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Showing papers on "Field-effect transistor published in 2018"


Journal ArticleDOI
01 Apr 2018
TL;DR: In this paper, the fabrication of large-area, high-quality 2D tellurium (tellurene) using a substrate-free solution process was reported. But this method suffers from a variety of drawbacks, including limitations in crystal size and stability.
Abstract: The reliable production of two-dimensional (2D) crystals is essential for the development of new technologies based on 2D materials. However, current synthesis methods suffer from a variety of drawbacks, including limitations in crystal size and stability. Here, we report the fabrication of large-area, high-quality 2D tellurium (tellurene) using a substrate-free solution process. Our approach can create crystals with process-tunable thickness, from a monolayer to tens of nanometres, and with lateral sizes of up to 100 µm. The chiral-chain van der Waals structure of tellurene gives rise to strong in-plane anisotropic properties and large thickness-dependent shifts in Raman vibrational modes, which is not observed in other 2D layered materials. We also fabricate tellurene field-effect transistors, which exhibit air-stable performance at room temperature for over two months, on/off ratios on the order of 106, and field-effect mobilities of about 700 cm^2 V^(−1) s^(−1). Furthermore, by scaling down the channel length and integrating with high-k dielectrics, transistors with a significant on-state current density of 1 A mm^(−1) are demonstrated.

507 citations


Journal ArticleDOI
TL;DR: A spatially-confined inverse temperature crystallization strategy is demonstrated which synthesizes micrometre-thin single crystals of methylammonium lead halide perovskites MAPbX3 with sub-nanometer surface roughness and very low surface contamination, paving the way for integrating hybrid perovkite crystals into printed, flexible and transparent electronics.
Abstract: The fields of photovoltaics, photodetection and light emission have seen tremendous activity in recent years with the advent of hybrid organic-inorganic perovskites. Yet, there have been far fewer reports of perovskite-based field-effect transistors. The lateral and interfacial transport requirements of transistors make them particularly vulnerable to surface contamination and defects rife in polycrystalline films and bulk single crystals. Here, we demonstrate a spatially-confined inverse temperature crystallization strategy which synthesizes micrometre-thin single crystals of methylammonium lead halide perovskites MAPbX3 (X = Cl, Br, I) with sub-nanometer surface roughness and very low surface contamination. These benefit the integration of MAPbX3 crystals into ambipolar transistors and yield record, room-temperature field-effect mobility up to 4.7 and 1.5 cm2 V−1 s−1 in p and n channel devices respectively, with 104 to 105 on-off ratio and low turn-on voltages. This work paves the way for integrating hybrid perovskite crystals into printed, flexible and transparent electronics. The methylammonium lead halide perovskites have shown excellent optoelectronic properties but the field-effect transistors are much less studied. Here Yu et al. synthesize micrometer-thin crystals of perovskites with low surface contamination and make ambipolar transistor devices with high mobilities.

231 citations


Journal ArticleDOI
Mengwei Si1, Pai-Ying Liao1, Gang Qiu1, Yuqin Duan1, Peide D. Ye1 
26 Jun 2018-ACS Nano
TL;DR: Room-temperature ferroelectric field-effect transistors (Fe-FETs) with MoS2 and CuInP2S6 two-dimensional van der Waals heterostructure show resistive switching characteristics with more than four orders of on/off ratio between low- and high-resistance states, promising for resistive random-access memory applications.
Abstract: We demonstrate room-temperature ferroelectric field-effect transistors (Fe-FETs) with MoS2 and CuInP2S6 two-dimensional (2D) van der Waals heterostructure. The ferroelectric CuInP2S6 is a 2D ferroelectric insulator, integrated on top of MoS2 channel providing a 2D/2D semiconductor/insulator interface without dangling bonds. The MoS2- and CuInP2S6-based 2D van der Waals heterostructure Fe-FETs exhibit a clear counterclockwise hysteresis loop in transfer characteristics, demonstrating their ferroelectric properties. This stable nonvolatile memory property can also be modulated by the back-gate bias of the MoS2 transistors because of the tuning of capacitance matching between the MoS2 channel and the ferroelectric CuInP2S6, leading to the enhancement of the on/off current ratio. Meanwhile, the CuInP2S6 thin film also shows resistive switching characteristics with more than four orders of on/off ratio between low- and high-resistance states, which is also promising for resistive random-access memory applications.

