,012