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Focused ion beam

About: Focused ion beam is a research topic. Over the lifetime, 12154 publications have been published within this topic receiving 179523 citations. The topic is also known as: FIB.


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Journal ArticleDOI
TL;DR: In this article, the three-dimensional microstructure of an SOFC anode is quantified using a dual beam focused ion beam scanning electron microscopy (FIB-SEM) system equipped with an energy dispersive X-ray spectroscopy (EDX) unit.

361 citations

Journal ArticleDOI
TL;DR: In this article, it was demonstrated that sub-micrometer focused ion beams can be produced with current densities greater than 1 A ǫ cm−2 using a liquid-metal ion source.
Abstract: The technology of high‐resolution focused ion beams has advanced dramatically in the past 15 years as focusing systems have evolved from laboratory instruments producing minuscule current densities to high current density tools which have sparked an important new process: direct micromachining at the micrometer level. This development has been due primarily to the exploitation of field emission ion sources and in particular the liquid‐metal ion source. Originally developed in the early 1960’s as a byproduct of the development of electrostatic rocket engines, the liquid‐metal ion source was adapted for focused beam work in the late 1970’s, when it was demonstrated that submicrometer focused ion beams could be produced with current densities greater than 1 A cm−2. Ions can be produced with liquid‐metal ion sources from elements including Al, As, Au, B, Be, Bi, Cs, Cu, Ga, Ge, Fe, In, Li, P, Pb, Pd, Si, Sn, and Zn. In the past decade, focused ion beam systems with liquid‐metal ion sources have had a signific...

360 citations

Journal ArticleDOI
TL;DR: In the present application, graphene samples on Si/SiO2 substrates are cut using helium ions, with computer controlled alignment, patterning, and exposure, providing fast lithography compatible with graphene, with approximately 15 nm feature sizes.
Abstract: We report nanoscale patterning of graphene using a helium ion microscope configured for lithography. Helium ion lithography is a direct-write lithography process, comparable to conventional focused ion beam patterning, with no resist or other material contacting the sample surface. In the present application, graphene samples on Si/SiO2 substrates are cut using helium ions, with computer controlled alignment, patterning, and exposure. Once suitable beam doses are determined, sharp edge profiles and clean etching are obtained, with little evident damage or doping to the sample. This technique provides fast lithography compatible with graphene, with approximately 15 nm feature sizes.

359 citations

Journal ArticleDOI
TL;DR: A novel serial sectioning procedure for 3D analysis using a dual‐beam FIB (focused ion beam) that reveals quantitative information of structural features smaller than 100 nm in size which cannot be acquired easily by other methods.
Abstract: Three-dimensional (3D) data represent the basis for reliable quantification of complex microstructures. Therefore, the development of high-resolution tomography techniques is of major importance for many materials science disciplines. In this paper, we present a novel serial sectioning procedure for 3D analysis using a dual-beam FIB (focused ion beam). A very narrow and reproducible spacing between the individual imaging planes is achieved by using drift correction algorithms in the automated slicing procedure. The spacing between the planes is nearly of the same magnitude as the pixel resolution on scanning electron microscopy images. Consequently, the acquired stack of images can be transformed directly into a 3D data volume with a voxel resolution of 6 x 7 x 17 nm. To demonstrate the capabilities of FIB nanotomography, a BaTiO3 ceramic with a high volume fraction of fine porosity was investigated using the method as a basis for computational microstructure analysis and the results compared with conventional physical measurements. Significant differences between the particle size distributions as measured by nanotomography and laser granulometry indicate that the latter analysis is skewed by particle agglomeration/aggregation in the raw powder and by uncertainties related to calculation assumptions. Significant differences are also observed between the results from mercury intrusion porosimetry (MIP) and 3D pore space analysis. There is strong evidence that the ink-bottle effect leads to an overestimation of the frequency of small pores in MIP. FIB nanotomography thus reveals quantitative information of structural features smaller than 100 nm in size which cannot be acquired easily by other methods.

357 citations

Journal ArticleDOI
TL;DR: Several FIB-based methods that have been developed to fabricate needle-shaped atom probe specimens from a variety of specimen geometries, and site-specific regions are reviewed, which have enabled electronic device structures to be characterized.
Abstract: Several FIB-based methods that have been developed to fabricate needle-shaped atom probe specimens from a variety of specimen geometries, and site-specific regions are reviewed. These methods have enabled electronic device structures to be characterized. The atom probe may be used to quantify the level and range of gallium implantation and has demonstrated that the use of low accelerating voltages during the final stages of milling can dramatically reduce the extent of gallium implantation.

349 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
202394
2022278
2021251
2020329
2019351
2018347