212 citations



Journal ArticleDOI
23 Jan 2018-ACS Nano
TL;DR: This work establishes that realization of electronic-grade epitaxial TMDs must consider the impact of the TMD precursors, substrate, and the 2D/3D interface as leading factors in electronic performance.
Abstract: Atomically thin transition metal dichalcogenides (TMDs) are of interest for next-generation electronics and optoelectronics. Here, we demonstrate device-ready synthetic tungsten diselenide (WSe2) via metal–organic chemical vapor deposition and provide key insights into the phenomena that control the properties of large-area, epitaxial TMDs. When epitaxy is achieved, the sapphire surface reconstructs, leading to strong 2D/3D (i.e., TMD/substrate) interactions that impact carrier transport. Furthermore, we demonstrate that substrate step edges are a major source of carrier doping and scattering. Even with 2D/3D coupling, transistors utilizing transfer-free epitaxial WSe2/sapphire exhibit ambipolar behavior with excellent on/off ratios (∼107), high current density (1–10 μA·μm–1), and good field-effect transistor mobility (∼30 cm2·V–1·s–1) at room temperature. This work establishes that realization of electronic-grade epitaxial TMDs must consider the impact of the TMD precursors, substrate, and the 2D/3D inte...

164 citations


Journal ArticleDOI
17 Jan 2018-ACS Nano
TL;DR: In this article, the authors demonstrate highly sensitive and conformal In2O3 nanoribbon FET biosensors with a fully integrated on-chip gold side gate, which have been laminated onto various surfaces such as artificial arms and watches, and have enabled glucose detection in various body fluids, such as sweat and saliva.
Abstract: Nanoribbon- and nanowire-based field-effect transistor (FET) biosensors have stimulated a lot of interest. However, most FET biosensors were achieved by using bulky Ag/AgCl electrodes or metal wire gates, which have prevented the biosensors from becoming truly wearable. Here, we demonstrate highly sensitive and conformal In2O3 nanoribbon FET biosensors with a fully integrated on-chip gold side gate, which have been laminated onto various surfaces, such as artificial arms and watches, and have enabled glucose detection in various body fluids, such as sweat and saliva. The shadow-mask-fabricated devices show good electrical performance with gate voltage applied using a gold side gate electrode and through an aqueous electrolyte. The resulting transistors show mobilities of ∼22 cm2 V-1 s-1 in 0.1× phosphate-buffered saline, a high on-off ratio (105), and good mechanical robustness. With the electrodes functionalized with glucose oxidase, chitosan, and single-walled carbon nanotubes, the glucose sensors show a very wide detection range spanning at least 5 orders of magnitude and a detection limit down to 10 nM. Therefore, our high-performance In2O3 nanoribbon sensing platform has great potential to work as indispensable components for wearable healthcare electronics.

161 citations


Journal ArticleDOI
TL;DR: The unusual spatial uniformity of the bandgap without undesired in-gap states on the sample surface with up to ~50% defects makes Bi2O2Se an ideal semiconductor for future electronic applications.
Abstract: Semiconductors are essential materials that affect our everyday life in the modern world Two-dimensional semiconductors with high mobility and moderate bandgap are particularly attractive today because of their potential application in fast, low-power, and ultrasmall/thin electronic devices We investigate the electronic structures of a new layered air-stable oxide semiconductor, Bi2O2Se, with ultrahigh mobility (~28 × 105 cm2/V⋅s at 20 K) and moderate bandgap (~08 eV) Combining angle-resolved photoemission spectroscopy and scanning tunneling microscopy, we mapped out the complete band structures of Bi2O2Se with key parameters (for example, effective mass, Fermi velocity, and bandgap) The unusual spatial uniformity of the bandgap without undesired in-gap states on the sample surface with up to ~50% defects makes Bi2O2Se an ideal semiconductor for future electronic applications In addition, the structural compatibility between Bi2O2Se and interesting perovskite oxides (for example, cuprate high–transition temperature superconductors and commonly used substrate material SrTiO3) further makes heterostructures between Bi2O2Se and these oxides possible platforms for realizing novel physical phenomena, such as topological superconductivity, Josephson junction field-effect transistor, new superconducting optoelectronics, and novel lasers

