Topic
Fabrication
About: Fabrication is a research topic. Over the lifetime, 20475 publications have been published within this topic receiving 235676 citations.
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TL;DR: In this paper , the influence of polymer film thickness on the dielectric properties, film quality issues in thinner polymer films with different filler contents, and major processing methods in decreasing polymeric film thickness are discussed.
91 citations
TL;DR: In this paper, the fabrication of p-and n-channel MOS thin-film transistors in polycrystalline silicon-germanium (poly-Si/sub 1-x/Ge/sub x/) films is described, and their electrical characteristics are presented.
Abstract: The fabrication of p- and n-channel MOS thin-film transistors (TFT's) in polycrystalline silicon-germanium (poly-Si/sub 1-x/Ge/sub x/) films is described, and their electrical characteristics are presented. Various technological issues are then addressed in order to provide direction for further work in optimizing the fabrication process. The initial devices fabricated in this work exhibit well behaved electrical characteristics; enhanced performance is expected to accompany improvements in the crystallization and defect-passivation processes. Compared to a poly-Si TFT technology, an optimized poly-Si/sub 1-x/Ge/sub x/ TFT technology may ultimately be able to provide a lower-temperature, shorter-time processing capability at little expense to device performance and it is therefore promising for large-area electronics applications. >
91 citations
TL;DR: In this article, 3D electron beam lithography and thermal reflow were combined to fabricate structures with multilevel and continuous profiles, achieving new shapes, smooth surfaces and sharp corners.
Abstract: 3D electron beam lithography and thermal reflow were combined to fabricate structures with multilevel and continuous profiles. New shapes, smooth surfaces and sharp corners were achieved. By using exposure with variable doses, up to 20 steps were fabricated in a 500 nm thick resist with a lateral resolution of 200 nm. Steps were reflowed into continuous slopes by thermal post-processing, and were transferred into silicon substrates by proportional plasma etching. The method can be used for the fabrication of 3D nanoimprint stamps with both sharp features and continuous profiles.
91 citations
TL;DR: In this paper, the influence of polymer film thickness on the dielectric properties, film quality issues in thinner polymer films with different filler contents, and major processing methods in decreasing polymeric film thickness are discussed.
91 citations
TL;DR: For the large-area fabrication of thin-film transistors, a new conjugated polymer poly[9-(1-octylonoyl)-9H-carbazole-2,7-diyl] is developed to harvest ultrahigh-purity semiconducting single-walled carbon nanotubes.
Abstract: For the large-area fabrication of thin-film transistors (TFTs), a new conjugated polymer poly[9-(1-octylonoyl)-9H-carbazole-2,7-diyl] is developed to harvest ultrahigh-purity semiconducting single-walled carbon nanotubes. Combined with spectral and nanodevice characterization, the purity is estimated up to 99.9%. High density and uniform network formed by dip-coating process is liable to fabricate high-performance TFTs on a wafer-scale and the as-fabricated TFTs exhibit a high degree of uniformity.
90 citations