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Focused ion beam

About: Focused ion beam is a research topic. Over the lifetime, 12154 publications have been published within this topic receiving 179523 citations. The topic is also known as: FIB.


Papers
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Journal ArticleDOI
TL;DR: In this paper, dense coatings that formed adequate metallurgical bonds with the substrate were obtained by overlapping coaxial laser cladding, which can be an alternative method to thermal spraying in the production of high quality bond coatings in TBCs.
Abstract: The development of coatings has become technologically significant in many industries. A common approach in high temperature applications is the production of new thermal barrier coatings (TBCs). Laser cladding (LC) can be an alternative method to thermal spraying in the production of high quality bond coats in TBCs. In this work, dense coatings that formed adequate metallurgical bonds with the substrate were obtained by overlapping coaxial laser cladding. The oxidation behavior of the coating specimens was assessed by air furnace oxidation tests at 1100 °C for up to 200 h. The coatings' microstructures are composed of a γ matrix phase and a β interdendritic phase, confirmed by X-ray diffraction (XRD). At high temperatures, the growth and formation of oxide layers protect the underlying coating and substrate from oxidation at elevated temperatures. The possible formation and morphology of oxides on the oxidized surface were evaluated using scanning electron microscopy (SEM), XRD and atom force microscopy (AFM). The evaluation of the thickness and phases present in thermally grown oxide scales was evaluated using field emission scanning electron microscopy (FESEM) and energy dispersive spectroscopy microanalysis (EDS), with a previous cut using the Focused Ion Beam Ga Column (FIB) method.

58 citations

Proceedings ArticleDOI
29 Jan 1989
TL;DR: In this paper, a broad-beam ion source was used for optical figuring, where the ion beam produced by a Kaufman ion source consists of a number of ions traveling in a (typi-cally) slightly diverging beam, along with an equal flux of lower energy electrons.
Abstract: During recent years, economic and technological pressures have driven research for higher performance optical fabrication techniques. Among the candidate figuring technologies is ion beam sputtering in which material is removed from the optical surface by the kinetic interaction of ions and atoms or molecules of the surface. The first use of sputtering as a means for optical figuring occurred in the mid 1960's [1,2], and the technique has been investigated by several groups since that time. The prior work was done primarily with ion sources producing high energy (20KeV and above), low current (fraction of a milliampere), narrow (usually less than one millimeter) ion beams. The low current directly translates to low removal rates, while the high energy contributes to radiation damage, ion implantation, and other effects. In the present work the low current, high energy source is replaced with a Kaufman broad-beam ion source[3]. These sources produce higher ion currents at lower energies, thus giving faster removal with minimal surface damage. The ion beam produced by a Kaufman ion source consists of a number of ions traveling in a (typi-cally) slightly diverging beam, along with an equal flux of lower energy electrons. The electrons are injected into the ion beam to reduce electrostatic repulsion in the beam, but also to prevent the charging of dielectric targets.

58 citations

Journal ArticleDOI
TL;DR: In this article, Steaming-induced mesopores of individual ZSM-5 crystals were studied by a combination of focused ion beam (FIB) and scanning electron microscopy (SEM) tomography.
Abstract: Break on through: Steaming-induced mesopores of individual ZSM-5 crystals were studied by a combination of focused ion beam (FIB) and scanning electron microscopy (SEM) tomography (see picture). In this manner, quantitative insight into the width, length, morphology, and distribution of mesopores generated within zeolite crystals has been obtained. Keywords:crystal intergrowth;scanning probe microscopy;mesoporosity;tomography;zeolites

58 citations

Journal ArticleDOI
TL;DR: The combination of lithium trapping and apparent morphological densification evolution in NiO is believed to account for the degradation of the ECD properties upon long term cycling of the WO/WO/ITO/ NiO ECD.
Abstract: The visualization of the microstructure change and of the depth of lithium transport inside a monolithic ElectroChromic Device (ECD) is realized using an innovative combined approach of Focused Ion Beam (FIB), Secondary Ion Mass Spectrometry (SIMS) and Glow Discharge Optical Emission Spectroscopy (GDOES). The electrochemical and optical properties of the all-thin-film inorganic ECD glass/ITO/WO3/LiTaO3/NiO/ITO, deposited by magnetron sputtering, are measured by cycling voltammetry and in situ transmittance analysis up to 11 270 cycles. A significant degradation corresponding to a decrease in the capacity of 71% after 2500 cycles and of 94% after 11 270 cycles is reported. The depth resolved microstructure evolution within the device, investigated by cross-sectional cutting with FIB, points out a progressive densification of the NiO layer upon cycling. The existence of irreversible Li ion trapping in NiO is illustrated through the comparison of the compositional distribution of the device after various cycles 0, 100, 1000, 5000 and 11 270. SIMS and GDOES depth profiles confirm an increase in the trapped Li content in NiO as the number of cycles increases. Therefore, the combination of lithium trapping and apparent morphological densification evolution in NiO is believed to account for the degradation of the ECD properties upon long term cycling of the ECD.

58 citations

Patent
24 Apr 1989
TL;DR: In this article, a monoenergetic ion source for the generation of an ion beam is described with the ion energies which lie below 100 eV and also above 5 keV being capable of being freely selected so that the whole range of intermediate energies and independently of the selected ion current density with the aid of the operating parameters of the source.
Abstract: A monoenergetic ion source for the generation of an ion beam is described with the ion energies which lie below 100 eV and also above 5 keV being capable of being freely selected so that the whole range of intermediate energies and independently of the selected ion current density with the aid of the operating parameters of the source. The ion current density is so freely adjustable independently of the ion energy. The ion source is provided with an optical beam focussing system and can in particular also be used to produce metal ions. This ion source also makes a special coating process possible which is likewise described here.

58 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
202394
2022278
2021251
2020329
2019351
2018347