scispace - formally typeset
Search or ask a question

Showing papers on "Focused ion beam published in 2006"


Journal ArticleDOI
TL;DR: A review of the relevant literature pertaining to both focused electron-beam-induced etching and deposition can be found in this paper, which summarizes the associated physics of electron-solid-vapor interactions, discusses related physical processes, and provides an introduction.
Abstract: Focused electron-beam-induced (FEB-induced) deposition and etching are versatile, direct-write nanofabrication schemes that allow for selective deposition or removal of a variety of materials. Fundamentally, these processes are governed by an electron-induced reaction with a precursor vapor, which may either result in decomposition to a solid deposit or formation of a volatile etch by-product. The ability to induce such localized reactions by placement of a nanometer-sized focused electron probe has recently drawn considerable attention. In response, we have reviewed much of the relevant literature pertaining to both focused electron-beam-induced etching and deposition. Because these nanoscale processing techniques are still in their relative infancy, a significant amount of scientific research is being conducted to understand, and hence improve, the processes. This article summarizes the associated physics of electron-solid-vapor interactions, discusses related physical processes, and provides an introdu...

421 citations


Journal ArticleDOI
TL;DR: In this article, the authors developed a new helium ion microscope which has many advantages over both traditional scanning electron microscopes (SEMs) and focused ion beams (FIBs).
Abstract: ALIS Corporation has developed a new helium ion microscope which has many advantages over both traditional scanning electron microscopes (SEMs) and focused ion beams (FIBs). This new technology is expected to produce an ultimate focused spot size of 0.25nm. This high resolution is attributed to the high source brightness (B>4×109A∕cm2sr), low energy spread (ΔE∕E∼2×10−5), and small diffraction effects (λ∼80fm). The interaction of helium ions with matter offers several valuable contrast mechanisms and a surface interaction volume which is much smaller than a SEM or conventional FIB.

384 citations


Journal ArticleDOI
TL;DR: The use of a new generation of dual beam electron microscopes capable of site-specific imaging of the interior of cellular and tissue specimens at spatial resolutions about an order of magnitude better than those currently achieved with optical microscopy is reported on.

325 citations


Journal ArticleDOI
TL;DR: In this article, a focused ion beam (FIB) system was used to produce highly symmetrical nanopores with diameters smaller than 5nm and can be used to create arrays of multiple nanopores simultaneously.
Abstract: Nanopores fabricated in solid-state membranes have previously been used for the rapid electrical detection and characterization of single biopolymer molecules. Various methods for producing solid-state nanopores have been reported, but fabricating nanopores of desired sizes controllably is still challenging. Here we report a fabrication technique which uses a focused ion beam (FIB) system to engineer nanopores precisely. This technique provides visual feedback over the formation process. The present method can produce highly symmetrical nanopores with diameters smaller than ~5?nm and can be used to create an array of multiple nanopores simultaneously. In addition, nanopores produced using the focused ion beam sculpting technique can be tailored down to less than 1?nm in diameter using high-energy electron radiation.

176 citations


Journal ArticleDOI
TL;DR: In this article, the microstructure around a hard Laves particle in a warm-rolled intermetallic Fe3Al-based alloy was studied using a system for three-dimensional orientation microscopy (3D electron backscattering diffraction, EBSD).

172 citations


Journal ArticleDOI
TL;DR: In this paper, the conventional FIB-TEM specimen preparation techniques are reviewed, and their advantages and shortcomings are compared, and a new technique suitable to prepare TEM samples from ultra-fine specimens is demonstrated.