154 citations


Journal ArticleDOI
TL;DR: In this article, the authors discuss the high-bias electrical characteristics of back-gated field effect transistors with CVD-synthesized bilayer MoS2 channel and Ti Schottky contacts.
Abstract: We discuss the high-bias electrical characteristics of back-gated field-effect transistors with CVD-synthesized bilayer MoS2 channel and Ti Schottky contacts. We find that oxidized Ti contacts on MoS2 form rectifying junctions with ~0.3 to 0.5 eV Schottky barrier height. To explain the rectifying output characteristics of the transistors, we propose a model based on two slightly asymmetric back-to-back Schottky barriers, where the highest current arises from image force barrier lowering at the electrically forced junction, while the reverse current is due to Schottky-barrier limited injection at the grounded junction. The device achieves a photo responsivity greater than 2.5 AW-1 under 5 mWcm-2 white-LED light. By comparing two- and four-probe measurements, we demonstrate that the hysteresis and persistent photoconductivity exhibited by the transistor are peculiarities of the MoS2 channel rather than effects of the Ti/MoS2 interface.

153 citations


Journal ArticleDOI
TL;DR: Negative capacitance (NC) FETs with channel lengths from 30 nm to 50 nm, gated with ferroelectric hafnium zirconium oxide are fabricated on fully depleted silicon-on-insulator (FDSOI) substrates.
Abstract: Negative capacitance (NC) FETs with channel lengths from 30 nm to $50~\mu \text{m}$ , gated with ferroelectric hafnium zirconium oxide are fabricated on fully depleted silicon-on-insulator (FDSOI) substrates. Enhanced capacitance due to NC, hysteresis-free operation, and improved subthreshold slope are observed. The NC effect leads to enhancement of drain current for small voltage operation. In addition, improved short channel performance is demonstrated owing to the reverse drain induced barrier lowering characteristics of the NC operation.

124 citations


Journal ArticleDOI
TL;DR: In this paper, a modulation-doped double heterostructure field effect transistors were demonstrated for high power and high frequency device applications, where electrons can be transferred from below and above the β-Ga2O3 quantum well.
Abstract: In this work, we demonstrate modulation-doped β-(AlxGa1-x)2O3/Ga2O3 double heterostructure field effect transistors. The maximum sheet carrier density for a two-dimensional electron gas (2DEG) in a β-(AlxGa1-x)2O3/Ga2O3 heterostructure is limited by the conduction band offset and parasitic channel formation in the barrier layer. We demonstrate a double heterostructure to realize a β-(AlxGa1-x)2O3/Ga2O3/(AlxGa1-x)2O3 quantum well, where electrons can be transferred from below and above the β-Ga2O3 quantum well. The confined 2DEG charge density of 3.85 × 1012 cm−2 was estimated from the low-temperature Hall measurement, which is higher than that achievable in a single heterostructure. Hall mobilities of 1775 cm2/V·s at 40 K and 123 cm2/V·s at room temperature were measured. Modulation-doped double heterostructure field effect transistors showed a maximum drain current of IDS = 257 mA/mm, a peak transconductance (gm) of 39 mS/mm, and a pinch-off voltage of −7.0 V at room temperature. The three-terminal off-state breakdown measurement on the device with a gate-drain spacing (LGD) of 1.55 μm showed a breakdown voltage of 428 V, corresponding to an average breakdown field of 2.8 MV/cm. The breakdown measurement on the device with a scaled gate-drain spacing of 196 nm indicated an average breakdown field of 3.2 MV/cm. The demonstrated modulation-doped β-(AlxGa1-x)2O3/Ga2O3 double heterostructure field effect transistor could act as a promising candidate for high power and high frequency device applications.

123 citations


Journal ArticleDOI
TL;DR: High-performance transistors are demonstrated that utilize solid-state ionic conductive cellulose nanopaper as the dielectric and no discernible drain current change is observed when the device is under bending with radius down to 1 mm.
Abstract: Biodegradability, low-voltage operation, and flexibility are important trends for the future organic electronics. High-capacitance dielectrics are essential for low-voltage organic field-effect transistors. Here we report the application of environmental-friendly cellulose nanopapers as high-capacitance dielectrics with intrinsic ionic conductivity. Different with the previously reported liquid/electrolyte-gated dielectrics, cellulose nanopapers can be applied as all-solid dielectrics without any liquid or gel. Organic field-effect transistors fabricated with cellulose nanopaper dielectrics exhibit good transistor performances under operation voltage below 2 V, and no discernible drain current change is observed when the device is under bending with radius down to 1 mm. Interesting properties of the cellulose nanopapers, such as ionic conductivity, ultra-smooth surface (~0.59 nm), high transparency (above 80%) and flexibility make them excellent candidates as high-capacitance dielectrics for flexible, transparent and low-voltage electronics. Next-generation organic electronics require flexible organic field effect transistors that show low-voltage operation and are biodegradable. Here, Huang and co-workers demonstrate high-performance transistors that utilize solid-state ionic conductive cellulose nanopaper as the dielectric.

