Showing papers on "Electron-beam lithography published in 1971"
TL;DR: In this paper, a beam profile is obtained by exposing a long line of controlled width in a thick layer of polymethyl methacrylate resist, which can be examined in the scanning electron microscope.
Abstract: Electron penetration and scattering in solids can be measured by electron beam exposure of a positive electron resist. The beam profile is obtained by exposing a long line of controlled width in a thick layer of poly‐(methyl methacrylate) resist. The cross section of the developed line which can be examined in the scanning electron microscope represents the beam density profile.
38 citations