158 citations


Journal ArticleDOI
TL;DR: It is anticipated that ‘cryo‐FIB thinning’ of bulk frozen‐hydratred material will be capable of producing specimens for TEM cryo-tomography with much greater efficiency than cryo‐ultramicrotomy, and without the specimen distortions and handling difficulties of the latter.
Abstract: Summary The feasibility of using a focused ion beam (FIB) for the purpose of thinning vitreously frozen biological specimens for transmission electron microscopy (TEM) was explored. A concern was whether heat transfer beyond the direct ion interaction layer might devitrify the ice. To test this possibility, we milled vitreously frozen water on a standard TEM grid with a 30-keV Ga+ beam, and cryo-transferred the grid to a TEM for examination. Following FIB milling of the vitreous ice from a thickness of approximately 1200 nm to 200–150 nm, changes characteristic of heat-induced devitrification were not observed by TEM, in either images or diffraction patterns. Although numerous technical challenges remain, it is anticipated that ‘cryo-FIB thinning’ of bulk frozen-hydratred material will be capable of producing specimens for TEM cryo-tomography with much greater efficiency than cryo-ultramicrotomy, and without the specimen distortions and handling difficulties of the latter.

154 citations


Journal ArticleDOI
Jie Lian1, Lumin Wang1, Xiangcheng Sun1, Qingkai Yu1, Rodney C. Ewing1 
TL;DR: In this article, a maskless method combining top-down and bottom-up patterning was proposed for the fabrication of ordered nanostructures with precisely controlled size, spacing, and location.
Abstract: Alternative fabrication and patterning of ordered nanostructures has become critically important as the size of devices reaches the nanoscale and the resolution of conventional optical lithography approaches its physical limit. Here, we have developed a simple method that allows one to pattern metallic surface nanostructures with precisely controlled size, spacing, and location using ion-beam-induced dewetting and Rayleigh instability. Predefined patterns by focused ion beam direct-writing were used as the templates for the self-organization of ordered nanostructures. Single or double chains, concentric rings, and two-dimensional arrays of metallic nanoparticles with a well-controlled spacing, diameter, and location were fabricated. This approach represents a maskless process that combines the top-down and bottom-up patterning methods, and no chemical etching or pattern transfer steps are involved. This method can be applied to many metallic systems in constructing complex, higher-order functional nanostr...

151 citations


Journal ArticleDOI
TL;DR: In this article, a magnetically enhanced, inductively coupled plasma ion source has been developed to address focused ion beam (FIB) applications not satisfied by the liquid metal ion source (LMIS) based FIB.
Abstract: A high brightness plasma ion source has been developed to address focused ion beam (FIB) applications not satisfied by the liquid metal ion source (LMIS) based FIB. The plasma FIB described here is capable of satisfying applications requiring high mill rates (>100μm3∕s) with non-gallium ions and has demonstrated imaging capabilities with sub- 100-nm resolution. The virtual source size, angular intensity, mass spectra, and energy spread of the source have been determined with argon and xenon. This magnetically enhanced, inductively coupled plasma source has exhibited a reduced brightness (βr) of 5.4×103Am−2sr−1V−1, with a full width half maximum axial energy spread (ΔE) of 10eV when operated with argon. With xenon, βr=9.1×103Am−2sr−1V−1 and ΔE=7eV. With these source parameters, an optical column with sufficient demagnification is capable of forming a sub-25-nm spot size at 30keV and 1pA. The angular intensity of this source is nominally three orders of magnitude greater than a LMIS making the source more a...

145 citations


Journal ArticleDOI
TL;DR: In this article, the authors demonstrate the localization of chemical functionality at the entrance of single nanopores for the first time by using the controlled growth of an oxide ring, which can be further functionalized with DNA probes via silane chemistry.
Abstract: We demonstrate the localization of chemical functionality at the entrance of single nanopores for the first time by using the controlled growth of an oxide ring. Nanopores were fabricated by Focused Ion Beam machining on silicon platforms, locally derivatized by ion beam assisted oxide deposition, and further functionalized with DNA probes via silane chemistry. Ionic current recorded through single nanopores at various stages of the fabrication process demonstrated that the apertures can be locally functionalized with DNA probes. Future applications for this functional platform include the selective detection of biological organisms and molecules by ionic current blockade measurements.