Journal ArticleDOI
TL;DR: In this paper, the authors investigated the transport properties of 1-40 layers of two-dimensional tungsten diselenide (WSe2) transistors with different temperature ranges from 300 to 5'K.
Abstract: Tungsten diselenide (WSe2) has many excellent properties and provides superb potential in applications of valley-based electronics, spin-electronics, and optoelectronics. To facilitate the digital and analog application of WSe2 in CMOS, it is essential to understand the underlying ambipolar hole and electron transport behavior. Herein, the electric field screening of WSe2 with a thickness range of 1–40 layers is systemically studied by electrostatic force microscopy in combination with non-linear Thomas–Fermi theory to interpret the experimental results. The ambipolar transport behavior of 1–40 layers of WSe2 transistors is systematically investigated with varied temperature from 300 to 5 K. The thickness-dependent transport properties (carrier mobility and Schottky barrier) are discussed. Furthermore, the surface potential of WSe2 as a function of gate voltage is performed under Kelvin probe force microscopy to directly investigate its ambipolar behavior. The results show that the Fermi level will upshift by 100 meV when WSe2 transmits from an insulator to an n-type semiconductor and downshift by 340 meV when WSe2 transmits from an insulator to a p-type semiconductor. Finally, the ambipolar WSe2 transistor-based analog circuit exhibits phase-control by gate voltage in an analog inverter, which demonstrates practical application in 2D communication electronics. Transistors made from two-dimensional tungsten selenide (WSe2) crystals may simplify fabrication of electronic communication devices. Modern transistors amplify and manipulate current by applying electric fields to semiconductor films known as channels that are designed to transport either positive or negative charges. Mingdong Dong from Aarhus University in Denmark and colleagues have developed a new transistor that can move both types of charge. The team found that when individual flakes of WSe2 were stacked into a multi-layered channel structure, the dominant type of charge transported could be switched using an external electrode. A prototype amplifier constructed from two WSe2-based transistors showed this approach enabled fundamental control over analog signals, and could potentially be used in complex circuits that require fewer materials and smaller chip footprints than usual. Compared with unipolar transistors, ambipolar transistors, which can easily switch between n-type and p-type behavior by applying an electric field, are most promising candidates since they can effectively simplify circuit design and save the layout area in CMOS. In this study, we take a deep insight into the thickness dependent physical properties of WSe2, where the optical properties, electric field screening effect, and the ambipolar transport behavior are systematically studied. Furthermore, the investigation of ambipolar WSe2 transistors in analogue circuits exhibiting gate-controlled phase change directly explores its practical application in 2D communication electronics.

Journal ArticleDOI
TL;DR: This review involves the design, fabrication, and applications of OLETs with a comprehensive coverage of this field with the aim to give a deep insight into the intrinsic mechanisms of devices.
Abstract: Organic light-emitting transistors (OLETs), as novel and attractive kinds of organic electronic devices, have gained extensive attention from both academia and industry. The unique device architectures can simultaneously combine the electrical switching functionality of organic field-effect transistors and the light generation capability of organic light-emitting diodes in a single device, thereby holding great promise for reducing the complicated processes of next-generation pixel circuitry. This review involves the design, fabrication, and applications of OLETs with a comprehensive coverage of this field with the aim to give a deep insight into the intrinsic mechanisms of devices. Challenges and future prospects of OLETs are also discussed.

Journal ArticleDOI
TL;DR: In this article, a review describes how graphene, graphene oxide and reduced graphene oxide can be used to fabricate pH-sensitive devices (e.g., solution-gated FETs, solid-gate FET, electrochemical sensors, and pH sensitive quantum dots).
Abstract: pH measuring and monitoring is fundamental to understand or control many chemical processes in biological, industrial or environmental fields. Potentiometric measurements by a glass electrode is the most common method to measure pH, although single-use paper strips are also widely used. Other methods include the use of hydrogen, quinhydron, and antimony electrodes, the imaging using pH-sensitive indicators such as dyes or proteins, and the use of ion-selective field effect transistor (ISFET). Due to the chemical reactivity of both sides of its 2D structure, nanometer thickness, high electron mobility, high reactivity to oxygen groups such as OH − , and ultrafast optical response, graphene has the potential to be used for the fabrication of nanoscale, wide-range, high-sensitivity and flexible pH sensors. This review describes how graphene, graphene oxide and reduced graphene oxide can be used to fabricate pH-sensitive devices (e.g. solution-gated FETs, solid-gate FETs, electrochemical sensors, and pH-sensitive quantum dots). The various configurations are reported along with the advantages and current limitations.


