Topic
Electroless nickel plating
About: Electroless nickel plating is a research topic. Over the lifetime, 1593 publications have been published within this topic receiving 14940 citations.
Papers published on a yearly basis
Papers
More filters
TL;DR: In this paper, the influence of thickness on the performance and morphology of CTA forward-osmosis (FO) membranes was discussed in detail, and the prototype CTA membranes displayed a water flux of 20.2 L m−2 h−1 and a reverse salt transport of 14.6
Abstract: Cellulose triacetate (CTA) forward-osmosis (FO) membranes were prepared via the phase inversion method. The influence of thickness on the performance and morphology of CTA FO membranes was discussed in detail. When the thickness of the membrane was 50.0 ± 0.5 μm (CTA4), the prototype CTA membranes displayed a water flux of 20.2 L m−2 h−1 and a reverse salt transport of 14.6 g m−2 h−1 using 1 mol/L NaCl as the draw solution and deionized water as the feed solution during the FO process at 25 °C. In addition, the high-performance CTA4 FO membranes have been used to process spent electroless nickel plating baths where the water flux could reach 13 L m−2 h−1 and NiSO4·6H2O crystals occurred in the feed solution of the spent electroless nickel plating baths. The recovery rates of NiSO4·6H2O and water from the spent electroless nickel plating baths were 44.54% and 53.53%, respectively. This study focused on improving membrane design for the FO process and finding a new method of waste liquor or wastewater treatment. © 2017 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 2017, 134, 45049.
15 citations
Patent•
18 Oct 2002
TL;DR: In this paper, an electroless nickel plating composition including nickel, a reducing agent, a complexing agent, and an accelerator is described, wherein the accelerator is a mesoionic compound in an amount sufficient to accelerate the rate of deposition of the composition.
Abstract: Disclosed are electroless nickel plating composition including nickel, a reducing agent, a complexing agent, and an accelerator, wherein the accelerator is a mesoionic compound in an amount sufficient to accelerate the rate of deposition the composition
15 citations
TL;DR: In this paper, thin metallic nickel deposits on porous silicon (PS) surfaces from electroless nickel plating bath have been obtained by the laser-induced photochemical metallization method.
14 citations
TL;DR: In this article, different surfactants, mainly anionic surfactant, Sodium Dodecyl Sulfate (SDS) and cationic surf actant, Cetyl Trimethyl Ammonium Bromide (CTAB), are used to explore their possible effects on this electroless process.
14 citations