Topic
Excimer
About: Excimer is a research topic. Over the lifetime, 3725 publications have been published within this topic receiving 75104 citations.
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TL;DR: Calixarene-based fluorescent chemosensor 1 with two fluorogenic pyrene units conjugated to amide groups as guest recognition sites is synthesized with enhanced fluorescence intensity and blue-shifted excimer emission.
310 citations
TL;DR: The pulsed ultraviolet excimer laser has been used to produce tissue ablation with a high degree of precision and with minimal thermal damage to adjacent structures, and threshold fluence for corneal and lens ablation was higher at 248 nm than at 193 nm.
306 citations
01 Dec 1987
TL;DR: In this paper, a model for ablation of polymethylmethacrylate (PMMA) with 300 fs uv excimer laser pulses at 248 nm is proposed, assuming a non-constant absorption coefficient αeff depending on the degree of incubation of the irradiated material and the intensity of the incoming excimer pulse.
Abstract: Experiments on the ablation of polymethylmethacrylate (PMMA) with 300 fs uv excimer laser pulses at 248 nm are reported for the first time. With these ultrashort pulses, ablation can be done at fluences up to five times lower than the threshold fluence for 16 ns ablation of PMMA, and the surface morphology is improved, also for several other materials. A model for ablation is proposed, assuming a non-constant absorption coefficient αeff depending on the degree of incubation of the irradiated material and the intensity of the incoming excimer laser pulse. The agreement between our model and our experimental observations is excellent for 16 ns excimer laser pulses, also predicting perfectly the shape of a pulse transmitted through a thin PMMA sample under high fluence irradiation. Qualitative agreement for 300 fs excimer laser pulses is obtained so far.
299 citations
TL;DR: In this article, a KrF excimer laser was used for photoetching of polymethyl methacrylate (PMMA) for pulsed high power UV light, and the experimental results show that high power excimer lasers are the effective light source for UV photo-etching.
Abstract: Photoetching of polymethyl methacrylate (PMMA) for pulsed high power UV light is demonstrated. As a high power UV light source, a KrF excimer laser was used. Etching depth obtained by deep UV light irradiation has not only energy dependence, but also power dependence. It increased abruptly by increasing the exposed power density for the same exposed energy density.These experimental results show that high power excimer lasers are the effective light source for UV photoetching of PMMA.
291 citations
TL;DR: In this paper, a broad structureless emission band about 5000 cm1 was observed to increase with increasing electron donor concentration at the expense of the fluorescence intensity of the hydrocarbon, thereby following the same Stern-Volmer-type relation as does the well known excimer fluorescence.
Abstract: FLUORESCENCEt Some years ago, while investigating fluorescence quenching of aromatic hydrocarbons (A) by typical electron donors (D), like anilines, we observed1 a broad structureless emission band about 5000 cm1 to the red of the fluorescence of the aromatic hydrocarbon of normal structure. This anomalous fluorescence, as shown in Figure 1, increases in intensity with increasing donor concentration at the expense of the fluorescence intensity of the hydrocarbon, thereby following the same Stern—Volmer-type relation as does the well known excimer fluorescence, e.g. in the case of pyrene2. Extrapolation to infinite donor concentration gives the dashed spectrum (cf. Figure 1) which
282 citations