Topic
Electron-beam lithography
About: Electron-beam lithography is a research topic. Over the lifetime, 8982 publications have been published within this topic receiving 143325 citations. The topic is also known as: e-beam lithography.
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TL;DR: In this paper, the authors used direct-write electron beam lithography and a multistep masking and milling process to pattern islands with feature sizes down to 0.1 μm out of a 200 A thick polycrystalline cobalt film.
45 citations
TL;DR: C-shaped ridge apertures are used in contact nanolithography to achieve nanometer scale resolution and Lithography results demonstrated that holes as small as 60 nm can be produced in the photoresist by illuminating the aperture with a 355 nm laser beam.
Abstract: C-shaped ridge apertures are used in contact nanolithography to achieve nanometer scale resolution. Lithography results demonstrated that holes as small as 60 nm can be produced in the photoresist by illuminating the apertures with a 355 nm laser beam. Experiments are also performed using comparable square and rectangular apertures. Results show enhanced transmission and light concentration of C apertures compared to the apertures with regular shapes. Finite difference time domain simulations are used to design the apertures and explain the experimental results.
45 citations
TL;DR: In this article, the impact of various ZnO templates on the alignment and geometry of vertical nanowire (NW) arrays was investigated, and it was shown that the alignment, crystal structure, and geometry were dictated by the crystal structure of the underlying ZNO, while the influence of surface roughness was negligible.
Abstract: The impact of various ZnO templates on the alignment and geometry of wet-chemically grown vertical ZnO nanowire (NW) arrays was investigated. The NWs were seeded at nucleation windows which were patterned in poly(methyl methacrylate)-coated ZnO surfaces using electron beam lithography. This growth approach was shown to have the potential for low-cost and low-temperature fabrication of regular, highly aligned, and transparent NW arrays with tunable conductivities on cheap substrates with precise engineering of the NW dimensions and positioning. The compared ZnO templates included a single crystal ZnO substrate, an epitaxial film on a c-sapphire substrate, and polycrystalline films on Si(111), Si(100), and Pt/c-sapphire. Scanning electron microscopy and X-ray diffraction revealed that the alignment, crystal structure, and geometry of the NW arrays were dictated by the crystal structure of the underlying ZnO, while the influence of the surface roughness was negligible. Thus, the choice of seed layer crystall...
45 citations
TL;DR: In this paper, the optical properties of patterned quantum dot (QD) nanostructures were obtained by direct electron beam lithography on QD films and time resolved photoluminescence measurements showed that optical properties were retained after cross-linking.
Abstract: Patterned quantum dot (QD) nanostructures were prepared by direct electron beam lithography on QD films. Time resolved photoluminescence measurements show that the optical properties of these QDs were retained after cross-linking.
44 citations
TL;DR: In this article, the main scattering mechanisms governing the transport of electrons in PMMA in an energy domain ranging from the energy of the primary electron beam down to few hundreds of meV are identified.
Abstract: The main scattering mechanisms governing the transport of electrons in PMMA in an energy domain ranging from the energy of the primary electron beam down to few hundreds of meV are identified. A quantitative Monte Carlo model for the emission of secondary electrons is developed to be applied for critical dimensions extraction from high-resolution scanning electron microscopy (SEM) images. Selected results are presented, which demonstrate the accuracy of the proposed approach.
44 citations