Topic
Electron-beam lithography
About: Electron-beam lithography is a research topic. Over the lifetime, 8982 publications have been published within this topic receiving 143325 citations. The topic is also known as: e-beam lithography.
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TL;DR: This work investigated electron-beam lithography with an aberration-corrected scanning transmission electron microscope and achieved 2 nm isolated feature size and 5 nm half-pitch in hydrogen silsesquioxane resist.
Abstract: We investigated electron-beam lithography with an aberration-corrected scanning transmission electron microscope. We achieved 2 nm isolated feature size and 5 nm half-pitch in hydrogen silsesquioxane resist. We also analyzed the resolution limits of this technique by measuring the point-spread function at 200 keV. Furthermore, we measured the energy loss in the resist using electron-energy-loss spectroscopy.
381 citations
TL;DR: The large tolerance on dimensions and the empty space confined by nanoholes suggest promise for their use as a functional component in sensing, spectroscopy, and photonic devices.
Abstract: Surface-enhanced Raman scattering (SERS) on gold nanohole and nanodisk arrays with precisely controlled size and spacing fabricated via electron beam lithography was investigated. These nanostructures exhibit strong SERS signals at 785 nm excitation but not at 514 nm. When the edge-to-edge distance is maintained, enhancement increases for nanoholes but decreases for nanodisks as diameter is increased. It is shown that the observed enhancement results from the local surface plasmon resonance wavelength shifts to the near-infrared regime as nanohole diameter increases. The large tolerance on dimensions and the empty space confined by nanoholes suggest promise for their use as a functional component in sensing, spectroscopy, and photonic devices.
363 citations
TL;DR: This study has engineered optical nanosensors by the combined approach of negative resist, electron beam lithography, and reactive ion etching to form highly reproducible arrays of gold dimers in which the near-field coupling in their subwavelength gap enables for scaling the sensing volume down to the single-protein scale.
Abstract: In this study, we report on ultrasensitive protein detection with lithographically prepared plasmonic nanostructures. We have engineered optical nanosensors by the combined approach of negative resist, electron beam lithography, and reactive ion etching to form highly reproducible arrays of gold dimers in which the near-field coupling in their subwavelength gap enables for scaling the sensing volume down to the single-protein scale. In good agreement with recent theoretical predictions, the dimer geometry offers enhanced sensitivity compared to isolated particles for the detection of both small organic molecules and proteins. Beyond, by exploiting size exclusion, we are capable of monitoring the number of proteins able to bind across the gap region through the precise engineering of the structures coupled to the selective binding of a surface-assembled monolayer and covalent attachment of the protein.
351 citations
TL;DR: In this article, the authors presented electrical measurements of single Au and CdSe nanocrystals, which were fabricated using a hybrid scheme which combines electron beam lithography and wet chemistry to bind nanocrystal in tunneling contact between two closely spaced metallic leads.
Abstract: We present electrical measurements of single Au and CdSe nanocrystals. The devices are fabricated using a hybrid scheme which combines electron beam lithography and wet chemistry to bind nanocrystals in tunneling contact between two closely spaced metallic leads. The current–voltage characteristics of these devices exhibit a Coulomb staircase with a charging energy of ∼50 meV. This technique is readily adapted to the study of a host of nanocrystals made by solution chemistry.
341 citations
TL;DR: It is demonstrated that physical manipulation of the PDMS post-nTP can be used to alter morphology, e.g., to change internanodisk spacing, adding the potential to scale-up regular morphology substrates by a stamp-and-repeat methodology.
Abstract: The development of quantitative, highly sensitive surface-enhanced Raman spectroscopy (SERS) substrates requires control over size, shape, and position of metal nanoparticles. Despite the fact that SERS has gained the reputation as an information-rich spectroscopy for detection of many classes of analytes, in some isolated instances down to the single molecule detection limit, its future development depends critically on techniques for nanofabrication. Herein, an unconventional nanofabrication approach is used to produce efficient SERS substrates. Metallic nanopatterns of silver disks are transferred from a stamp onto poly(dimethysiloxane) (PDMS) to create nanocomposite substrates with regular periodic morphologies. The stamp with periodic arrays of square, triangular, and elliptical pillars is created via electron beam lithography (EBL) of ma-N 2403 resist. A modified cyclodextrin is thermally evaporated onto the stamp to overcome the adhesive nature of the EBL resist and to function as a releasing layer...
341 citations