121 citations


Journal ArticleDOI
TL;DR: In this article, the Focused Ion Beam Technique (FIB) was used to reveal tribologically induced surface films and for cross-sectional preparation of superficial layers of brake pad and rotor.

Journal ArticleDOI
06 Sep 2006-Langmuir
TL;DR: The fabrication and electrical characterization of functionalized solid-state nanopores in low stress silicon nitride membranes and recorded ion currents flowing through a single nanopore revealed asymmetry in the ion conduction properties with the sign of the applied potential.
Abstract: We report on the fabrication and electrical characterization of functionalized solid-state nanopores in low stress silicon nitride membranes. First, a pore of approximately 50 nm diameter was drilled using a focused ion beam technique, followed by the local deposition of silicon dioxide. A low-energy electron beam induced the decomposition of adsorbed tetraethyl orthosilicate resulting in site-selective functionalization of the nanopore by the formation of highly insulating silicon oxide. The deposition occurs monolayer by monolayer, which allows for control of the final diameter with subnanometer accuracy. Changes in the pore diameter could be monitored in real time by scanning electron microscopy. Recorded ion currents flowing through a single nanopore revealed asymmetry in the ion conduction properties with the sign of the applied potential. The low-frequency excess noise observed at negative voltage originated from stepwise conductance fluctuations of the open pore.

Journal ArticleDOI
TL;DR: Focused ion beam and dual platform systems have, over the last 10 years, become a main stay of sample preparation for material analysis and the merits of using these systems are discussed and the three main techniques used to prepare cross‐section specimens for transmission electron microscopy (TEM) are compared.
Abstract: Focused ion beam and dual platform systems have, over the last 10 years, become a main stay of sample preparation for material analysis In this article the merits of using these systems are discussed and the three main techniques used to prepare cross-section specimens for transmission electron microscopy (TEM) are both discussed and compared with emphasis being placed on the tricks that users do to make the lamellae as thin as possible and with a minimum of damage at their sidewalls Other techniques such as serial slicing for three-dimensional reconstruction and the preparation of plan-view specimens are also summarized

Journal ArticleDOI
TL;DR: In this paper, a detailed study of the performance and behavior of surface plasmon polariton (SPP-Bragg) mirrors, designed for 45 × 45 ∞ incidence, based on this approach is performed.
Abstract: The development of surface plasmon polariton (SPP) optical elements is mandatory in order to achieve surface plasmon based photonics. A current approach to reach this goal is to take advantage of the interaction of SPP with defects and design elements obtained by the micro- or nano-structuration of the metal film. In this work, we have performed a detailed study of the performance and behavior of SPP-Bragg mirrors, designed for 45\ifmmode^\circ\else\textdegree\fi{} incidence, based on this approach. Mirrors consisting of gratings of both metal ridges on the metal surface and grooves engraved in the metal, fabricated by means of electron beam lithography and focused ion beam, have been considered. The performance of the mirrors has been characterized via near-field optical microscopy. An original procedure to obtain quantitative values of the mirrors' reflectivity and transmission coefficient from the near-field images is exposed. The mirrors composed of metal ridges are shown to act very efficiently, and a rather low number of elements (15 for the specific geometry studied) is able to deflect almost 100% of the incoming power. Conversely, the arrays of grooves produce a much lower reflectivity, which we attribute mostly to radiative scattering in the forward direction induced by the grooves. Besides, the considered systems have also been simulated by using the differential method. The results obtained from the numerical calculations present an excellent agreement with the experimental data, proving the reliability of this method to predict the behavior of this kind of systems while interacting with SPP. Based on the numerical modeling of the SPP-Bragg mirrors, the evolution of the mirrors' behavior with the ridges height is analyzed.

Journal ArticleDOI
TL;DR: In this paper, the authors reported on the Raman and photoluminescence characterization of three-dimensional microstructures fabricated in single crystal diamond with a focused ion beam (FIB) assisted lift-off technique.

