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Fabrication

About: Fabrication is a research topic. Over the lifetime, 20475 publications have been published within this topic receiving 235676 citations.


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Journal ArticleDOI
TL;DR: In this paper, a low-temperature fabrication route in aqueous media was proposed for indium oxide semiconductor structures, which can be both electrically conductive and optically transparent.
Abstract: Metal oxide semiconductor structures can be both electrically conductive and optically transparent — an attractive combination for electronic devices. Their fabrication has typically involved the deposition of the precursors under vacuum, a method that is costly and can result in materials lacking uniformity over large surface areas. A team of researchers led by Byeong-Soo Bae at the Korea Advanced Institute of Science and Technology has alleviated these issues by devising a low-temperature fabrication route in aqueous media. Solution-based processes had been investigated, but often involved alcohol solvents that require high processing temperatures or complex and unstable precursors. An indium oxide thin film has now been prepared from an aqueous solution, at temperatures lower than 200 °C, that further served as the active layer of a fully transparent thin-film transistor. In addition, using plastic as a substrate enabled the construction of a transparent, flexible device.

212 citations

Journal ArticleDOI
TL;DR: The design, fabrication and measurement of integrated Bragg gratings in a compact single-mode silicon-on-insulator ridge waveguide, and the analysis shows that the Bragg wavelength deviation is mainly caused by the wafer thickness variation.
Abstract: We demonstrate the design, fabrication and measurement of integrated Bragg gratings in a compact single-mode silicon-on-insulator ridge waveguide. The gratings are realized by corrugating the sidewalls of the waveguide, either on the ridge or on the slab. The coupling coefficient is varied by changing the corrugation width which allows precise control of the bandwidth and has a high fabrication tolerance. The grating devices are fabricated using a CMOS-compatible process with 193 nm deep ultraviolet lithography. Spectral measurements show bandwidths as narrow as 0.4 nm, which are promising for on-chip applications that require narrow bandwidths such as WDM channel filters. We also present the die-to-die nonuniformity for the grating devices on the wafer, and our analysis shows that the Bragg wavelength deviation is mainly caused by the wafer thickness variation.

211 citations

Proceedings ArticleDOI
06 Mar 2005
TL;DR: In this paper, a sol-gel casting technique for fabricating microstructured optical fiber is discussed, both the advantages and challenges associated with this fabrication method are outlined and discussed.
Abstract: We discuss a sol-gel casting technique for fabricating microstructured optical fiber. Both the advantages and challenges associated with this fabrication method are outlined.

210 citations

Journal ArticleDOI
TL;DR: A bottom-up synthesis of mesoporous crystalline silicon materials with high surface area and tunable primary particle/pore size via a self-templating pore formation process using salt by-products as internal self-forming templates that can be easily removed without any etchants is demonstrated.
Abstract: Porous silicon is a technologically important material; however, many top-down etching fabrication processes result in significant material wastage. Here, the authors report a bottom-up self-templating fabrication route and assess the hydrogen evolution performance of the resulting material.

209 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
20241
20235,291
202210,627
2021845
2020805
2019944