Electrochromic devices

About: Electrochromic devices is a research topic. Over the lifetime, 2599 publications have been published within this topic receiving 74093 citations.

Flexible Molecular Electrochromic Devices Run by Low‐Cost Commercial Cells

Abstract: The present era has seen tremendous demands for low‐cost electrochromic materials for visible‐region multicolor display technology, paper‐based, flexible, and wearable electronic devices, smart windows, and optoelectronic applications. Towards this goal, the authors report large‐scale, high‐yield and robust polyelectrochromic devices fabricated on rigid to flexible ITO substrates comprising novel anthracene containing viologen, (1,1″‐bis(anthracen‐9‐ylmethyl)‐[4,4″‐bipyridine]‐1,1'‐diium bromide, abbreviated as AnV2+), and polythiophene (P3HT). Interestingly, the devices show three states of reversible visible color in response to the applied bias, sub‐second to second switching time (0.7 s/1.6 s), high coloration efficiency (484 cm2/C), and longer cycling stability up to 9,000 s (3,000 switching cycles). Introduction of the anthracene moieties to viologen inhibits the formation of an undesired dimer of cation radicals in response to the applied bias, otherwise the device's color‐switching would be hampered when the bias polarity is reversed. The fabricated electrochromic devices are tested with commercially available low‐cost cells to perform—a unique approach toward practical applications. The computational study facilitates the understanding of experimental results. Alternating current (AC)‐based electrical impedance spectroscopy reveals that P3HT facilitates enhanced charge transfer to AnV2+. This work shows CMOS compatibility and can pave the way for developing cost‐effective flexible and wearable electrochromic devices.

The deposition of coatings on to polymer substrates by planar magnetron sputtering

Abstract: A vacuum deposition system was built enabling flexible polymer sheet, wound on a roll-to-roll transport mechanism, to be coated by any or all of three planar magnetron sputtering sources. Using this machine a large variety of coatings were produced in long lengths onto heat sensitive substrates and with controlled stoichiometry. Within the system the coating was monitored soon after deposition which allowed fast response to changing film properties, a critical factor in the continuous production of high quality coatings. An area of current interest has been the production of large area optical filters, the basis of which is the deposition of thin metal and thin metal oxide films. Of particular interest have been the 'heat mirror' type filters, the transparent conducting oxides and more recently the electrochromic devices. All these have been deposited at high rates onto flexible polyester substrates ostensibly at room temperature. Analysis of the films has been carried out by a variety of techniques in order to establish the precise chemical composition and structure of the films. Once optimum conditions had been established for individual films multilayer filters were produced and their optical performance determined. In the case of the 'heat mirror' type filters their performance was compared to theoretical predictions.

Electrochromic device and preparation method thereof

Abstract: The invention provides a preparation method of an electrochromic device. The method comprises the steps as follows: a conductive substrate and a counter electrode are bonded through an adhesive to form a device groove, and a closed space, which is not filled with the adhesive, between the conductive substrate and the counter electrode forms an empty slot of the device groove; electrochemical polymerization is performed after an electroplating solution is injected into the empty slot of the device groove, and an electroplating film is formed on the surface of the conductive substrate; the electroplating solution left after the electroplating film is formed in the empty slot of the device groove is taken out, then an electrolytic solution is injected into the empty slot of the device groove, and the electrochromic device is obtained. The electroplating solution is added to the designed device groove in advance, electrochemical polymerization is performed in the device groove, the electrochromic device can be prepared in one step, the technology is simple, the electrochromic devices in large size and different shapes can be prepared with the method, introduction of water oxygen and impurities is avoided with the method, and the prepared electrochromic device shows excellent electrochromic performance.

Effect of low temperature treatment of tungsten oxide (WOx) thin films on the electrochromic and degradation behavior

Abstract: This research compares as-synthesized W18O49 sub-stoichiometric bundled nanowires and commercial WO3 nanoparticles, aiming to understand their general electrochromic behavior differences. The effect of low temperature annealing on the electrochromic performance of the tungsten oxide (WOx) thin film samples at 250 to 350 °C was investigated. We elucidate the fundamental aspects of the heat treatment-structure-performance relationship. We have found that the annealing treatment at low temperatures can improve the optical modulation and durability of the WOx thin films, without changing the structure and morphology of the as-synthesized samples. We also discuss the effect on the degradation behavior of electrochromic devices with regards to the Li+ trapping/de-trapping.

Silver alloy target material, thin film and preparation method thereof

Abstract: The invention provides a silver alloy target material, a thin film and a preparation method thereof The component of the silver alloy target material is AgxInyMzQn, wherein the proportion of indium is that y is larger than or equal to 8% and less than or equal to 40% (atomic ratio); M is at least one element of tin, gold, platinum, palladium, niobium, rhodium and ruthenium, wherein z is larger than or equal to 0% and less than or equal to 8% (atomic ratio); and Q is at least one element in the rare earth element, wherein n is larger than or equal to 0% and less than or equal to 3% (atomic ratio), and the content of silver is that x is larger than or equal to 60% (atomic ratio) A silver alloy thin film with excellent heat resistance, adhesive force, conductivity, corrosion resistance andvulcanization resistance can be prepared through magnetron sputtering plating, ion sputtering plating, vacuum evaporation plating or electron beam evaporation by the silver alloy target material, andthe thin film is suitable for the field of reflecting electrode films, liquid crystal displays, optical recording mediums, organic light emitting diodes, electrochromic devices and the like