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Electron-beam lithography

About: Electron-beam lithography is a research topic. Over the lifetime, 8982 publications have been published within this topic receiving 143325 citations. The topic is also known as: e-beam lithography.


Papers
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Journal ArticleDOI
TL;DR: A novel fabrication approach based on nanostencil lithography for high-throughput fabrication of engineered infrared plasmonic nanorod antenna arrays and it is shown that reflectance spectra of these antenna arrays are comparable to that of arrays fabricated by electron beam lithography.
Abstract: The introduction of high-throughput and high-resolution nanofabrication techniques operating at low cost and low complexity is essential for the advancement of nanoplasmonic and nanophotonic fields. In this paper, we demonstrate a novel fabrication approach based on nanostencil lithography for high-throughput fabrication of engineered infrared plasmonic nanorod antenna arrays. The technique relying on deposition of materials through a shadow mask enables plasmonic substrates supporting spectrally sharp collective resonances. We show that reflectance spectra of these antenna arrays are comparable to that of arrays fabricated by electron beam lithography. We also show that nanostencils can be reused multiple times to fabricate a series of infrared nanoantenna arrays with identical optical responses. Finally, we demonstrate fabrication of plasmonic nanostructures in a variety of shapes with a single metal deposition step on different substrates, including nonconducting ones. Our approach, by enabling the reu...

223 citations

Book
01 Jan 1989
TL;DR: A brief history of resists negative photoresists can be found in this paper, where a review of photophysics and photochemistry in solid polymers photoinitiated polymerization positive resists based on diazonaphthoquinones is presented.
Abstract: A brief history of resists negative photoresists aspects of photophysics and photochemistry in solid polymers photoinitiated polymerization positive resists based on diazonaphthoquinones the rudiments of imaging science deep-UV lithography electron beam lithography X-ray and ion beam lithographies multilayer techniques and plasma processing.

220 citations

Reference BookDOI
Bruce W. Smith, Kazuaki Suzuki1
01 May 2020
TL;DR: In this article, the authors present an overview of optical steppers and scanners for advanced micro-lithography systems and their applications in critical-dimensional metrology for integrated-circuit technology.
Abstract: EXPOSURE SYSTEM System Overview of Optical Steppers and Scanners Michael S. Hibbs Optical Lithography Modeling Chris A. Mack Optics for Photolithography Bruce W. Smith Excimer Laser for Advanced Microlithography Palash Das Alignment and Overlay Gregg M. Gallatin Electron Beam Lithography System Kazuaki Suzuki X-Ray Lithography Takumi Ueno EUV Lithography Stefan Wurm and Charles Gwyn Imprint Lithography Douglas J. Resnick RESISTS AND PROCESSING Chemistry of Photoresist Materials Takumi Ueno and Robert D. Allen Resist Processing Bruce W. Smith Multilayer Resist Technology Bruce W. Smith and Maureen Hanratty Dry Etching of Photoresists Roderick R. Kunz METROLOGY AND NANOLITHOGRAPHY Critical-Dimensional Metrology for Integrated-Circuit Technology Herschel M. Marchman, Gian Lorusso, Mike Adel, and Sanjay Yedur Electron Beam Nanolithography Elizabeth A. Dobisz, Zvonimir Z. Bandic, and Martin C. Peckerar Index

219 citations

Journal ArticleDOI
TL;DR: This demonstration of lateral heterojunction arrays within a monolayer crystal is an essential step for the integration of two-dimensional semiconductor building blocks with different electronic and optoelectronic properties for high-density, ultrathin devices.
Abstract: The formation of semiconductor heterojunctions and their high-density integration are foundations of modern electronics and optoelectronics. To enable two-dimensional crystalline semiconductors as building blocks in next-generation electronics, developing methods to deterministically form lateral heterojunctions is crucial. Here we demonstrate an approach for the formation of lithographically patterned arrays of lateral semiconducting heterojunctions within a single two-dimensional crystal. Electron beam lithography is used to pattern MoSe2 monolayer crystals with SiO2, and the exposed locations are selectively and totally converted to MoS2 using pulsed laser vaporization of sulfur to form MoSe2/MoS2 heterojunctions in predefined patterns. The junctions and conversion process are studied by Raman and photoluminescence spectroscopy, atomically resolved scanning transmission electron microscopy and device characterization. This demonstration of lateral heterojunction arrays within a monolayer crystal is an essential step for the integration of two-dimensional semiconductor building blocks with different electronic and optoelectronic properties for high-density, ultrathin devices. Lateral heterojunctions between two-dimensional semiconductor crystals are essential building blocks for electronic devices. Here, the authors utilize electron-beam lithography and selective conversion to simultaneously fabricate arrays of molybdenum diselenide–molybdenum disulfide heterojunctions.

216 citations

Journal ArticleDOI
TL;DR: In this paper, the nano-print process is done in a single layer as well as in a multilayer resist scheme with subsequent O2-plasma etching and metal lift-off.
Abstract: We demonstrate the nanoimprint lithography (NIL) technique with sub 100 nm resolution, on 6 in. Si substrates. The pattern transfer is performed using a specially designed NIL machine optimized to achieve a very high degree of parallelism between stamp and substrate. The stamp is made with the help of electron beam lithography and Ni electroplating achieving features below 100 nm in size. The nanoimprint process is done in a single layer as well as in a multilayer resist scheme with subsequent O2-plasma etching and metal lift-off.

207 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
202384
2022163
2021108
2020161
2019174
2018204