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Fabrication

About: Fabrication is a research topic. Over the lifetime, 20475 publications have been published within this topic receiving 235676 citations.


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TL;DR: The fabrication of silica shielded Ga-ZnS metal-semiconductor nanowire heterojunction was reported in this paper, accompanied with a mixture of ZnS, Ga2O3 and SiO powders as the sources of materials in the vertical induction furnace.
Abstract: The fabrication of silica shielded Ga-ZnS metal-semiconductor nanowire heterojunction was reported The fabrication was accompanied with a mixture of ZnS, Ga2O3 and SiO powders as the sources of materials in the vertical induction furnace A study of the X-ray diffraction pattern shows that the as-synthesized products consists of crystalline zinc-blende form of ZnS The transmission electron microscopic study shows the microstructural characteristics of the ZnS-based nanostructures

56 citations

Journal ArticleDOI
TL;DR: In this paper, the fabrication and electrical properties of high-density arrays of cylindrical nanoscale capacitors grown in anodic aluminum oxide templates are described, where alternating metallic (carbon) and insulating (boron nitride) layers are created within the template pores, thereby forming composite metal/insulator/metal nanotubules.
Abstract: The fabrication and electrical properties of high-density arrays of cylindrical nanoscale capacitors grown in anodic aluminum oxide templates is described. Using chemical vapor deposition, alternating metallic (carbon) and insulating (boron nitride) layers are created within the template pores, thereby forming composite metal/insulator/metal nanotubules. With the metal electrodes evaporated on the two sides of the template, the structure is converted to an array of nanocapacitors connected in parallel. For 50-μm-thick templates, specific capacitances as high as 2.5 μF/cm2 were measured and capacitances as high as 13 μF/cm2 should be attainable by optimizing the insulating layer properties. The fabrication process can be made compatible with the silicon technology and might, therefore, be used to fabricate high-capacitance elements on tightly packed chips. At the same time, the leakage resistance of the arrays fabricated in the preliminary studies reported here is rather low, presumably due to the contamination of the insulating layer.

56 citations

Journal ArticleDOI
TL;DR: In this paper, the authors reported the parallel fabrication of miniaturized chemical sensors by the direct integration of nanostructured transition metal oxide films onto micro-hotplate platforms based on micromachined suspended membranes.
Abstract: We report the parallel fabrication of miniaturized chemical sensors by the direct integration of nanostructured transition metal oxide films onto micro-hotplate platforms based on micromachined suspended membranes This has been achieved by local deposition on a 10 × 10 membrane wafer of a supersonic cluster beam through a microfabricated auto-aligning silicon shadow mask The sensing properties of the obtained devices were tested with respect to various gaseous species For reducing and oxidizing species such as ethanol and NO2, very good performance in terms of linearity and sensitivity was observed These results demonstrate the feasibility of the coupling of a bottom-up nanofabrication technique such as supersonic cluster beam deposition to a top-down microfabricated platform for a direct and parallel integration methodology of nanomaterials in MEMS

56 citations

Journal ArticleDOI
TL;DR: In this paper , the properties of cellulose derivatives and especially CA membranes in the fabrication of polymeric separation membranes in various applications such as filtration, gas separation, adsorption, and ion exchange membranes.

56 citations

Journal ArticleDOI
TL;DR: In this paper, a self-aligned process using a thin Cr film as a sacrificial etch layer was proposed to fabricate planar metal electrodes separated by large aspect ratio gaps with interelectrode distances well below 100 nm.
Abstract: For nanoscale electrical characterization and device fabrication it is often desirable to fabricate planar metal electrodes separated by large aspect ratio gaps with interelectrode distances well below 100 nm. We demonstrate a self-aligned process to accomplish this goal using a thin Cr film as a sacrificial etch layer. The resulting gaps can be as small as 10 nm and have aspect ratios exceeding 1000, with excellent interelectrode isolation. Such Ti/Au electrodes are demonstrated on Si substrates and are used to examine a voltage-driven transition in magnetite nanostructures. This shows the utility of this fabrication approach even with relatively reactive substrates.

56 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
20241
20235,291
202210,627
2021845
2020805
2019944