Topic
Electron-beam lithography
About: Electron-beam lithography is a research topic. Over the lifetime, 8982 publications have been published within this topic receiving 143325 citations. The topic is also known as: e-beam lithography.
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TL;DR: In this paper, the enhancement of fluorescence by Ag nanopillars on a semiconducting substrate in which the pillar size, shape, and spacing is varied systematically using electron-beam lithography was studied.
Abstract: We study the enhancement of fluorescence by Ag nanopillars on a semiconducting substrate in which the pillar size, shape, and spacing is varied systematically using electron-beam lithography. Local maxima in the enhancement versus lateral size, as large as a factor of ∼20 are observed, and vary both with the shape of the pillars and the wavelength of the excitation. We find that the size, shape, and spacing dependence is in qualitative agreement with a model based upon resonant coupling with particle plasmon polaritons. We also find increased enhancement for particle shapes producing high local electric fields.
48 citations
TL;DR: In this article, a hybrid Monte Carlo model is used to calculate the generation and subsequent spatial trajectory of each secondary electron in the target and the three-dimensional spatial distribution of energy dissipation by such fast secondary electrons is shown to be the fundamental resolution limit for electron beam lithography with high voltage beams (100 keV) and thin film polymer targets.
Abstract: Computer simulation of high energy primary electron scattering and subsequent generation of ‘‘fast’’ secondary electrons in thin film targets is demonstrated with Monte Carlo techniques. A hybrid Monte Carlo model is utilized to calculate the generation and subsequent spatial trajectory of each secondary electron in the target. The three‐dimensional spatial distribution of energy dissipation by such fast secondary electrons is shown to be the fundamental resolution limit for electron beam lithography with high voltage beams (100 keV) and thin film polymer targets. The dependence of resolution on beam voltage and film thickness is presented, and quantitative comparison is made between these new Monte Carlo calculations and the limited amount of experimental data available in the scientific literature.
47 citations
TL;DR: In this article, free-standing SiGe/Si microtubes, microneedles, helical coils, bridges and sub-micron vertical rings have been fabricated from elastically strained SiGe /Si heterostructures grown by ultra-high vacuum chemical vapor deposition.
Abstract: Free-standing SiGe/Si microtubes, microneedles, helical coils, bridges and submicron vertical rings have been fabricated from elastically strained SiGe/Si heterostructures grown by ultra-high vacuum chemical vapor deposition. Three-dimensional micro- and nano-objects have been formed by self-scrolling after electron beam lithography, reactive ion etching and wet selective etching. Vertical rings with very smooth sidewalls may have applications in hot embossing lithography as well as in microelectronics and micromechanics. By adjusting the SiGe/Si bilayer thickness or Ge concentration, the diameter of tube or ring could be decreased into the nanometer scale.
47 citations
TL;DR: Scanning probe lithography is applied to pattern fluid lipid membranes on a solid borosilicate substrate and the effect of the probe tip on the membrane can be regulated by toggling the pH of the surrounding solution.
Abstract: Scanning probe lithography (SPL) is applied to pattern fluid lipid membranes on a solid borosilicate substrate. Grids of metal lines, prepatterned onto the substrate by electron beam lithography, serve to partition the supported membrane into an array of isolated fluid pixels. By toggling the pH of the surrounding solution, the effect of the probe tip on the membrane can be regulated. Alkaline conditions favor membrane removal, while neutral pH favors membrane deposition. Arbitrary membrane patterns with spatial dimensions limited by the underlying grid size can be constructed by sequential SPL membrane removal followed by refill with a different membrane type. In the present study, bilayers of unique composition fill 1 x 1 mum corrals and were positioned 100 nm apart.
47 citations
TL;DR: In this article, three-terminal single-electron transistor devices utilizing Al∕Al2O3 gate electrodes were developed for the study of electron transport through individual single-molecule magnets (SMMs).
Abstract: Three-terminal single-electron transistor devices utilizing Al∕Al2O3 gate electrodes were developed for the study of electron transport through individual single-molecule magnets (SMMs). The devices were patterned via multiple layers of optical and electron beam lithography. Electromigration induced breaking of the nanowires reliably produces 1–3nm gaps between which the SMM can be situated. Conductance through a single Mn12 (3-thiophenecarboxylate) displays the Coulomb blockade effect with several excitations within ±40meV.
47 citations