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Fabrication

About: Fabrication is a research topic. Over the lifetime, 20475 publications have been published within this topic receiving 235676 citations.


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Journal ArticleDOI
TL;DR: In this article, the pixel array pattern was first defined in an insulating polymer layer on indium tin oxide glass by direct imprinting, followed by spin-coating of OPLED polymers and cathode metal deposition.
Abstract: We have developed an approach to fabricate pixelated organic polymer light-emitting devices (OPLED) using an imprinting technique. The pixel array pattern was first defined in an insulating polymer layer on indium tin oxide glass by direct imprinting, followed by the spin-coating of OPLED polymers and cathode metal deposition. We demonstrated successful fabrication and operation of OPLED pixels of sizes from 50 μm down to 2 μm. Optoelectronic characterization is performed on these devices, and measured results show comparable device performance with OPLED pixels patterned by other methods. This fabrication scheme holds many merits such as easy to process, low-cost, high yield, expandable to flexible substrate, capable of repeated imprinting for large area arrays, and the potential to pattern submicron and nanoscale organic polymer light emitters.

55 citations

Journal ArticleDOI
TL;DR: In this article, a review of the potential of supercritical fluids for next-generation device fabrication is presented, with a focus on the use of block copolymer templates to yield well-ordered porous silica and titania films.
Abstract: Supercritical fluids including carbon dioxide offer a combination of properties that are uniquely suited for device fabrication at the nanoscale. Liquid-like densities, favorable transport properties, and the absence of surface tension enable solution-based processing in an environment that behaves much like a gas. These characteristics provide a means for extending “top-down” processing methods including metal deposition, cleaning, etching, and surface modification chemistries to the smallest device features. The interaction of carbon dioxide with polymeric materials also enables complete structural specification of nanostructured metal oxide films using a “bottom-up” approach in which deposition reactions are conducted within sacrificial, pre-organized templates dilated by the fluid. The result is high-fidelity replication of the template structure in a new material. In particular, block copolymer templates yield well-ordered porous silica and titania films containing spherical or vertically aligned pores that can serve as device substrates for applications in microelectronics, detection arrays, and energy conversion. Finally, the synthesis of nanoparticles and nanowires in supercritical fluids is developing rapidly and offers promise for the efficient production of well-defined materials. In this review, we summarize these developments and discuss their potential for nextgeneration device fabrication.

55 citations

Patent
09 Mar 1984
TL;DR: An electroplated substrate as discussed by the authors is characterized by a substantially reduced number of surface defects for the fabrication of thin-film photoresponsive devices which incorporate specular or diffuse back reflectors, since the texture may be controlled to provide for the appropriate type of reflectivity.
Abstract: An electroplated substrate, characterized by a substantially reduced number of surface defects, for the fabrication of thin film electronic devices. The substrate is prepared in an electroforming process by electroplating onto and removing a metallic layer from the surface of a specifically prepared, substantially defect-free mandril. The substrate may be provided with a preselected surface finish by either (1) texturing the mandril or (2) controlling the parameters of the electroplating process to control the morphology of the deposit. The substrate is especially adapted for the fabrication of thin film photoresponsive devices which incorporate specular or diffuse back reflectors, since the texture may be controlled to provide for the appropriate type of reflectivity. Large area, thin film semiconductor devices incorporating the electroplated substrate are readily scribed to form electrically isolated small area segments for the fabrication of modules, arrays and the like.

55 citations

Journal ArticleDOI
TL;DR: In this article, the development, fabrication, and characterization of a novel nanoscale thermal anemometry probe (NSTAP) for measuring velocity fluctuations in turbulent flows are described, which consists of a freestanding 30 or 60 × 1 × 0.1 μm platinum filament with electrically conductive pads and a silicon structure.
Abstract: The development, fabrication, and characterization of a novel nanoscale thermal anemometry probe (NSTAP) for measuring velocity fluctuations in turbulent flows are described. This miniature MEMS anemometer consists of a freestanding 30 or 60 × 1 × 0.1 μm platinum filament with electrically conductive pads and a silicon structure. A novel deep reactive ion etching lag-based process for fabricating a 3D silicon support structure is described together with other microfabrication steps. The sensors behave similarly to conventional hotwire anemometers, with an order of magnitude better spatial and temporal resolution. Batch fabrication allows a relatively low-cost high-yield process, which together with its superior frequency response and size, make it an attractive thermal anemometry sensor for velocity measurements in turbulent flows.

55 citations

Journal ArticleDOI
TL;DR: In this paper, a fabrication method allowing the fabrication of controlled micro-spherical cap structures with defined edge angles is presented, which allows a fine tuning of the spherical cap edge angle as well as its height and radius of curvature.
Abstract: Well-controlled spherical microstructures open new possibilities for several MEMS devices, such as hemispherical microfluidic channels or micro-optical elements However, machining of micro-spherical shapes has proven to be difficult with conventional planar micro-fabrication processes This paper presents a fabrication method allowing the fabrication of controlled micro-spherical cap structures with defined edge angles Drops of 30 pL of an epoxy solution were accurately inkjet printed on circular platforms The deposited volume is confined by the rim of the platforms This allows a fine tuning of the spherical cap edge angle as well as its height and radius of curvature The presented method allowed fabricating large arrays of well-controlled micro-spherical shapes of different diameters, ranging from 50 to 930 μm, with a maximum controlled edge angle tuning of 85° Theoretical investigations of the underlying phenomena are also presented Good agreement between experimental results and theoretical expectations has been observed, with standard deviations below 3% Using the proposed method, several 2D arrays up to 900 micro hemispheres with an edge angle of 90° ± 2° have been fabricated with a yield above 98%

54 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
20241
20235,291
202210,627
2021845
2020805
2019944