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Electron-beam lithography

About: Electron-beam lithography is a research topic. Over the lifetime, 8982 publications have been published within this topic receiving 143325 citations. The topic is also known as: e-beam lithography.


Papers
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Journal ArticleDOI
TL;DR: In this paper, photoluminescence from single silicon quantum dots have been recorded and spectrally resolved at room temperature using electron-beam lithography and spectroscopy.
Abstract: Photoluminescence (PL) from single silicon quantum dots have been recorded and spectrally resolved at room temperature. The Si nanocrystals (NCs) were fabricated using electron-beam lithography and ...

177 citations

Journal ArticleDOI
TL;DR: In this paper, an approach where the match of two different length scales, i.e., pattern from self-assembly of block copolymer micelles, allow the grouping of nanometer-sized gold clusters in very small numbers in even aperiodic pattern and separation of these groups at length scales that are not accessible by pure selfassembly was introduced.
Abstract: This paper introduces an approach where the match of two different length scales, i.e., pattern from self-assembly of block copolymer micelles ( 50 nm), allow the grouping of nanometer-sized gold clusters in very small numbers in even aperiodic pattern and separation of these groups at length scales that are not accessible by pure self-assembly. Thus, we could demonstrate the grouping of Au nanoclusters in different geometries such as squares, rings, or spheres.

174 citations

Journal ArticleDOI
TL;DR: In this paper, a single layer of self-assembled polystyrene spheres was first uniformly deposited on a silicon wafer as a mask, and then electron beam vaporization was used to deposit a nickel layer through the mask.
Abstract: Large periodic arrays of carbon nanotubes have been grown by plasma-enhanced hot filament chemical vapor deposition on periodic arrays of nickel dots that were prepared by polystyrene nanosphere lithography. A single layer of self-assembled polystyrene spheres was first uniformly deposited on a silicon wafer as a mask, and then electron beam vaporization was used to deposit a nickel layer through the mask. The size of and spacing between the nickel dots are tunable by varying the diameter of the polystyrene spheres, which consequently determines the diameter and site density of carbon nanotubes. The technique can be scaled up at much lower cost than electron beam lithography.

173 citations

Journal ArticleDOI
TL;DR: In this paper, single-wall carbon nanotubes (SWNTs) suspended in an aqueous solution have been placed selectively between two metal electrodes separated by a few tens of nanometers.
Abstract: Single-wall carbon nanotubes (SWNTs) suspended in an aqueous solution have been placed selectively between two metal electrodes separated by a few tens of nanometers. After the initial patterning of the metal electrodes by electron beam lithography, no further fine-line lithography steps are necessary to achieve directed placement of SWNTs at these dimensions. An ac bias is applied between the two electrodes and the “nanoscale wiring” is completed within seconds. An additional advantage of using ac bias is the enhancement for selectively placing SWNTs between the electrode gap over competing contaminant species in the solution.

171 citations

Journal ArticleDOI
TL;DR: In this paper, a photolithography-based method capable of size reduction to produce sub-10nm Si nanowire arrays on a wafer scale is described, by conformally depositing a material (silicon oxide or silicon) that...
Abstract: A photolithography-based method capable of size reduction to produce sub-10-nm Si nanowire arrays on a wafer scale is described. By conformally depositing a material (silicon oxide or silicon) that...

171 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
202384
2022163
2021108
2020161
2019174
2018204