Journal ArticleDOI
TL;DR: In this paper, a silicon delta-doped Ga2O3 metal semiconductor field effect transistors (MESFETs) with source-drain ohmic contacts formed by patterned regrowth of n-type Ga2 O3 was presented.
Abstract: We report silicon delta-doped $\beta $ -Ga2O3 metal semiconductor field effect transistors (MESFETs) with source–drain ohmic contacts formed by patterned regrowth of n-type Ga2O3. We show that regrown n-type contacts can enable a lateral low-resistance contact to the two-dimensional electron gas channel, with contact resistance lower than $1.5~\Omega $ -mm. The fabricated MESFET has a peak drain current ( ${I} _{D,\text{MAX}}$ ) of 140 mA/mm, transconductance ( ${g} _{m}$ ) of 34 mS/mm, and 3-terminal off-state breakdown voltage of 170 V. The proposed device structure could provide a promising path towards vertically scaled $\beta $ -Ga2O3 field effect transistors.

Journal ArticleDOI
28 Mar 2018
TL;DR: In this article, a monolayer MoS2 FET with near-zero hysteresis reached 0.15% of the sweeping range of the gate bias, a record value observed so far in 2D FETs.
Abstract: While two-dimensional (2D) van der Waals (vdW) layered materials are promising channel materials for wearable electronics and energy-efficient field-effect transistors (FETs), large hysteresis and large subthreshold swing induced by either dangling bonds at gate oxide dielectrics and/or trap molecules in bubbles at vdW interface are a serious drawback, hampering implementation of the 2D-material based FETs in real electronics. Here, we report a monolayer MoS2 FET with near-zero hysteresis reaching 0.15% of the sweeping range of the gate bias, a record-value observed so far in 2D FETs. This was realized by squeezing the MoS2 channel between top h-BN layer and bottom h-BN gate dielectrics and further removing the trap molecules in bubbles at the vdW interfaces via post-annealing. By segregating the bubbles out to the edge of the channel, we also obtain excellent switching characteristics with a minimum subthreshold swing of 63 mV/dec, an average subthreshold slope of 69 mV/dec for a current range of four orders of magnitude at room temperature, and a high on/off current ratio of 108 at a small operating voltage (<1 V). Such a near-zero hysteresis and a near-ideal subthreshold limit originate from the reduced trap density of ~5.2 × 109 cm−2 eV−1, a thousand times smaller than previously reported values.

Journal ArticleDOI
TL;DR: This work suggests that S doping is an effective way to enhance the stability of black phosphorus and fabricated S-doped BP few-layer field-effect transistors show more stable transistor performance under ambient conditions.
Abstract: Black phosphorus (BP) has drawn great attention owing to its tunable band gap depending on thickness, high mobility, and large Ion/Ioff ratio, which makes BP attractive for using in future two-dimensional electronic and optoelectronic devices. However, its instability under ambient conditions poses challenge to the research and limits its practical applications. In this work, we present a feasible approach to suppress the degradation of BP by sulfur (S) doping. The fabricated S-doped BP few-layer field-effect transistors (FETs) show more stable transistor performance under ambient conditions. After exposing to air for 21 days, the charge-carrier mobility of a representative S-doped BP FETs device decreases from 607 to 470 cm2 V–1 s–1 (remained as high as 77.4%) under ambient conditions and a large Ion/Ioff ratio of ∼103 is still retained. The atomic force microscopy analysis, including surface morphology, thickness, and roughness, also indicates the lower degradation rate of S-doped BP compared to BP. Fir...

Proceedings ArticleDOI
01 Dec 2018
TL;DR: In this article, a vertical ferroelectric HfO 2 field effect transistor based on 3-D macaroni NAND architecture is reported for the first time, with a flash-like endurance of 104 cycles.
Abstract: A vertical ferroelectric HfO 2 field effect transistor based on 3-D macaroni NAND architecture is reported for the first time. Up to 2 V memory window was obtained after the application of 100 ns program/erase pulses. Flash-like endurance of 104 cycles is reported and first reliability assessments were performed.

