Topic
Focused ion beam
About: Focused ion beam is a research topic. Over the lifetime, 12154 publications have been published within this topic receiving 179523 citations. The topic is also known as: FIB.
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TL;DR: In this article, an isolated double-hole indentation, with concentric rings, was used to obtain highly localized surface-enhanced Raman scattering (SERS) from regions much smaller than the optical wavelength.
Abstract: An isolated double-hole indentation, with concentric rings, in a metal film was used to obtain highly localized surface-enhanced Raman scattering (SERS) from regions much smaller than the optical wavelength. The structure was created by a focused ion beam (FIB) milling partially through the 100 nm thick gold film to a depth of 50 nm. Significant SERS enhancement was observed for both oxazine 720 and rhodamine 6G. The SERS was polarization-dependent because of the biaxial symmetry of the double-hole at the apexes where the indentations overlap; these apexes were responsible for the strong subwavelength focusing. The finite-difference time-domain method was used to calculate the electromagnetic field of the nanostructure, and it showed strong polarization-dependent focusing, in agreement with the experimentally observed SERS enhancement. On the basis of these calculations, it is estimated that the 60% polarization-dependent SERS enhancement is the result of only ∼1300 molecules in the region of the apexes, ...
62 citations
TL;DR: The capability to write nanometer-scale patterns (line width approximately 12 nm) opens up a variety of possibilities for fabricating nanomolds for imprint lithography, and a wide range of two- or three-dimensional components for future nanoelectromechanical systems.
Abstract: Completely glassy thin films of Zr-Al-Cu-Ni exhibiting a large super-cooled liquid region (deltaTx = 95 K), very smooth surface (Ra = 0.65 nm), and an extremely high value of Vicker's hardness (Hv = 940), as compared to bulk Zr-Al-Cu-Ni metallic glass, were deposited by radiofrequency magnetron sputtering. Nanoscale patterning ability of Zr-Al-Cu-Ni metallic glass thin films was demonstrated by a focused ion beam etching. The capability to write nanometer-scale patterns (line width approximately 12 nm) opens up a variety of possibilities for fabricating nanomolds for imprint lithography, and a wide range of two- or three-dimensional components for future nanoelectromechanical systems.
62 citations
TL;DR: A material may be removed from the top electrode of a film bulk acoustic resonator to alter the mass loading effect and to adjust the frequency of one film bulk resonator on a wafer relative to other resonators on the same wafer as mentioned in this paper.
Abstract: A material may be removed from the top electrode of a film bulk acoustic resonator to alter the mass loading effect and to adjust the frequency of one film bulk acoustic resonator on a wafer relative to other resonators on the same wafer. Similarly, the piezoelectric layer or the bottom electrode may be selectively milled with a focused ion beam to trim the resonator.
62 citations
Patent•
07 Aug 1992
TL;DR: In this paper, a resist exposed to a micron or sub-micron pattern of highly absorbed ion beams forms a highly crosslinked barrier layer in the exposed regions of the resist surface.
Abstract: A resist exposed to a micron or sub-micron pattern of highly absorbed ion beams forms a highly crosslinked barrier layer in the exposed regions of the resist surface. The complementary surface regions are silylated in a silicon-containing reagent, and the exposed regions are then removed by a plasma etch. Pattern definition is enhanced by limiting the exposure and the silylation to the surface of the resist. The process allows feature definition below 1000 Angstroms using a relatively inexpensive single element low energy ion source.
62 citations
TL;DR: Using a 1MHz length-extension type of quartz resonator as a force sensor for frequency-modulation atomic force microscopy (AFM), atomically resolved images of the Si(111)-(7×7) surface was obtained as mentioned in this paper.
Abstract: Using a 1MHz length-extension type of quartz resonator as a force sensor for frequency-modulation atomic force microscopy (AFM), atomically resolved images of the Si(111)-(7×7) surface was obtained. Fabrications of a tip attached at the front end of the resonator by focused ion beam, and removal of the native oxide layer on the tip by in-situ field ion microscopy are found effective for achieving the highly-resolved AFM imaging.
62 citations