Journal ArticleDOI
01 Sep 2006-Carbon
TL;DR: In this article, natural graphite (NG) spheres were coated by pyrolytic carbon from the thermal decomposition of C2H2/Ar at 950 C in a fluidized bed reactor.

Patent
29 Dec 2006
TL;DR: In this paper, conditions are maintained that produce a substantial ion density and limit the transverse kinetic energy of the ions to less than 0.7 eV; the ionization volume adjacent the aperture is limited to width less than about three times the width of the aperture; magnetic fields are avoided or limited; low ion beam noise is maintained; conditions within the ionisation chamber are maintained to prevent formation of an arc discharge.
Abstract: Ion implantation with high brightness, ion beam by ionizing gas or vapor, e.g. of dimers, or decaborane, by direct electron impact ionization adjacent the outlet aperture (46, 176) of the ionization chamber (80; 175)). Preferably: conditions are maintained that produce a substantial ion density and limit the transverse kinetic energy of the ions to less than 0.7 eV; width of the ionization volume adjacent the aperture is limited to width less than about three times the width of the aperture; the aperture is extremely elongated; magnetic fields are avoided or limited; low ion beam noise is maintained; conditions within the ionization chamber are maintained that prevent formation of an arc discharge. With ion beam optics, such as the batch implanter of Figure (20), or in serial implanters, ions from the ion source are transported to a target surface and implanted; advantageously, in some cases, in conjunction with acceleration-deceleration beam lines employing cluster ion beams. Also disclosed are electron gun constructions, ribbon sources for electrons and ionization chamber configurations. Forming features of semiconductor devices, e.g. drain extensions of CMOS devices, and doping of flat panels are shown.

Journal ArticleDOI
TL;DR: In this paper, the material layers underneath the worn surfaces of a hypereutectic Al-Si alloy (A390) subjected to dry sliding wear in air and argon atmospheres were characterized.
Abstract: The material layers underneath the worn surfaces of a hypereutectic Al–Si alloy (A390) subjected to dry sliding wear in air and argon atmospheres were characterized. The samples were tested at a constant load of 10 N and a sliding velocity of 1 m/s using a block-on-ring tribometer. The counterface material was a SAE 52100 bearing steel. The wear rate of the alloy tested in an argon atmosphere (3.05 × 10 −5 mm 3 /m) was 10 times lower compared to that of the sample tested in air (2.96 × 10 −4 mm 3 /m). The subsurface microstructures generated under the two different test environments were characterized using a scanning electron microscope (SEM), electron probe micro-analyzer (EPMA), focused ion beam (FIB) microscope and transmission electron microscope (TEM). Cross-sectional TEM specimens were prepared using a FIB “lift-out” technique. TEM analysis indicated that the tribolayers formed on the sample tested in air contained significant amounts of iron, aluminum and oxygen. In addition, the tribolayers formed in air were hard and appeared to be severely fractured as an indication of their brittleness due to the large amount of oxide present. On the contrary, a much lower amount of iron and oxygen were found in the tribolayers formed in argon, which were a mechanical mixture of mainly ultra-fine grained aluminum (∼100 nm) and silicon. The tribolayers formed in argon were more stable on the contact surfaces, which reduced the wear rates of A390.

Journal ArticleDOI
TL;DR: In this article, an axicon with [emailprotected] diameters and [email protected] high is fabricated, which permits the transformation of a Gaussian mode in a Bessel mode beam.

Journal ArticleDOI
TL;DR: In this paper, the microstructure of micron-sized Si, Au, and Al pillars fabricated by focused ion beam machining was investigated using white-beam x-ray microdiffraction.
Abstract: White beam x-ray microdiffraction is used to investigate the microstructure of micron-sized Si, Au, and Al pillars fabricated by focused ion beam (FIB) machining. Comparison with a Laue pattern obtained from a Si pillar made by reactive ion etching reveals that the FIB damages the Si structure. The Laue reflections obtained from the metallic pillars fabricated by FIB show continuous and discontinuous streakings, demonstrating the presence of strain gradients.

