Topic
Epitaxy
About: Epitaxy is a research topic. Over the lifetime, 38168 publications have been published within this topic receiving 645844 citations. The topic is also known as: Epitaxial Growth.
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TL;DR: In this paper, a single-crystal gallium oxide (Ga2O3) metal-semiconductor field effect transistors (MESFETs) with a gate length of 4 μm and a source-drain spacing of 20 μm is presented.
Abstract: We report a demonstration of single-crystal gallium oxide (Ga2O3) metal-semiconductor field-effect transistors (MESFETs). A Sn-doped Ga2O3 layer was grown on a semi-insulating β-Ga2O3 (010) substrate by molecular-beam epitaxy. We fabricated a circular MESFET with a gate length of 4 μm and a source–drain spacing of 20 μm. The device showed an ideal transistor action represented by the drain current modulation due to the gate voltage (VGS) swing. A complete drain current pinch-off characteristic was also obtained for VGS < −20 V, and the three-terminal off-state breakdown voltage was over 250 V. A low drain leakage current of 3 μA at the off-state led to a high on/off drain current ratio of about 10 000. These device characteristics obtained at the early stage indicate the great potential of Ga2O3-based electrical devices for future power device applications.
1,273 citations
TL;DR: Using atomic resolved scanning tunneling microscopy, the experimental evidence of a silicene sheet epitaxially grown on a close-packed silver surface [Ag(111] was presented in this article, which was achieved via direct condensation of a silicon atomic flux onto the single-crystal substrate in ultrahigh vacuum conditions.
Abstract: Using atomic resolved scanning tunneling microscopy, we present here the experimental evidence of a silicene sheet (graphenelike structure) epitaxially grown on a close-packed silver surface [Ag(111)]. This has been achieved via direct condensation of a silicon atomic flux onto the single-crystal substrate in ultrahigh vacuum conditions. A highly ordered silicon structure, arranged within a honeycomb lattice, is synthesized and present two silicon sublattices occupying positions at different heights (0.02 nm) indicating possible sp2-sp3 hybridizations.
1,253 citations
TL;DR: An N-doped p-type ZnO layer has been grown by molecular beam epitaxy on an Li-diffused, bulk, semi-insulating, N-O substrate as discussed by the authors.
Abstract: An N-doped, p-type ZnO layer has been grown by molecular beam epitaxy on an Li-diffused, bulk, semi-insulating ZnO substrate. Hall-effect and conductivity measurements on the layer give: resistivity=4×101 Ω cm; hole mobility=2 cm2/V s; and hole concentration=9×1016 cm−3. Photoluminescence measurements in this N-doped layer show a much stronger peak near 3.32 eV (probably due to neutral acceptor bound excitons), than at 3.36 eV (neutral donor bound excitons), whereas the opposite is true in undoped ZnO. Calibrated, secondary-ion mass spectroscopy measurements show an N surface concentration of about 1019 cm−3 in the N-doped sample, but only about 1017 cm−3 in the undoped sample.
1,237 citations
TL;DR: The atomically smooth SrTiO3 (100) with steps one unit cell in height was obtained by treating the crystal surface with a pH-controlled NH4F-HF solution, providing a well-defined substrate surface for atomically regulated epitaxial growth of such perovskite oxide films as YBa2Cu3O7-δ.
Abstract: The atomically smooth SrTiO3 (100) with steps one unit cell in height was obtained by treating the crystal surface with a pH-controlled NH4F-HF solution. The homoepitaxy of SrTiO3 film on the crystal surface proceeds in a perfect layer-by-layer mode as verified by reflection high-energy electron diffraction and atomic force microscopy. Ion scattering spectroscopy revealed that the TiO2 atomic plane terminated the as-treated clean surface and that the terminating atomic layer could be tuned to the SrO atomic plane by homooepitaxial growth. This technology provides a well-defined substrate surface for atomically regulated epitaxial growth of such perovskite oxide films as YBa2Cu3O7-δ.
1,111 citations
Patent•
31 Oct 2002
TL;DR: A natural superlattice homologous single crystal thin film, characterized in that it comprises a composite oxide which is represented by the formula M1M2O3(ZnO)m, is a natural number of 1 or more as discussed by the authors.
Abstract: A natural superlattice homologous single crystal thin film, characterized in that it comprises a composite oxide which is represented by the formula M1M2O3(ZnO)m, wherein M1 is at least one of Ga, Fe, Sc, In, Lu, Yb, Tm, Er, Ho and Y, M2 is at least one of Mn, Fe, Ga, In and Al, and m is a natural number of 1 or more, and has been grown epitaxially on an epitaxial thin film formed on a single crystal substrate, or on said single crystal substrate from which said epitaxial thin film has disappeared, or on a ZnO single crystal; a method for preparing the natural superlattice thin film which comprises depositing the composite oxide, and diffusing the resultant laminated film by heating it. The natural superlattice homologous single crystal thin film is suitably used in an optical device, an electronic device, an X-ray optical device and the like.
1,090 citations