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Electron-beam lithography

About: Electron-beam lithography is a research topic. Over the lifetime, 8982 publications have been published within this topic receiving 143325 citations. The topic is also known as: e-beam lithography.


Papers
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Journal ArticleDOI
TL;DR: In this article, the negative electron beam resist hydrogen silsesquioxane (HSQ) was used as an etch mask for an underlying metal stack and then removed by ion milling.

36 citations

Patent
03 Oct 2000
TL;DR: In this article, a method and apparatus for controlling beam emittance by placing a quadrupole lens array in a drift space of an illumination system component was proposed, which can permit independent control of beam current and beam emission, which is beneficial in a Scalpel illumination system.
Abstract: A method and apparatus for controlling beam emittance by placing a quadrupole lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The quadrupole lens array may be three or more mesh grids or a combination of grids and continuous foils. The quadrupole lens array forms a multitude of microlenses resembling an optical “fly's eye” lens. The quadrupole lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.

36 citations

Journal ArticleDOI
TL;DR: Using two levels of electron beam lithography, vapor phase deposition techniques, and FIB etching, an electrostatic Boersch phase plate was fabricated for contrast enhancement of weak phase objects in a transmission electron microscope.

36 citations

Journal ArticleDOI
TL;DR: The use of lowvoltage electron beam lithography to reduce proximity effects, improve throughput, and reduce substrate damage caused to underlying materials has been investigated in this paper, where various films of PMMA were exposed with a field emission scanning electron microscope adapted with blanking capability and a 16 bit resolution beam control package.
Abstract: The use of low‐voltage electron beam lithography to reduce proximity effects, improve throughput, and reduce substrate damage caused to underlying materials has been investigated. Various films of PMMA were exposed with a field emission scanning electron microscope adapted with blanking capability and a 16 bit resolution beam control package. The exposure voltages used were from 1 to 15 keV with probe sizes of ≤150 to ≤70 A, respectively. The dose latitude or working dose range was determined for each voltage on film thicknesses of 0.05, 0.18, and 0.38 μm poly(methylmethacrylate). Optimum beam voltage for a particular thickness which maximizes the energy deposited within the resist has been approximated using Monte Carlo modeling and verified experimentally. Atomic force microscopy showed that at lower voltages the dose required to properly expose a feature is relatively low and as beam voltage increases, the dose required to expose a given area increases. This data also verifies the fact that if the expo...

36 citations

Journal ArticleDOI
TL;DR: In this article, a very uniform multiple reflector microcavity structure was fabricated by electron beam (EB) lithography and selective wet chemical etching for low threshold current operation.
Abstract: We propose and demonstrate a new type of semiconductor laser having multiple reflector microcavities for the purpose of low threshold current operation. Very uniform multiple reflector microcavity structure was fabricated by electron beam (EB) lithography and selective wet chemical etching. Due to multiple reflection effect, threshold current density as low as 310 A/cm/sup 2/ (threshold current of 30 mA) was obtained at room temperature with the total cavity length of 64 /spl mu/m and the cavity width of 200 /spl mu/m. >

35 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
202384
2022163
2021108
2020161
2019174
2018204