Journal ArticleDOI
TL;DR: In this article, focused ion beam (FIB) induced Pt deposition was used to grow GaN nanowires with diameters ranging from 100nm to 250nm and lengths up to 200μm.
Abstract: In this work we have demonstrated nanoscale GaN device structures made from individual GaN nanowires and electrical contacts utilizing focused ion beam (FIB) induced Pt deposition. These GaN nanowires were grown by direct reaction of Ga vapor with NH3 and had diameters ranging from 100nmto250nm and lengths up to 200μm. As-grown nanowires were dispersed on SiO2 coated p++ Si substrate. A 30keV Ga+ ion beam was used to dissociate (trimethyl)methylcyclopentadienyl-platinum precursor for depositing Pt contacts to GaN nanowires. FIB-deposited Pt contacts to GaN nanowires showed nonlinear I-V characteristics, which turned linear after annealing at 500°C for 30s in argon. Resistivity of a GaN nanowire measured using a four terminal contact geometry fabricated by depositing Pt with a FIB was in the range of 5×10−3Ωcm. Temperature dependent resistivity measurement of the GaN nanowire revealed semiconducting behavior with a weak temperature dependence of the resistivity. In this study both Ohmic and Schottky contac...

Journal ArticleDOI
27 Jan 2006-Langmuir
TL;DR: A new, universally applicable standard specimen is reported that enables one to accurately calibrate all types of AFM cantilevers and tips for quantitative friction force measurements and allows one to conveniently perform quantitative nanotribological measurements for a wide range of materials and applications.
Abstract: The quantitative determination of friction forces by atomic force microscopy (AFM) in nanotribology requires the conversion of the output voltage signal of the sector area-sensitive photodiode to force using (a) the torsional spring constant of the cantilever and (b) the lateral sensitivity of the photodiode. Many existing methods provide calibration factors with large errors and suffer from poor reproducibility. We report on the fabrication, validation, and application of a new, universally applicable standard specimen that enables one to accurately calibrate all types of AFM cantilevers and tips for quantitative friction force measurements. The Si(100) calibration standard, which exhibits 30 and 50 m wide notches with tilt angles 8 between 20 and 35 degree with respect to the wafer surface, was fabricated by focused ion beam (FIB) milling. The quantification of friction forces obtained on this universal standard specimen using a direct method (the improved wedge calibration method, as introduced by Ogletree, Carpick, and Salmeron Rev. Sci. Instrum. 1996, 67, 3298-3306), which yields (a) and (b) simultaneously, was critically tested for various types of Si3N4 integrated cantilever-tip assemblies. The error in the calibration factors obtained was found to be ca. 5%, which is a significant improvement compared to errors of 30-50% observed for the often applied two-step calibration procedures of cantilever lateral force constant and photodiode sensitivity. As demonstrated for oxidized Si(100), thin films of poly(methyl methacrylate) (PMMA), and micropatterned self-assembled monolayers (SAMs) on gold, the calibration of various V-shaped and single beam cantilevers based on the application of the new universal standard in conjunction with the direct wedge method proposed allows one to conveniently perform quantitative nanotribological measurements for a wide range of materials and applications.

