Electron-beam lithography

About: Electron-beam lithography is a research topic. Over the lifetime, 8982 publications have been published within this topic receiving 143325 citations. The topic is also known as: e-beam lithography.

Plasmonic behaviors of gold dimers perturbed by a single nanoparticle in the gap

Abstract: Modulation of resonance modes of plasmonic nanostructures at a single nanostructure level is of great importance for the development of integrated photonic chips. Recent progress of the fabrication techniques including double electron beam lithography, direct laser printing, and electron beam induced deposition has allowed the local fabrication of sub-50 nm size nanoparticles (NPs) of various materials, which provides a potential experimental realization of local impact on plasmonic behaviors of single nanostructures. In this article, we theoretically investigate that the presence of a single NP in the midgap may give rise to the excitation of new resonance modes and/or large spectral shifts of resonance modes for different plasmonic dimers (gold bowtie, nanodisk and nanorod dimers), therefore resulting in the modification of the far-field and near-field optical properties. The modification can be controlled by changing the deposition position, particle size, and material composition of the single NP. Moreover, our calculations imply that the plasmonic dimers perturbed locally by a single NP of the metal-insulator phase transition material (vanadium dioxide) in the gap can potentially act as very effective optical switch components in future photonic chips.

Gray-tone lithography using an optical diffuser and a contact aligner

Abstract: This paper describes a simple method for the three-dimensional (3D) microfabrication of complex high-aspect structures in a one mask lithography process. The method relies on an unconventional way of performing gray-tone lithography. The main idea is to randomize the collimated light by using an optical diffuser to generate intensity distributions in the photoresist. The resist topography is determined by the density of open and opaque squares in the photomask. The resulting 3D resist is then transferred into 3D silicon structures by using reactive ion etching and deep reactive ion etching.

Fabrication of Poly(ethylene glycol) Hydrogel Structures for Pharmaceutical Applications using Electron beam and Optical Lithography

Abstract: Soft-polymer based microparticles are currently being applied in many biomedical applications, ranging from bioimaging and bioassays to drug delivery carriers. As one class of soft-polymers, hydrogels are materials, which can be used for delivering drug cargoes and can be fabricated in controlled sizes. Among the various hydrogel-forming polymers, poly(ethylene glycol) (PEG) based hydrogel systems are widely used due to their negligible toxicity and limited immunogenic recognition. Physical and chemical properties of particles (i.e., particle size, shape, surface charge, and hydrophobicity) are known to play an important role in cell-particle recognition and response. To understand the role of physicochemical properties of PEG-based hydrogel structures on cells, it is important to have geometrically precise and uniform hydrogel structures. To fabricate geometrically uniform structures, we have employed electron beam lithography (EBL) and ultra-violet optical lithography (UVL) using PEG or PEG diacrylate polymers. These hydrogel structures have been characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM), optical microscopy, and attenuated total reflection Fourier-transform infrared spectroscopy (ATR-FTIR) confirming control of chemistry, size, and shape.