Journal ArticleDOI
TL;DR: In this article, the carrier type evolves with increasing channel thickness, being p-type, ambipolar, and n-type at thicknesses 5 nm, respectively, attributed to changes in the bandgap of WSe2 as a function of the thickness and the carrier band offsets relative to the metal contacts.
Abstract: In this study, high-performance multilayer WSe2 field-effect transistor (FET) devices with carrier type control are demonstrated via thickness modulation and a remote oxygen plasma surface treatment. Carrier type control in multilayer WSe2 FET devices with Cr/Au contacts is initially demonstrated by modulating the WSe2 thickness. The carrier type evolves with increasing WSe2 channel thickness, being p-type, ambipolar, and n-type at thicknesses 5 nm, respectively. The thickness-dependent carrier type is attributed to changes in the bandgap of WSe2 as a function of the thickness and the carrier band offsets relative to the metal contacts. Furthermore, we present a strong hole carrier doping effect via remote oxygen plasma treatment. It non-degenerately converts n-type characteristics into p-type and enhances field-effect hole mobility by three orders of magnitude. This work demonstrates progress towards the realization of high-performance multilayer WSe2 FETs with carrier type control, potentially extendable to other transition metal dichalcogenides, for future electronic and optoelectronic applications.


Journal ArticleDOI
TL;DR: In this article, a β-Ga2O3 metal-semiconductor field effect transistor (MESFET) with a high off-state breakdown voltage (344 V) based on a quasi-two-dimensional field-plated with hexagonal boron nitride (h-BN) was demonstrated.
Abstract: We have demonstrated a β-Ga2O3 metal-semiconductor field-effect transistor (MESFET) with a high off-state breakdown voltage (344 V), based on a quasi-two-dimensional β-Ga2O3 field-plated with hexagonal boron nitride (h-BN). Both the β-Ga2O3 and h-BN were mechanically exfoliated from their respective crystal substrates, followed by dry-transfer onto a SiO2/Si substrate for integration into a high breakdown voltage quasi-two-dimensional β-Ga2O3 MESFETs. N-type conducting behavior was observed in the fabricated β-Ga2O3 MESFETs, along with a high on/off current ratio (>106) and excellent current saturation. A three-terminal off-state breakdown voltage of 344 V was obtained, with a threshold voltage of −7.3 V and a subthreshold swing of 84.6 mV/dec. The distribution of electric fields in the quasi-two-dimensional β-Ga2O3 MESFETs was simulated to analyze the role of the dielectric h-BN field plate in improving the off-state breakdown voltage. The stability of the field-plated β-Ga2O3 MESFET in air was confirmed...

Journal ArticleDOI
TL;DR: In this paper, the authors used scanning probe microscopy/spectroscopy (STM/STS) and angle-resolved photoelectron spectroscopy to show that TDS Na3Bi is 2D topological insulators with bulk bandgaps >400 meV in the absence of electric field.
Abstract: The electric field induced quantum phase transition from topological to conventional insulator has been proposed as the basis of a topological field effect transistor [1-4]. In this scheme an electric field can switch 'on' the ballistic flow of charge and spin along dissipationless edges of the two-dimensional (2D) quantum spin Hall insulator [5-9], and when 'off' is a conventional insulator with no conductive channels. Such as topological transistor is promising for low-energy logic circuits [4], which would necessitate electric field-switched materials with conventional and topological bandgaps much greater than room temperature, significantly greater than proposed to date [6-8]. Topological Dirac semimetals(TDS) are promising systems in which to look for topological field-effect switching, as they lie at the boundary between conventional and topological phases [3,10-16]. Here we use scanning probe microscopy/spectroscopy (STM/STS) and angle-resolved photoelectron spectroscopy (ARPES) to show that mono- and bilayer films of TDS Na3Bi [3,17] are 2D topological insulators with bulk bandgaps >400 meV in the absence of electric field. Upon application of electric field by doping with potassium or by close approach of the STM tip, the bandgap can be completely closed then re-opened with conventional gap greater than 100 meV. The large bandgaps in both the conventional and quantum spin Hall phases, much greater than the thermal energy kT = 25 meV at room temperature, suggest that ultrathin Na3Bi is suitable for room temperature topological transistor operation.

