Focused ion beam

About: Focused ion beam is a research topic. Over the lifetime, 12154 publications have been published within this topic receiving 179523 citations. The topic is also known as: FIB.

Measurement and noise performance of nano-superconducting-quantum-interference devices fabricated by focused ion beam

Abstract: Science and industry demand ever more sensitive measurements on ever smaller systems, as exemplified by spintronics, nanoelectromechanical system, and spin-based quantum information processing, where single electronic spin detection poses a grand challenge. Superconducting quantum interference devices (SQUIDs) have yet to be effectively applied to nanoscale measurements. Here, we show that a simple bilayer deposition route, combining photolithography with focused ion beam patterning, produces high performance nanoscale SQUIDs. We present results of noise measurements on these nanoSQUIDs which correspond to a magnetic flux sensitivity of around 0.2μΦ0∕Hz1∕2. This represents one of the lowest noise values achieved for a SQUID device operating above 1K.

Anisotropic Oxygen Ion Diffusion in Layered PrBaCo2O5+δ

Abstract: Oxygen diffusion and surface exchange coefficients have been measured on polycrystalline samples of the double perovskite oxide PrBaCo2O5+δ by the isotope exchange depth profile method, using a time-of-flight SIMS instrument. The measured diffusion coefficients show an activation energy of 1.02 eV, as compared to 0.89 eV for the surface exchange coefficients in the temperature range from 300 to 670 °C. Inhomogeneity was observed in the distribution of the oxygen-18 isotopic fraction from grain to grain in the ceramic samples, which was attributed to anisotropy in the diffusion and exchange of oxygen. By the use of a novel combination of electron back scattered diffraction measurements, time-of-flight, and focused ion beam SIMS, this anisotropy was confirmed by in-depth analysis of single grains of known orientation in a ceramic sample exchanged at 300 °C. Diffusion was shown to be faster in a grain oriented with the surface normal close to 100 and 010 (ab-plane oriented) than a grain with a surface normal...

Ion beam process for deposition of highly wear-resistant optical coatings

Abstract: An ion beam deposition method is provided for manufacturing a coated substrate with improved wear-resistance, and improved lifetime. The substrate is first chemically cleaned to remove contaminants. Secondly, the substrate is inserted into a vacuum chamber onto a substrate holder, and the air therein is evacuated via pump. Then the substrate surface is bombarded with energetic ions from an ion beam source supplied from inert or reactive gas inlets to assist in removing residual hydrocarbons and surface oxides, and activating the surface. After sputter-etching the surface, a protective, wear-resistant coating is deposited by plasma ion beam deposition where a portion of the precursor gases are introduced into the ion beam downstream of the ion source, and hydrogen is introduced directly into the ion source plasma chamber. The plasma ion beam-deposited coating may contain one or more layers. Once the chosen coating thickness is achieved, deposition is terminated, vacuum chamber pressure is increased to atmospheric and the coated substrate products having wear-resistance greater than glass are removed from the chamber. These coated products may be ceramics, architectural glass, analytical instrument windows, automotive windshields, and laser bar code scanners for use in retail stores and supermarkets.

Ion beam scanner system and operating method

Abstract: The invention relates to an ion beam scanner system with ion sourcing equipment, an ion accelerator system and ion beam guide, containing an outlet aperture for a converging, centred ion beam and a mechanical alignment system for the target volume which is to be scanned. For this purpose, the ion accelerator system can be set to the acceleration required for maximum penetration depth of the ions. In addition, the scanning system has an energy absorption element, which is mounted in the path of the beam crosswise to the centre of the beam, between the target volume and the ion beam outlet aperture. The energy absorption element can be displaced crossways to the centre of the ion beam to vary the beam's energy, so that modulation of the ion beam depth which is effected by a linear motor and transversal displacement of the energy absorption element can be carried out in rapid succession by depthwise graduated scanning on volumetric elements of the target volume. The invention also relates to a method for ion-beam scanning and to a method for operating an ion-beam scanner system using a gantry system.

Three-dimensional printing of freeform helical microstructures: a review

Abstract: Three-dimensional (3D) printing is a fabrication method that enables creation of structures from digital models. Among the different structures fabricated by 3D printing methods, helical microstructures attracted the attention of the researchers due to their potential in different fields such as MEMS, lab-on-a-chip systems, microelectronics and telecommunications. Here we review different types of 3D printing methods capable of fabricating 3D freeform helical microstructures. The techniques including two more common microfabrication methods (i.e., focused ion beam chemical vapour deposition and microstereolithography) and also five methods based on computer-controlled robotic direct deposition of ink filament (i.e., fused deposition modeling, meniscus-confined electrodeposition, conformal printing on a rotating mandrel, UV-assisted and solvent-cast 3D printings) and their advantages and disadvantages regarding their utilization for the fabrication of helical microstructures are discussed. Focused ion beam chemical vapour deposition and microstereolithography techniques enable the fabrication of very precise shapes with a resolution down to ∼100 nm. However, these techniques may have material constraints (e.g., low viscosity) and/or may need special process conditions (e.g., vacuum chamber) and expensive equipment. The five other techniques based on robotic extrusion of materials through a nozzle are relatively cost-effective, however show lower resolution and less precise features. The popular fused deposition modeling method offers a wide variety of printable materials but the helical microstructures manufactured featured a less precise geometry compared to the other printing methods discussed in this review. The UV-assisted and the solvent-cast 3D printing methods both demonstrated high performance for the printing of 3D freeform structures such as the helix shape. However, the compatible materials used in these methods were limited to UV-curable polymers and polylactic acid (PLA), respectively. Meniscus-confined electrodeposition is a flexible, low cost technique that is capable of fabricating 3D structures both in nano- and microscales including freeform helical microstructures (down to few microns) under room conditions using metals. However, the metals suitable for this technique are limited to those that can be electrochemically deposited with the use of an electrolyte solution. The highest precision on the helix geometry was achieved using the conformal printing on a rotating mandrel. This method offers the lowest shape deformation after printing but requires more tools (e.g., mandrel, motor) and the printed structure must be separated from the mandrel. Helical microstructures made of multifunctional materials (e.g., carbon nanotube nanocomposites, metallic coated polymer template) were used in different technological applications such as strain/load sensors, cell separators and micro-antennas. These innovative 3D microsystems exploiting the unique helix shape demonstrated their potential for better performance and more compact microsystems.