Topic
Electron-beam lithography
About: Electron-beam lithography is a research topic. Over the lifetime, 8982 publications have been published within this topic receiving 143325 citations. The topic is also known as: e-beam lithography.
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TL;DR: In this article, the authors demonstrate that gold nanostructures can be fabricated using aliphatic and aromatic thiol self-assembled monolayers as positive and negative electron beam resists.
37 citations
TL;DR: In this article, the resolution of focused ion beam (FIB) lithography has been studied by proximity effect measurement and fine pattern fabrication, and a 0.1 μm line pattern according to the gap between square and line patterns was achieved.
Abstract: The resolution of focused ion beam (FIB) lithography has been studied by proximity effect measurement and fine pattern fabrication. In the proximity effect measurement, a 0.1 μm line pattern, according to the gap between square and line patterns, could be achieved. Moreover, 0.1 μm line and space poly(methylmethacrylate) patterns and 0.1 μm linewidth novolak based negative resist could be fabricated at 1×1013 and 2×1012 ions/cm2 dose by 260 keV Be++ FIB with 0.1 μm beam diameter, respectively.
37 citations
Patent•
24 Jan 2003TL;DR: In this paper, an electron beam lithography on selected portions of a substrate having a resist covered surface is described, which consists of a plurality of nanoscale electron emitters for emitting directional beams of electrons and, for each emitter, a directional control element to direct the emitted beam toward the selected portions.
Abstract: In accordance with the present invention, apparatus for performing electron beam lithography on selected portions of a substrate having a resist covered surface comprises a plurality of nanoscale electron emitters for emitting directional beams of electrons and, for each emitter, a directional control element to direct the emitted beam toward the selected portions. In a preferred embodiment the emitters comprise carbon nanotubes, and the directional control elements comprise micro-electro-mechanical disks in a two-dimensional array. In an alternative embodiment the directional control elements are electrodes.
37 citations
TL;DR: In this article, the authors measured the line-edge roughness of resist features and found that resist near the substrate is smoother than resist at the top surface of the resist feature.
Abstract: As critical dimensions of resist features shrink, roughness of the features may contribute significantly to the variation in critical dimension. Measuring and understanding the causes of this roughness will become increasingly important with smaller sizes. To date, mainly two techniques have been used to measure the roughness: atomic force microscopy (AFM) and scanning electron microscopy (SEM). Topdown SEM measurements provide an easy and expedient measure of the variation in the profile of the resist feature. These measurements are often called “line-edge roughness” (LER). AFM measurements are considerably more time consuming, but provide information on the entire sidewall surface of the resist, rather than just the profile in line-edge roughness. Our recent AFM measurements on the positive-tone resist APEX-E and UV5 have shown that the sidewall roughness of the resist is depth dependent; resist near the substrate is smoother than resist at the top surface of the resist. For instance, APEX-E may have a ...
37 citations
TL;DR: In this paper, a combination of electron beam lithography and reactive ion etching using CF4/O2 followed by CH4/H2/O 2 has been used to fabricate submicron and micron sized elements from magnetic thin films.
Abstract: Lithographic and dry etching techniques have been used to fabricate submicron and micron sized elements from magnetic thin films. Through a combination of electron beam lithography and reactive ion etching using CF4/O2 followed by CH4/H2/O2, well defined elements with lateral dimensions as small as 24 nm have been produced. The films were deposited on thin electron‐transparent Si3N4 membranes so that the structural and micromagnetic properties of the elements could be studied by transmission electron microscopy. Lorentz microscopy on micron sized permalloy elements has confirmed that the magnetic integrity is maintained after patterning and a comparison with similar sized elements produced using a lift off route is given.
37 citations