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Focused ion beam

About: Focused ion beam is a research topic. Over the lifetime, 12154 publications have been published within this topic receiving 179523 citations. The topic is also known as: FIB.


Papers
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Journal ArticleDOI
TL;DR: AMADEUS-2D as discussed by the authors is a two-dimensional string-based simulation software for ion milling and focused ion beam direct fabrication, which discusses the numerical model for considering sputtering and re-deposition fluxes.
Abstract: The shrinking critical dimensions of modern technology place heavy requirements on optimizing feature shapes at the micro and nano scale. Ion beams are increasingly used for technology development in the nano-scale world. In recent years, many approaches and research results have indicated that re-deposition of sputtered target atoms is the most serious problem in fabricating micro and nano devices. A simulation tool is essential to reduce unnecessary time and efforts spent in process development. In this paper, we present two-dimensional string-based simulation software for ion milling and focused ion beam direct fabrication, AMADEUS-2D (advanced modeling and design environment for sputter processes). We discuss the numerical model for considering sputtering and re-deposition fluxes. In addition, we investigate sputtering yield and sputtered atom distributions as obtained from several binary collision simulation codes. The newly developed simulation code is validated by comparison with experimental data on single-pixel hole milling, on the width and dose dependence of trench formation and on the effective sputtering yield as a function of scan speed.

48 citations

Patent
10 Dec 1980
TL;DR: In this paper, a surface reaction process for controlled oxide growth is disclosed using a directed, low energy ion beam for compound or oxide formation, and the technique is evaluated by fabricating Ni-oxide-Ni and Cr-oxideNi tunneling junctions, using directed oxygen ion beams with energies ranging from about 30 to 180 eV.
Abstract: A surface reaction process for controlled oxide growth is disclosed using a directed, low energy ion beam for compound or oxide formation. The technique is evaluated by fabricating Ni-oxide-Ni and Cr-oxide-Ni tunneling junctions, using directed oxygen ion beams with energies ranging from about 30 to 180 eV. In one embodiment, high ion current densities are achieved at these low energies by replacing the conventional dual grid extraction system of the ion source with a single fine mesh grid. Junction resistance decreases with increasing ion energy, and oxidation time dependence shows a characteristic saturation, both consistent with a process of simultaneous oxidation and sputter etching, as in the conventional r.f. oxidation process. In contrast with r.f. oxidized junctions, however, ion beam oxidized junctions contain less contamination by backsputtering, and the quantitative nature of ion beam techniques allows greater control over the growth process.

48 citations

PatentDOI
TL;DR: In this article, a focused ion beam (FIB) was used to produce a series of nucleation sites on the substrate surface, which can be either formed by lattice damage or sputtering directly in the substrate material.

48 citations

Journal ArticleDOI
24 Sep 2012-PLOS ONE
TL;DR: The results show that the large nanopore in thick membrane with an improved stability and throughput also has the ability to detect the molecules at a single molecular level, as well as slows down the velocity of molecules passing through the pore.
Abstract: Nanopores have become an important tool for molecule detection at single molecular level. With the development of fabrication technology, synthesized solid-state membranes are promising candidate substrates in respect of their exceptional robustness and controllable size and shape. Here, a 30-60 (tip-base) nm conical nanopore fabricated in 100 nm thick silicon nitride (Si(3)N(4)) membrane by focused ion beam (FIB) has been employed for the analysis of λ-DNA translocations at different voltage biases from 200 to 450 mV. The distributions of translocation time and current blockage, as well as the events frequencies as a function of voltage are investigated. Similar to previously published work, the presence and configurations of λ-DNA molecules are characterized, also, we find that greater applied voltages markedly increase the events rate, and stretch the coiled λ-DNA molecules into linear form. However, compared to 6-30 nm ultrathin solid-state nanopores, a threshold voltage of 181 mV is found to be necessary to drive DNA molecules through the nanopore due to conical shape and length of the pore. The speed is slowed down ∼5 times, while the capture radius is ∼2 fold larger. The results show that the large nanopore in thick membrane with an improved stability and throughput also has the ability to detect the molecules at a single molecular level, as well as slows down the velocity of molecules passing through the pore. This work will provide more motivations for the development of nanopores as a Multi-functional sensor for a wide range of biopolymers and nano materials.

48 citations

Journal ArticleDOI
TL;DR: Target preparation of biological samples by the FIB technique offers the possibility of preparing not only soft materials but also hybrid samples (soft/hard materials).

48 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
202394
2022278
2021251
2020329
2019351
2018347