Topic
Focused ion beam
About: Focused ion beam is a research topic. Over the lifetime, 12154 publications have been published within this topic receiving 179523 citations. The topic is also known as: FIB.
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TL;DR: In this article, the authors report on the transport of energetic electrons through single, well aligned multi-wall carbon nanotubes (CNTs) by using focused ion beam based sample preparation techniques for the non-destructive isolation and alignment of individual tubes.
Abstract: We report on the transport of energetic electrons through single, well aligned multi-wall carbon nanotubes (CNT). Embedding of CNTs in a protective carbon fiber coating enables the application of focused ion beam based sample preparation techniques for the non-destructive isolation and alignment of individual tubes. Aligned tubes with lengths of 0.7 to 3 mu m allow transport of 300 keV electrons in a transmission electron microscope through their hollow cores at zero degree incident angles and for a misalignment of up to 1 degree.
45 citations
TL;DR: In this article, the influence of the redeposition effect on the focused ion beam 3D micromachining process of silicon is discussed, and avoidance methods are suggested as a result of the analysis.
Abstract: The influence of the redeposition effect on the focused ion beam 3D micromachining process of silicon is discussed. Milling of some typical patterns in which redeposition is serious has been carried out. Experimental results are analysed in combination with a theoretical model. It can be seen from the analysis that the order of recycle-milling is very important for 3D microfabrication owing to redeposition during the process. In addition, the parameters of beam current, ion beam spot size, etc. are also key factors in the process. A groove and dome shape will be formed at the root of the sidewall and the bottom of the pattern, respectively, because of the ion sputtering yield variation and sidewall redeposition. Finally, avoidance methods are suggested as a result of the analysis.
45 citations
TL;DR: In this article, a Carl Zeiss ORION™ helium ion microscope was used along with an OmniGIS unit to deposit platinum while exploring a variety of controllable parameters such as beam current, beam overlap, and size of deposition.
Abstract: Helium ion microscopy is now a demonstrated practical technology that possesses the resolution and beam currents necessary to perform nanofabrication tasks, such as circuit edit applications. Due to helium’s electrical properties and sample interaction characteristics relative to gallium, it is likely that the properties and deposition characteristics of beam induced deposited films will be different than those produced using gallium focused ion beam technology. However, there is at this date very little literature discussing the use of helium beams for beam induced chemistry or characterization of the resulting films. In this article, the authors present initial results regarding the deposition of platinum using a helium ion microscope and a gaseous organometallic precursor. Within this work a Carl Zeiss ORION™ helium ion microscope was used along with an OmniGIS unit to deposit platinum while exploring a variety of controllable parameters such as beam current, beam overlap, and size of deposition.
45 citations
TL;DR: The droplet nucleation mechanism unveiled in this work would enable the design of new surfaces with enhanced dropwise condensation heat transfer by enabling explanation of the nucleations mechanism under unsaturated conditions.
Abstract: Water condensation on a hybrid hydrophilic–hydrophobic surface was investigated to reveal nucleation mechanisms at the microscale. Focused ion beam (FIB) irradiation was used to change the wettabil...
45 citations
TL;DR: A procedure based on focused ion beam milling and in situ lift-out is introduced for the preparation of high-quality specimens for in situ annealing experiments in the transmission electron microscope to minimize redeposition and damage.
Abstract: A procedure based on focused ion beam milling and in situ lift-out is introduced for the preparation of high-quality specimens for in situ annealing experiments in the transmission electron microscope. The procedure allows an electron-transparent lamella to be cleaned directly on a heating chip using a low ion energy and back-side milling in order to minimize redeposition and damage. The approach is illustrated through the preparation of an Al–Mn–Fe complex metallic alloy specimen.
45 citations