Topic
Electron-beam lithography
About: Electron-beam lithography is a research topic. Over the lifetime, 8982 publications have been published within this topic receiving 143325 citations. The topic is also known as: e-beam lithography.
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TL;DR: Carbon nanotube field-effect transistors with sub-20 nm long channels and on/off current ratios of >10(6) are demonstrated and display on-currents in excess of 15 microA for drain-source biases of only 0.4 V.
Abstract: Carbon nanotube field-effect transistors with sub 20 nm long channels and on/off current ratios of > 1000000 are demonstrated. Individual single-walled carbon nanotubes with diameters ranging from 0.7 nm to 1.1 nm grown from structured catalytic islands using chemical vapor deposition at 700 degree Celsius form the channels. Electron beam lithography and a combination of HSQ, calix[6]arene and PMMA e-beam resists were used to structure the short channels and source and drain regions. The nanotube transistors display on-currents in excess of 15 microA for drain-source biases of only 0.4 Volt.
118 citations
TL;DR: In this paper, plasmonic color filters were integrated on the top surface of a complementary metal oxide semiconductor (CMOS) image sensor (CIS) using electron beam lithography and dry etch.
Abstract: Multi-pixel, 4.5 × 9 μm, plasmonic colour filters, consisting of periodic subwavelength holes in an aluminium film, were directly integrated on the top surface of a complementary metal oxide semiconductor (CMOS) image sensor (CIS) using electron beam lithography and dry etch. The 100 × 100-pixel plasmonic CIS showed full colour sensitivities across the visible range determined by a photocurrent measurement. The filters were fabricated in a simple process utilising a single lithography step. This is to be compared with the traditional multi-step processing when using dye-doped polymers. The intrinsic compatibility of these plasmonic components with a standard CMOS process allows them to be manufactured in a metal layer close to the photodiodes. The incorporation of such plasmonic components may in the future enable the development of advanced CIS with low cost, low cross-talk and increased functionality.
118 citations
TL;DR: This review summarizes the use of electron beam (e-beam) lithography to pattern biomolecules on surfaces for tissue engineering applications and focuses on approaches that employ poly(ethylene glycol) (PEG) resists.
Abstract: This review summarizes the use of electron beam (e-beam) lithography to pattern biomolecules on surfaces. The focus is on approaches that employ poly(ethylene glycol) (PEG) resists. Overview of the different strategies used, including ablation of self-assembled monolayers and cross-linking of PEG, is provided. Subsequent use of surfaces to immobilize cells for tissue engineering applications is summarized.
118 citations
TL;DR: In this paper, the authors used electron beam lithography, reactive ion etching, and wet chemical etching steps followed by a drying procedure to obtain the helical angle, chirality, pitch and diameter of the hybrid helical nanobelts.
Abstract: Helical nanobelts of SiGe/Si and SiGe/Si/Cr are fabricated by rolling up strained thin heterostructures. The fabrication involved electron beam lithography, reactive ion etching, and wet chemical etching steps followed by a drying procedure. All parameters of the helical nanobelts, namely their helical angle, chirality, pitch and diameter, are controllable in a reproducible fashion. The ease of fabrication of SiGe/Si and hybrid helical nanobelts opens new paths for the fabrication technology of micro- or nanoscale sensors, transducers, resonators and cylindrical shaped micro-capacitors.
118 citations
TL;DR: In this paper, a new electron beam lithography process was used to produce uniform arrays of subwavelength apertures with diameters in the range of 60-100nm.
Abstract: Metallic subwavelength apertures can be used in epi-illumination fluorescence to achieve focal volume confinement. Because of the near field components inherent to small metallic structures, observation volumes are formed that are much smaller than the conventional diffraction limited volume attainable by high numerical aperture far field optics (circa a femtoliter). Observation volumes in the range of 10−4fl have been reported previously. Such apertures can be used for single-molecule detection at relatively high concentrations (up to 20μM) of fluorophores. Here, we present a novel fabrication of metallic subwavelength apertures in the visible range. Using a new electron beam lithography process, uniform arrays of such apertures can be manufactured efficiently in large numbers with diameters in the range of 60–100nm. The apertures were characterized by scanning electron microscopy, optical microscopy, focused ion beam cross sections/transmission electron microscopy, and fluorescence correlation spectrosc...
117 citations