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Fabrication

About: Fabrication is a research topic. Over the lifetime, 20475 publications have been published within this topic receiving 235676 citations.


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Journal ArticleDOI
TL;DR: This work reports a three-dimensional fabrication technique based on anisotropic plasma etching at an oblique angle to the sample surface used to fabricate free-standing nanoscale components in bulk single-crystal diamond, including nanobeam mechanical resonators, optical waveguides, and photonic crystal and microdisk cavities.
Abstract: A variety of nanoscale photonic, mechanical, electronic, and optoelectronic devices require scalable thin film fabrication. Typically, the device layer is defined by thin film deposition on a substrate of a different material, and optical or electrical isolation is provided by the material properties of the substrate or by removal of the substrate. For a number of materials this planar approach is not feasible, and new fabrication techniques are required to realize complex nanoscale devices. Here, we report a three-dimensional fabrication technique based on anisotropic plasma etching at an oblique angle to the sample surface. As a proof of concept, this angled-etching methodology is used to fabricate free-standing nanoscale components in bulk single-crystal diamond, including nanobeam mechanical resonators, optical waveguides, and photonic crystal and microdisk cavities. Potential applications of the fabricated prototypes range from classical and quantum photonic devices to nanomechanical-based sensors and actuators.

270 citations

01 Jan 2010
TL;DR: In this paper, a vapor deposition approach was used to create nanographene and few-layer nanographenes directly over magnesium oxide and can be achieved at temperatures as low as 325 °C.
Abstract: Graphenerankshighlyasapossiblematerialforfuturehigh-speedandflexibleelectronics.Current fabrication routes, which rely on metal substrates, require post-synthesis transfer of the graphene onto a Si wafer, or in the case of epitaxial growth on SiC, temperatures above 1000 °C are required. Both the handling difficultyandhightemperaturesarenotbestsuitedtopresentdaysilicontechnology.Wereportafacilechemical vapor deposition approach in which nanographene and few-layer nanographene are directly formed over magnesium oxide and can be achieved at temperatures as low as 325 °C.

267 citations

Proceedings ArticleDOI
07 Feb 1993
TL;DR: In this article, a technique for 3D micro fabrication using stereo lithography is proposed, which is called the integrated hardened polymer stereo-lithography (IH) process and is suitable for microstructures made of both polymer and metals.
Abstract: A technique for three-dimensional micro fabrication using stereo lithography is proposed. It is called the IH process (integrated hardened polymer stereo lithography) and is suitable for microstructures made of both polymer and metals. The experimental apparatus developed and the fabrication of various 3-D microstructures, such as bending pipe, connected pipe, microcoil spring, and one-way valve, are described. >

267 citations

Journal ArticleDOI
TL;DR: Kawata et al. as mentioned in this paper used a microlens array to produce multiple spots for parallel fabrication, giving rise to a revolutionary augmentation for their previously developed single-beam two-photon photopolymerization technology.
Abstract: A tightly focused femtosecond laser has been established as a unique tool for micronanostructure fabrication due to its intrinsic three-dimensional processing. In this letter, we utilize a microlens array to produce multiple spots for parallel fabrication, giving rise to a revolutionary augmentation for our previously developed single-beam two-photon photopolymerization technology [S. Kawata, H.-B. Sun, T. Tanaka, and K. Takada, Nature (London) 412, 697 (2001)]. Two- and three-dimensional multiple structures, such as microletter set and self-standing microspring array, are demonstrated as examples of mass production. More than 200 spot simultaneous fabrication has been realized by optimizing the exposure condition for the photopolymerizable resin, i.e., a two-order increase of yield efficiency. Potential applications of this technique are discussed.

267 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
20241
20235,291
202210,627
2021845
2020805
2019944