Journal ArticleDOI
TL;DR: The fabricated MoS2 NC-FETs enable fundamental applications through overcoming the Boltzmann limit in nanoelectronics and open up an avenue to low-power transistors needed for many exciting long-endurance portable consumer products.
Abstract: The Boltzmann distribution of electrons induced fundamental barrier prevents subthreshold swing (SS) from less than 60 mV dec-1 at room temperature, leading to high energy consumption of MOSFETs. Herein, it is demonstrated that an aggressive introduction of the negative capacitance (NC) effect of ferroelectrics can decisively break the fundamental limit governed by the "Boltzmann tyranny". Such MoS2 negative-capacitance field-effect transistors (NC-FETs) with self-aligned top-gated geometry demonstrated here pull down the SS value to 42.5 mV dec-1 , and simultaneously achieve superior performance of a transconductance of 45.5 μS μm and an on/off ratio of 4 × 106 with channel length less than 100 nm. Furthermore, the inserted HfO2 layer not only realizes a stable NC gate stack structure, but also prevents the ferroelectric P(VDF-TrFE) from fatigue with robust stability. Notably, the fabricated MoS2 NC-FETs are distinctly different from traditional MOSFETs. The on-state current increases as the temperature decreases even down to 20 K, and the SS values exhibit nonlinear dependence with temperature due to the implementation of the ferroelectric gate stack. The NC-FETs enable fundamental applications through overcoming the Boltzmann limit in nanoelectronics and open up an avenue to low-power transistors needed for many exciting long-endurance portable consumer products.

Journal ArticleDOI
TL;DR: The WTe2 SB field-effect transistor can provide the best performance and satisfy the requirement of the high-performance transistor outlined by the International Technology Roadmap for Semiconductors down to a 6 nm gate length.
Abstract: Monolayer Schottky barrier (SB) field-effect transistors based on the in-plane heterojunction of 1T/1T′-phase (metallic) and 2H-phase (semiconducting) transition-metal dichalcogenides (TMDs) have been proposed following the recent experimental synthesis of such devices. By using density functional theory and ab initio simulations, intrinsic device performance, sub-10 nm scaling, and performance boosting of MoSe2, MoTe2, WSe2, and WTe2, SB field-effect transistors are systematically investigated. We find that the Schottky barrier heights (SBHs) of these in-plane 1T(1T′)/2H contacts are proportional to their band gaps: the bigger band gap corresponds to bigger SBH. For four TMDs, the SBH of 1T/2H contact is always smaller than that of 1T′/2H contact. The WTe2 SB field-effect transistor can provide the best performance and satisfy the requirement of the high-performance transistor outlined by the International Technology Roadmap for Semiconductors down to a 6 nm gate length. In addition, the replacement of s...

Journal ArticleDOI
TL;DR: P-type two-dimensional steep-slope negative capacitance field-effect transistors are demonstrated for the first time with WSe2 as channel material and ferroelectric hafnium zirconium oxide in gate dielectric stack, suggesting the existence of internal amplification due to thenegative capacitance effect.
Abstract: P-type two-dimensional steep-slope negative capacitance field-effect transistors are demonstrated for the first time with WSe2 as channel material and ferroelectric hafnium zirconium oxide in gate dielectric stack. F4-TCNQ is used as p-type dopant to suppress electron leakage current and to reduce Schottky barrier width for holes. WSe2 negative capacitance field-effect transistors with and without internal metal gate structures and the internal field-effect transistors are compared and studied. Significant SS reduction is observed in WSe2 negative capacitance field-effect transistors by inserting the ferroelectric hafnium zirconium oxide layer, suggesting the existence of internal amplification (∼10) due to the negative capacitance effect. Subthreshold slope less than 60 mV/dec (as low as 14.4 mV/dec) at room temperature is obtained for both forward and reverse gate voltage sweeps. Negative differential resistance is observed at room temperature on WSe2 negative capacitance field-effect-transistors as the...

Journal ArticleDOI
TL;DR: Aiming to provide a comprehensive roadmap for the development of SiNW FET based sensing platforms, this work critically review and discuss the key design and fabrication aspects relevant to their development and integration within complementary metal-oxide-semiconductor (CMOS) technology.
Abstract: Owing to their two-dimensional confinements, silicon nanowires display remarkable optical, magnetic, and electronic properties. Of special interest has been the development of advanced biosensing approaches based on the field effect associated with silicon nanowires (SiNWs). Recent advancements in top-down fabrication technologies have paved the way to large scale production of high density and quality arrays of SiNW field effect transistor (FETs), a critical step towards their integration in real-life biosensing applications. A key requirement toward the fulfilment of SiNW FETs’ promises in the bioanalytical field is their efficient integration within functional devices. Aiming to provide a comprehensive roadmap for the development of SiNW FET based sensing platforms, we critically review and discuss the key design and fabrication aspects relevant to their development and integration within complementary metal-oxide-semiconductor (CMOS) technology.

