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Electron-beam lithography

About: Electron-beam lithography is a research topic. Over the lifetime, 8982 publications have been published within this topic receiving 143325 citations. The topic is also known as: e-beam lithography.


Papers
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Journal ArticleDOI
TL;DR: In this article, a catalyst dot pattern for carbon nanofiber growth is formed on the surface of the Tipless cantilevers using electron beam lithography, and the growth of carbon fiber is performed in a direct-current plasma-enhanced chemical vapor deposition reactor.
Abstract: Carbon nanofibers are grown on tipless cantilevers as probe tips for scanning probe microscopy A catalyst dot pattern for carbon nanofiber growth is formed on the surface of the tipless cantilevers using electron beam lithography, and the growth of carbon nanofibers is performed in a direct-current plasma-enhanced chemical vapor deposition reactor Atomic force surface imaging and magnetic force-gradient imaging have been demonstrated using these probe tips

71 citations

Journal ArticleDOI
Burak Derkus1
TL;DR: Three different type of microengineered sensing devices which are developed using micro/nano-patterning techniques, microfluidic technology, and microelectromechanics system based technology are focused on.

71 citations

Journal ArticleDOI
Bin Ai1, Ye Yu1, Helmuth Möhwald2, Gang Zhang1, Bai Yang1 
TL;DR: The introduction of colloidal lithography provides not only efficient fabrication processes but also plasmonic films with unique nanostructures, which are difficult to be fabricated by conventional lithography techniques.

71 citations

Journal ArticleDOI
TL;DR: In this paper, the authors describe the nanofabrication of the first 3D photonic crystals with a forbidden photonic bandgap lying in the near infrared region of the electromagnetic spectrum, 1.1 μm < λ < 1.5 μm, just beyond the electronic band edge of GaAs.
Abstract: We describe the nanofabrication of the first three-dimensional (3-d) photonic crystals with a forbidden photonic bandgap lying in the near infrared region of the electromagnetic spectrum, 1.1 μm < λ < 1.5 μm, just beyond the electronic band-edge of GaAs. We fabricated these structures by chemically assisted ion beam etching through a triangular hole array mask, defined by electron beam lithography on GaAs. The 3-d forbidden photonic bandgap was spectrally tuned by 2-d lithographic control of the 3-d spatial periodicity. Optical transmission spectra were generally in good agreement with microwave frequency transmission on centimeter scale models. Nevertheless, we find that the mid-gap optical reflectivity is surprisingly sensitive to structural errors in the photonic crystal, degrading the optical rejection from an expected 95% to an observed 80%. We suggest that mid-gap attenuation in the most vulnerable k-space directions, rather than overall thickness, is the relevant Figure-of-Merit for nano-scale photonic crystals.

71 citations

Journal ArticleDOI
TL;DR: This Letter describes a method to generate nanometer scale patterns on insulating substrates and wide band gap materials using critical energy electron beam lithography that removes the need for conductive dissipation layers or differentially pumped e-beam columns with sophisticated gas delivery systems to control charging effects.
Abstract: This Letter describes a method to generate nanometer scale patterns on insulating substrates and wide band gap materials using critical energy electron beam lithography By operating at the critical energy (E2) where a charge balance between incoming and outgoing electrons leaves the surface neutral, charge-induced pattern distortions typically seen in e-beam lithography on insulators were practically eliminated This removes the need for conductive dissipation layers or differentially pumped e-beam columns with sophisticated gas delivery systems to control charging effects Using a “scan square” method to find the critical energy, sub-100 nm features in 65 nm thick poly(methyl methacrylate) on glass were achieved at area doses as low as 10 μC/cm2 at E2 = 13 keV This method has potential applications in high-density biochips, flexible electronics, and optoelectronics and may improve the fidelity of low voltage e-beam lithography for parallel microcolumn arrays

71 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
202384
2022163
2021108
2020161
2019174
2018204