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Fabrication

About: Fabrication is a research topic. Over the lifetime, 20475 publications have been published within this topic receiving 235676 citations.


Papers
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Journal ArticleDOI
TL;DR: In this paper, the design and fabrication of a 19*19 star coupler suitable for lightwave distribution in high-capacity local area networks with a measured efficiency of 55% at a wavelength of 1.3 mu m is reported.
Abstract: The design and fabrication of a 19*19 star coupler suitable for lightwave distribution in high-capacity local area networks with a measured efficiency of 55% at a wavelength of 1.3 mu m is reported. The coupler consists of two arrays of channel waveguides separated by a slab waveguide fabricated on a silicon substrate using SiO/sub 2//Si technology. The integrated optics design is well suited to manufacture. It is argued that the coupler performance does not depend critically on the fabrication accuracy. In fact, the efficiency is primarily determined by the radiating element pattern, whose effective angular aperture is essentially determined by the width Omega of the first Brillouin zone, and, therefore, it is not greatly influenced by the fabrication process. >

141 citations

Book
17 Sep 2007
TL;DR: In this article, the authors present an introduction to microelectronic fabrication and discuss the properties of selected Semiconductor materials, including properties of the Error Function F values index and the conversion factor.
Abstract: 1. An Introduction to Microelectronic Fabrication 2. Semiconductor Substrates 3. Diffusion 4. Thermal Oxidation 5. Ion Implantation 6. Rapid Thermal Processing 7. Optical Lithography 8. Photoresists 9. Nonoptical Lithographic Techniques 10. Vacuum Science and Plasmas 11 . Etching 12. Physical Deposition: Evaporation and Sputtering 13. Chemical Vapor Deposition 14. Epitaxial Growth 15. Device Isolation, Contacts, and Metallization 16. CMOS Technologies 17. Other Transistor Technologies 18. Optoelectronic Technologies 19. MEMS. 20. Integrated Circuit Manufacturing Acronyms and Common Symbols Properties of Selected Semiconductor Materials Physical Constants Conversion Factors Some properties of the Error Function F Values Index

141 citations

Journal ArticleDOI
TL;DR: In this paper, a simple and elegant approach to fabrication of dense ceramic membranes on porous substrates, a traditional dry pressing of foam powders, has been developed to reduce the cost of fabrication.
Abstract: A simple and elegant approach to fabrication of dense ceramic membranes on porous substrates, a traditional dry pressing of foam powders, has been developed to reduce the cost of fabrication. Gd-doped ceria (GDC, Gd0.1Ce0.9O1.95) electrolyte membranes as thin as 8 μm are obtained by dry-pressing highly porous GDC powders. The membrane thickness can be readily controlled by the amount of powder. The electrolyte membranes are studied in a solid-oxide fuel cell (SOFC) with air as oxidant and humidified hydrogen (3% H2O) as fuel. Open-circuit voltages of about 1.0 V are observed, implying that the permeability of the membranes to molecular gases is insignificant. Power densities of 140 and 380 mW/cm2 are demonstrated at 500° and 600°C, respectively, representing a significant progress in developing low-temperature SOFCs.

140 citations

Journal ArticleDOI
TL;DR: A new approach for the fabrication of nanowires is reported: the direct drawing of optical fibers with air suspended nanoscale cores using the extrusion technique for preform and jacket tube fabrication, resulting in the smallest core sizes produced to date within optical fibers without tapering.
Abstract: We report a new approach for the fabrication of nanowires: the direct drawing of optical fibers with air suspended nanoscale cores. The fibers were made from lead silicate glass using the extrusion technique for preform and jacket tube fabrication. Fibers with core diameters in the range of 420–720 nm and practical outer diameters of 110–200 μm were produced, the smallest core sizes produced to date within optical fibers without tapering. We explored the impact of the core size on the effective mode area and propagation loss of these suspended nanowires relative to circular nanowires reported to date. As for circular nanowires, the propagation loss of these suspended nanowires is dominated by surface roughness induced scattering.

140 citations

Patent
30 Jun 2004
TL;DR: In this article, a novel photolithography process using photoresist pattern having at least two areas which have different thickness from each other for a fabrication method for a liquid crystal display device having reversed staggered and channel-etched type thin film transistors, reduce a number of photolithographic processes required for whole of the fabrication process of the liquid-crystal display device, and improve brightness of the display device.
Abstract: The present invention provides a novel photolithography processes using photoresist pattern having at least two areas which has different thickness from each other for a fabrication method for a liquid crystal display device having reversed staggered and channel-etched type thin film transistors, reduce a number of photolithography processes required for whole of the fabrication process of the liquid crystal display device, and improve brightness of the liquid crystal display device.

139 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
20241
20235,291
202210,627
2021845
2020805
2019944