Focused ion beam

About: Focused ion beam is a research topic. Over the lifetime, 12154 publications have been published within this topic receiving 179523 citations. The topic is also known as: FIB.

Spatiotemporal near-field spin microscopy in patterned magnetic heterostructures.

Abstract: Low temperature femtosecond-resolved near-field scanning optical microscopy is used to image excitonic spin behavior in locally disordered magnetic semiconductor heterostructures. A contrast between luminescence intensity and polarization profiles yields marked differences between carrier diffusion and spin transport over a spin-dependent energy landscape sharply defined by focused ion beam implantation. Space-time spectroscopies reveal a spin component to the exciton evolution in the presence of a magnetic field. Fundamental limitations on the measurement of circularly polarized luminescence in the near field are also demonstrated.

A review of focused ion beam technology and its applications in transmission electron microscopy

Abstract: The role of focused ion beam (FIB) fabrication in the development of sample preparation techniques for transmission electron microscopy (TEM) has been described in this paper. Since the repeatability of FIB sampling and TEM observations has become important, the microsampling and in situ lift-out methods are currently in wide use. Furthermore, artifacts induced during FIB milling and the consequent difficulties with energy dispersive X-ray spectroscopy are detailed. The remarkably increased capability of scanning ion microscopy and its applications are also discussed.

Light Emitting Micropatterns of Porous Si Created at Surface Defects

Abstract: We report a principle that allows one to write visible light emitting silicon patterns of arbitrary shape down to the submicrometer scale. We demonstrate that porous Si growth can electrochemically be initiated preferentially at surface defects created in an $n$-type Si substrate by ${\mathrm{Si}}^{++}$ focused ion beam bombardment. For $n$-type material in the dark, the electrochemical pore formation potential (Schottky barrier breakdown voltage) is significantly lower at the implanted locations than for an unimplanted surface. This difference in the threshold voltages is exploited to achieve the selectivity of the pore formation process.

Recent advances in focused ion beam nanofabrication for nanostructures and devices: fundamentals and applications

Abstract: The past few decades have witnessed growing research interest in developing powerful nanofabrication technologies for three-dimensional (3D) structures and devices to achieve nano-scale and nano-precision manufacturing. Among the various fabrication techniques, focused ion beam (FIB) nanofabrication has been established as a well-suited and promising technique in nearly all fields of nanotechnology for the fabrication of 3D nanostructures and devices because of increasing demands from industry and research. In this article, a series of FIB nanofabrication factors related to the fabrication of 3D nanostructures and devices, including mechanisms, instruments, processes, and typical applications of FIB nanofabrication, are systematically summarized and analyzed in detail. Additionally, current challenges and future development trends of FIB nanofabrication in this field are also given. This work intends to provide guidance for practitioners, researchers, or engineers who wish to learn more about the FIB nanofabrication technology that is driving the revolution in 3D nanostructures and devices.