Journal ArticleDOI
TL;DR: In this paper, a high-spatial-resolution scanning x-ray fluorescence microscope (SXFM) using Kirkpatrick-Baez mirrors was developed, where the full width at half maximum of the focused beam was achieved to be 50×30nm2 (V×H) under the best focusing conditions.
Abstract: We developed a high-spatial-resolution scanning x-ray fluorescence microscope (SXFM) using Kirkpatrick-Baez mirrors. As a result of two-dimensional focusing tests at BL29XUL of SPring-8, the full width at half maximum of the focused beam was achieved to be 50×30nm2 (V×H) under the best focusing conditions. The measured beam profiles were in good agreement with simulated results. Moreover, beam size was controllable within the wide range of 30–1400nm by changing the virtual source size, although photon flux and size were in a trade-off relationship. To demonstrate SXFM performance, a fine test chart fabricated using focused ion beam system was observed to determine the best spatial resolution. The element distribution inside a logo mark of SPring-8 in the test chart, which has a minimum linewidth of approximately 50–60nm, was visualized with a spatial resolution better than 30nm using the smallest focused x-ray beam.

BookDOI
22 Feb 2006
TL;DR: Cogin Schwartz and Srikrishnan as mentioned in this paper proposed a method for separating and etching of thin-film conductors for chip integration and showed that it is possible to use spin-on-glasses (SOGs) for separating thin film conductors.
Abstract: METHODS/PRINCIPLES OF DEPOSITION AND ETCHING OF THIN FILMS Geraldine Cogin Schwartz Introduction Evaporation Chemical Vapor Deposition Photoenhanced CVD Plasma Processing Electrochemical Deposition Spin Coating Conclusion References CHARACTERIZATION Geraldine Cogin Schwartz Introduction Optical Characterization of Dielectric Films Infrared (IR) Spectroscopy Resistivity of Metal Films Thickness Dielectric Constant of Dielectrics Breakdown Strength Adhesion Mechanical Properties Thermal Properties Auger Electron Spectroscopy (AES) X-Ray Photoelectron Spectroscopy (XPS): Also Called Electron Spectroscopy for Chemical Analysis (ESCA) Secondary Ion Mass Spectroscopy (SIMS) Electron Microprobe X-Ray Fluorescence Spectrometry (XRFS) Hydrogen Analysis Rutherford Backscattering Spectrometry (RBS) Specular X-Ray Reflectivity (SXR) Small-Angle Neutron Scattering (SANS) Positronium Annihilation Lifetime Spectroscopy (PALS) Ellipsometric Porosimetry (EP) Scanning Electron Microscope (SEM) Transmission Electron Microscope (TEM) Focused Ion Beam (FIB) Atomic Force Microscope (AFM) Thermal Wave-Modulated Optical Reflectance Imaging (TW) X-Ray Diffraction (XRD) Wet Chemical Methods Chromatography Other Analytical Techniques Thermometry Electrochemical Methods Plasma Diagnostics References SEMICONDUCTOR CONTACT TECHNOLOGY David R. Campbell, Revised by Catherine Ivers Introduction Importance of Contact Technology Electrical Aspects of Silicon Contacts Material Aspects Ohmic Contacts Active Device Contacts Contact Studs for ULSI Conclusions References INTERLEVEL DIELECTRICS Geraldine Cogin Schwartz and K.V. Srikrishnan Introduction Inorganic Dielectric Films Spin-On Glasses (SOGs) Low Dielectric Constant Films Barrier Dielectric Film: a-SiC:H Porous Dielectric Films Plasma-Assisted Etching of Organic Films Reactive Ion Etching of Low-e Interlevel Dielectric Films Conclusions References METALLIZATION Geraldine Cogin Schwartz and K.V. Srikrishnan Introduction Aluminum Aluminum Alloys Copper Tungsten Patterning of Aluminum and Aluminum Alloys Patterning of Copper Patterning of Tungsten Structure of Metal Films Chapter Summary References CHIP INTEGRATION Geraldine Cogin Schwartz and K.V. Srikrishnan Introduction Topography, Step Coverage, and Planarization Spin-On Films Step Coverage by Deposited Films In Situ Planarization/Gap-Fill of Dielectric Films Etch-Back Processes Step Coverage, Hole-Fill Planarization of Metals Evaporation Sputter Deposition of Metals Directional Sputtering High-Density Plasmas Beam Techniques Flowage of Metal Films CVD Metals Electrochemical Deposition of Copper Embedment (Inlaid) Processes Chemical Mechanical Planarization (CMP) CMP of Inorganic Dielectric Films CMP of Low-e Films CMP of Metals Post-CMP Cleaning Problems with CMP Impact of CMP Conclusions on Topography Remaining Issues for Chip Integration Process/Structure Choice Conflicts Processes Reliability Manufacturability Wafer Size Concluding Remarks on Compatibility of Materials and Processing References RELIABILITY James R. Lloyd and Kenneth P. Rodbell Introduction Thin-Film Interconnect Reliability Behavior of Thin-Film Conductors in Stress Voiding and Electromigration Testing Electromigration Behavior of Via Chains Corrosion Insulator Reliability Concluding Remarks References INDEX