Journal ArticleDOI
TL;DR: This work demonstrated a heterostructure n-channel depletion-mode β-Ga2O3 junction field-effect transistor (JFET) through van der Waals bonding with an exfoliated p-WSe2 flake, enabling miniaturization of the integrated power electronic systems.
Abstract: Layered materials separated from each bulk crystal can be assembled to form a strain-free heterostructure by using the van der Waals interaction. We demonstrated a heterostructure n-channel depletion-mode β-Ga2O3 junction field-effect transistor (JFET) through van der Waals bonding with an exfoliated p-WSe2 flake. Typical diode characteristics with a high rectifying ratio of ∼105 were observed in a p-WSe2/n-Ga2O3 heterostructure diode, where WSe2 and β-Ga2O3 were obtained by mechanically exfoliating each crystal. Layered JFETs exhibited an excellent IDS–VDS output as well as IDS–VGS transfer characteristics with a high on/off ratio (∼108) and low subthreshold swing (133 mV/dec). Saturated output currents were observed with a threshold voltage of −5.1 V and a three-terminal breakdown voltage of +144 V. Electrical performances of the fabricated heterostructure JFET were maintained at elevated temperatures with outstanding air stability. Our WSe2–Ga2O3 heterostructure JFET paves the way to the low-dimensiona...

Journal ArticleDOI
TL;DR: The fully deformable NW FETs withstand 3D volume changes of a rubber balloon with constant current output and can robustly operate without noticeable degradation on a mechanically dynamic soft matter surface, e.g., a pulsating balloon that mimics a beating heart.
Abstract: Deformable electronic devices that are impervious to mechanical influence when mounted on surfaces of dynamically changing soft matters have great potential for next-generation implantable bioelectronic devices. Here, deformable field-effect transistors (FETs) composed of single organic nanowires (NWs) as the semiconductor are presented. The NWs are composed of fused thiophene diketopyrrolopyrrole based polymer semiconductor and high-molecular-weight polyethylene oxide as both the molecular binder and deformability enhancer. The obtained transistors show high field-effect mobility >8 cm2 V-1 s-1 with poly(vinylidenefluoride-co-trifluoroethylene) polymer dielectric and can easily be deformed by applied strains (both 100% tensile and compressive strains). The electrical reliability and mechanical durability of the NWs can be significantly enhanced by forming serpentine-like structures of the NWs. Remarkably, the fully deformable NW FETs withstand 3D volume changes (>1700% and reverting back to original state) of a rubber balloon with constant current output, on the surface of which it is attached. The deformable transistors can robustly operate without noticeable degradation on a mechanically dynamic soft matter surface, e.g., a pulsating balloon (pulse rate: 40 min-1 (0.67 Hz) and 40% volume expansion) that mimics a beating heart, which underscores its potential for future biomedical applications.

Journal ArticleDOI
01 May 2018-Small
TL;DR: Photodetectors using a few PtSe2 -layered films as an adsorption layer synthesized at the low temperature on a flexible substrate exhibit a wide range of absorption and photoresponse with the highest photocurrent under the laser wavelength of 408 nm.
Abstract: The formation of PtSe2 -layered films is reported in a large area by the direct plasma-assisted selenization of Pt films at a low temperature, where temperatures, as low as 100 °C at the applied plasma power of 400 W can be achieved. As the thickness of the Pt film exceeds 5 nm, the PtSe2 -layered film (five monolayers) exhibits a metallic behavior. A clear p-type semiconducting behavior of the PtSe2 -layered film (≈trilayers) is observed with the average field effective mobility of 0.7 cm2 V-1 s-1 from back-gated transistor measurements as the thickness of the Pt film reaches below 2.5 nm. A full PtSe2 field effect transistor is demonstrated where the thinner PtSe2 , exhibiting a semiconducting behavior, is used as the channel material, and the thicker PtSe2 , exhibiting a metallic behavior, is used as an electrode, yielding an ohmic contact. Furthermore, photodetectors using a few PtSe2 -layered films as an adsorption layer synthesized at the low temperature on a flexible substrate exhibit a wide range of absorption and photoresponse with the highest photocurrent of 9 µA under the laser wavelength of 408 nm. In addition, the device can maintain a high photoresponse under a large bending stress and 1000 bending cycles.