Field effect

About: Field effect is a research topic. Over the lifetime, 4018 publications have been published within this topic receiving 92613 citations.

Integrated electronic circuit comprising field effect sensors for detecting biomolecules

Abstract: The invention relates to an integrated electronic circuit comprising a field effect sensor (104; 304; 504) for detecting at least one biomolecule, and comprising a controllable semiconductor switch (116; 316; 516) for measuring a line condition of the field effect sensor

Energy Offset Between Silicon Quantum Structures: Interface Impact of Embedding Dielectrics as Doping Alternative

Abstract: Ultrasmall silicon (Si) nanoelectronic devices require an energy shift of electronic states for n- and p-conductivity. Nanocrystal self-purification and out-diffusion in field effect transistors cause doping to fail. Here, it is shown that silicon dioxide (SiO2) and silicon nitride (Si3N4) create energy offsets of electronic states in embedded Si quantum dots (QDs) in analogy to doping. Density functional theory (DFT), interface charge transfer (ICT), and experimental verifications arrive at the same size of QDs below which the dielectric dominates their electronic properties. Large positive energy offsets of electronic states and an energy gap increase exist for Si QDs in Si3N4 versus SiO2. Using DFT results, the SiO2/QD interface coverage is estimated with nitrogen (N) to be 0.1 to 0.5 monolayers (ML) for samples annealed in N2 versus argon (Ar). The interface impact is described as nanoscopic field effect and propose the energy offset as robust and controllable alternative to impurity doping of Si nanostructures.

Conduction at a ferroelectric interface

Abstract: Typical logic elements utilizing the field effect rely on the change in carrier concentration due to the field in the channel region of the device. Ferroelectric-field-effect devices provide a nonvolatile version of this effect due to the stable polarization order parameter in the ferroelectric. In this study, we describe an oxide/oxide ferroelectric heterostructure device based on (001)-oriented PbZr₀.₂Ti₀.₈O₃-LaNiO₃ where the dominant change in conductivity is a result of a significant mobility change in the interfacial channel region. The effect is confined to a few atomic layers at the interface and is reversible by switching the ferroelectric polarization. More interestingly, in one polarization state, the field effect induces a 1.7 eV shift of the interfacial bands to create a new conducting channel in the interfacial PbO layer of the ferroelectric.

MOSFET having a JFET embedded as a body diode

Abstract: A field effect transistor, in accordance with one embodiment, includes a metal-oxide-semiconductor field effect transistor (MOSFET) having a junction field effect transistor (JFET) embedded as a body diode.

The structural, optical and electrical characterization of high-performance, low-temperature and solution-processed alkali metal-doped ZnO TFTs

Abstract: The structural, electrical and optical properties of high-performance, low-temperature and solution-processed alkali metal-doped ZnO TFTs were studied using various analytic instruments, including HR-TEM, AFM, XPS, EDS, electrical bias stability test and UV-vis spectroscopy. Furthermore, we successfully demonstrated that a change in the optical bandgap energy of Li-doped ZnO semiconductor films supported by Burstein–Moss theory can show a trade-off relationship between the field effect mobility of Li-ZnO TFTs and the Li doping concentrations. The relative broadening of the Eopt values, which are strongly related to the amount of excited electrons from the Fermi level in the valance band to the conduction band, was observed from the undoped ZnO film to the Li-doped ZnO film (10 mol%). The increase in the electron donor concentration was the dominant reason for the enhancement in the electron mobility of the alkali metal-doped ZnO TFTs.