Journal ArticleDOI
TL;DR: In this article, a Co-20 at.% Ni polycrystal produced by electrodeposition has been investigated in planar and cross sections using orientation microscopy in conjunction with high-resolution scanning electron and focused ion beam microscopy.

Journal ArticleDOI
TL;DR: In this paper, the FIB induced damages in the preparation of TEM specimen were studied by TEM and X-ray Energy Dispersive Spectroscopy (EDX).

Journal ArticleDOI
TL;DR: The structural quality of nanowires grown from implanted substrates is comparable to those grown on wafers with evaporated gold films, which opens up new possibilities for local growth of SiNWs by implanting through masks or using a focused ion beam technique as discussed by the authors.
Abstract: Silicon nanowires (SiNWs) were synthesized by the vapour–liquid–solid (VLS) growth mechanism using gold implanted silicon substrates Implantation of high ion fluences leads to an amorphized silicon layer at the wafer surface During annealing the Au in the implanted region agglomerates and yields Au droplets at the surface upon recrystallization of the amorphous layer The structural quality of nanowires grown from implanted substrates is comparable to those grown on wafers with evaporated gold films This opens up new possibilities for local growth of SiNWs by implanting through masks or using a focused ion beam technique

Journal ArticleDOI
TL;DR: In this paper, the top silver layer was etched by a focused ion beam to mill an array of identical slits covering an area of 0.75 mm 2. This was undertaken in a manner that gave well-formed slits with minimal bridging, while at the same time minimizing the damage to the dielectric core.
Abstract: Next the top silver layer was etched by a focused ion beam to mill an array of identical slits covering an area of 0.75 mm 2 . This was undertaken in a manner that gave well-formed slits with minimal bridging, while at the same time minimizing the damage to the dielectric core. The width of each slit w50 nm is significantly less than the visible radiation wavelength, and the periodicity of the array is g =340 nm. The choice of these parameters was based upon initial modeling studies that took into account the resolution limitations of the fabrication process together with the requirement to observe well-defined resonances in the visible regime. The geometrical parameters of the structure are determined from scanning electron microscope SEM imaging Table I; an image of a typical region of the sample surface is presented in Fig. 1b. The dispersion of the modes is determined by recording the spectra of the specularly reflected beam as a function of the angle of incidence . A collimated beam from a tungsten halogen lamp was spectrally filtered by a monochromator. The intensity of the incident light was modulated using a mechanical chopper to allow lock-in detection, and a beam splitter redirected a small fraction of the incident light onto a second detector, allowing for source intensity fluctua

Journal ArticleDOI
01 Nov 2006-Carbon
TL;DR: Inspired by a special biological structure in nature, a kind of urchin-like nano/micro hybrid design was proposed to modify conventional micrometer-sized electroactive materials for lithium ion battery.

Journal ArticleDOI
TL;DR: In this paper, a deposition of Al-doped ZnO (AZO) films with various film thicknesses on glass substrates was performed to investigate the feasibility of using AZO films as anode electrodes in organic light-emitting devices (OLEDs).