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Field effect

About: Field effect is a research topic. Over the lifetime, 4018 publications have been published within this topic receiving 92613 citations.


Papers
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Journal ArticleDOI
TL;DR: In this article, a review of metal-insulator transition mechanisms in correlated electron materials and three-terminal field effect devices utilizing such correlated oxides as the channel layer is presented.
Abstract: Correlated electron systems are among the centerpieces of modern condensed matter sciences, where many interesting physical phenomena, such as metal-insulator transition and high-T c superconductivity appear. Recent efforts have been focused on electrostatic doping of such materials to probe the underlying physics without introducing disorder as well as to build field-effect transistors that may complement conventional semiconductor metal-oxide-semiconductor field effect transistor (MOSFET) technology. This review focuses on metal-insulator transition mechanisms in correlated electron materials and three-terminal field effect devices utilizing such correlated oxides as the channel layer. We first describe how electron-disorder interaction, electron-phonon interaction, and/or electron correlation in solids could modify the electronic properties of materials and lead to metal-insulator transitions. Then we analyze experimental efforts toward utilizing these transitions in field effect transistors and their ...

122 citations

Journal ArticleDOI
TL;DR: In this paper, two new oligothiophene derivatives bearing a diketopyrrolopyrrole core, 2,5-di-n-hexyl-3,6-bis(5′-nhexyl[2,2′;5′, 2′]terthiophen-5-yl)pyrrolo[3,4c]pyrrole-1,4-dione (DHT6DPPC12), and their use in solution-processed organic field effect transistors are reported.
Abstract: Two new oligothiophene derivatives bearing a diketopyrrolopyrrole core, 2,5-di-n-hexyl-3,6-bis(5′′-n-hexyl[2,2′;5′,2′′]terthiophen-5-yl)pyrrolo[3,4-c]pyrrole-1,4-dione (DHT6DPPC6) and 2,5-di-n-dodecyl-3,6-bis(5′′-n-hexyl[2,2′;5′,2′′]terthiophen-5-yl)pyrrolo[3,4-c]pyrrole-1,4-dione (DHT6DPPC12), and their use in solution-processed organic field effect transistors are reported. Depending on the type of alkyl substituent and film annealing temperature, the crystal grain sizes and interlayer spacing vary as observed using atomic force microscopy and X-ray diffractometry, respectively. These changes in film morphology and interlayer spacing lead to an order of magnitude difference in the field effect mobilities. The field effect mobilities for annealed DHT6DPPC6 and DHT6DPPC12 films are 0.02 and 0.01 cm2/V s, respectively.

119 citations

Patent
28 Feb 1997
TL;DR: In this article, a thin film dielectric layer of enhanced reliability is provided in a field effect device, where the maximum adjacent the gate enhances resistance to penetration of dopants from the gate.
Abstract: In accordance with the invention an electronic device is provided with a thin film dielectric layer of enhanced reliability. The dielectric comprises a thin film of silicon oxide having maximum concentrations of nitrogen near its major interfaces. In a field effect device, the maximum adjacent the gate enhances resistance to penetration of dopants from the gate. The secondary maximum near the channel enhances resistance to current stress. The maximum near the channel is preferably displaced slightly inward from the channel to minimize effects on carrier mobility.

119 citations

Journal ArticleDOI
TL;DR: In this paper, the authors have performed grazing-incidence X-ray diffraction and field effect mobility measurements to find a relation between the thickness dependence of structural order and the electrical parameters in low molecular weight (Mw ∼ 2.5 kDa) poly(3-hexylthiophene) (P3HT).
Abstract: The morphology of thin films at the polymer-to-insulator interface is of great importance for OFET applications. In order to find a relation between the thickness dependence of structural order and the electrical parameters in low molecular weight (Mw ∼ 2.5 kDa) poly(3-hexylthiophene) (P3HT), we have performed grazing-incidence X-ray diffraction and field effect mobility measurements. The samples were prepared from solutions with different concentrations by spin-coating mainly onto HMDS-pretreated Si/SiO2 substrates, resulting in film thicknesses that vary between 10 and 200 nm. The X-ray diffraction curves display Bragg peaks of nanocrystallites diluted into an amorphous matrix where the orientational distribution of the crystallites changes significantly as a function of film thickness. The orientation of nanocrystals was found to be random for the thickest films. Reducing the film thickness, we found an increase in the alignment of the stacking direction of molecules along the surface normal. At same time the mean crystal size along the film normal decreases less than the decrease of film thickness. This is interpreted by a preferential pinning of nanocrystals at the film-to-insulator interface when the crystal size becomes in the order of the film thickness, i.e., below 25 nm. The model of pinning effect is supported by temperature-resolved X-ray measurements performed between room temperature and melting temperature. For films thicker than 25 nm the phase transition appears rather continuously with temperature, but it becomes sharp for thinner films. In contrast to X-ray measurements the field effect mobility is found to be constant within the whole investigated range. Our findings give evidence that the charge transport in low molecular weight P3HT is dominated by the ultrathin layer stabilized at the film-to-insulator interface. Despite the very uniform orientation of the crystallites within this layer, the field effect mobility remains low for all thicknesses. This is attributed to the presence of amorphous regions between highly crystalline domains, which ultimately limits the charge transport in the layer plane.

118 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
20235
202210
202171
202078
2019103
2018133