Electron-beam lithography

About: Electron-beam lithography is a research topic. Over the lifetime, 8982 publications have been published within this topic receiving 143325 citations. The topic is also known as: e-beam lithography.

High-Resolution Mapping of Electron-Beam-Excited Plasmon Modes in Lithographically Defined Gold Nanostructures

Abstract: We demonstrate the use of high-resolution electron beam lithography to fabricate complex nanocavities with nanometric spatial and positional control. The plasmon modes of these nanostructures are then mapped using electron energy-loss spectroscopy in a scanning transmission electron microsope. This powerful combination of patterning and plasmon mapping provides direct experimental verification to theoretical predictions of plasmon hybridization theory in complex metal nanostructures and allows the determination of the full mode spectrum of such cavities.

Optical spectroscopy of ultrasmall structures etched from quantum wells

Abstract: We have studied the photoluminescence and photoexcitation spectra of ultrasmall structures, of approximately 500 A in dimension, which we refer to as quantum ribbons and quantum disks. These are fabricated from GaAs‐AlGaAs quantum wells grown by molecular beam epitaxy and patterned by electron beam lithography. Contrary to our expectation, photoluminescence from these structures is extremely efficient. The excitation spectra of the two types of small structures differ greatly from each other and from that of the as‐grown quantum wells. These differences may be a result of the confinement of the carriers in these small structures.

Chip-scale nanofabrication of single spins and spin arrays in diamond.

Abstract: We demonstrate a technique to nanofabricate nitrogen vacancy (NV) centers in diamond based on broad-beam nitrogen implantation through apertures in electron beam lithography resist. This method enables high-throughput nanofabrication of single NV centers on sub-100-nm length scales. Secondary ion mass spectroscopy measurements facilitate depth profiling of the implanted nitrogen to provide three-dimensional characterization of the NV center spatial distribution. Measurements of NV center coherence with on-chip coplanar waveguides suggest a pathway for incorporating this scalable nanofabrication technique in future quantum applications.

Recent Advances in Resonant Waveguide Gratings

Abstract: Resonant waveguide gratings (RWGs), also known as guided mode resonant (GMR) gratings or waveguide-mode resonant gratings, are dielectric structures where these resonant diffractive elements benefit from lateral leaky guided modes from UV to microwave frequencies in many different configurations. A broad range of optical effects are obtained using RWGs such as waveguide coupling, filtering, focusing, field enhancement and nonlinear effects, magneto-optical Kerr effect, or electromagnetically induced transparency. Thanks to their high degree of optical tunability (wavelength, phase, polarization, intensity) and the variety of fabrication processes and materials available, RWGs have been implemented in a broad scope of applications in research and industry: refractive index and fluorescence biosensors, solar cells and photodetectors, signal processing, polarizers and wave plates, spectrometers, active tunable filters, mirrors for lasers and optical security features. The aim of this review is to discuss the latest developments in the field including numerical modeling, manufacturing, the physics, and applications of RWGs. Scientists and engineers interested in using RWGs for their application will also find links to the standard tools and references in modeling and fabrication according to their needs.