Showing papers on "Hydrofluoric acid published in 2014"

Substrate treatment method and substrate treatment apparatus

Abstract: A substrate treatment apparatus which can more efficiently regenerate phosphoric acid which is able to be returned to etching treatment along with such etching treatment as much as possible without using a large facility, that is a substrate treatment apparatus which treats a silicon substrate W on which a nitride film is formed by a liquid etchant which contains phosphoric acid, which comprises an etching treatment unit (the spin treatment unit 30 ) which gives a suitable quantity of liquid, etchant to each substrate which is fed one at a time so as to etch the substrate and remove the nitride film, a phosphoric acid regenerating unit (the spin treatment unit 30 ) which mixes liquid etchant used for treatment of one substrate and a suitable quantity of liquid hydrofluoric acid for the amount of the used liquid etchant under a predetermined temperature environment to regenerate the phosphoric acid, and a phosphoric acid recovery unit (the pump 38, phosphoric acid recovery tank 50, and pump 52 ) which returns the phosphoric acid which was obtained by the phosphoric acid regenerating unit to the liquid etchant to be used at the etching treatment unit.

Electrochemical determination of hydrogen peroxide using copper/porous silicon based non-enzymatic sensor

Abstract: Copper on porous silicon (Cu/PSi) nanocomposite powder is a new electrode material synthesized by electrodeless deposition of copper nanoparticles on the etched PSi powder in a solution containing hydrofluoric acid and CuSO4. The nanocomposite is selective for electrochemical hydrogen peroxide (H2O2) reduction and shows a wide linear range (0.50–3.78 mmol L−1), low detection limit (0.27 μmol L−1), fast response (less than 5 s), good signal reproducibility (R.S.D. = 1.5%), long-term stability (more than one month), plus the low cost. No interference was observed from common species such as ascorbic acid, dopamine, uric acid and glucose.

Mild hydrothermal crystal growth, structure, and magnetic properties of ternary U(IV) containing fluorides: LiUF5, KU2F9, K7U6F31, RbUF5, RbU2F9, and RbU3F13.

Abstract: Single crystals of several ternary alkali uranium fluorides, LiUF5, KU2F9, K7U6F31, RbUF5, RbU2F9, and RbU3F13, have been obtained in a mild hydrothermal process using UO2(CH3CO2)2(H2O)2 as the uranium source. Their crystal structures were determined by single crystal X-ray diffraction. The uranium in the starting reagent was successfully reduced from U6+ to U4+ in a dilute hydrofluoric acid environment, aided by the presence of a copper salt. All materials exhibit highly complex crystal structures that range from two-dimensional to three-dimensional. The U4+ cations are found in high (UF8 and UF9) coordination environments. The magnetic susceptibility measurements yielded effective magnetic moments of 3.01–3.83 μB for the U4+ cations. The temperature dependent magnetic susceptibility measurements confirmed that the U4+ cation exhibits a nonmagnetic singlet ground state at low temperatures. No long-range magnetic order was observed for any of the above compositions down to 2 K. Optical and thermal behavio...

Metallization on FDM Parts Using the Chemical Deposition Technique

Abstract: Metallization of ABS (acrylonitrile-butadiene-styrene) parts has been studied on flat part surfaces. These parts are fabricated on an FDM (fused deposition modeling machine) using the layer-wise deposition principle using ABS as a part material. Electroless copper deposition on ABS parts was performed using two different surface preparation processes, namely ABS parts prepared using chromic acid for etching and ABS parts prepared using a solution mixture of sulphuric acid and hydrogen peroxide (H2SO4/H2O2) for etching. After surface preparations using these routes, copper (Cu) is deposited electrolessly using four different acidic baths. The acidic baths used are 5 wt% CuSO4 (copper sulfate) with 15 wt% of individual acids, namely HF (hydrofluoric acid), H2SO4 (sulphuric acid), H3PO4 (phosphoric acid) and CH3COOH (acetic acid). Cu deposition under different acidic baths used for both the routes is presented and compared based on their electrical performance, scanning electron microscopy (SEM) and energy dispersive X-ray spectrometry (EDS). The result shows that chromic acid etched samples show better electrical performance and Cu deposition in comparison to samples etched via H2SO4/H2O2.

Synthesis of colloidal solutions with silicon nanocrystals from porous silicon

Abstract: In this work, we have obtained colloidal solutions of Si nanocrystals (Si-ncs), starting from free-standing porous silicon (PSi) layers. PSi layers were synthesized using a two-electrode Teflon electrochemical cell; the etching solution contained hydrogen peroxide 30%, hydrofluoric acid 40% (HF), and methanol. The anodizing current density was varied to 250 mA cm-2, 1 A cm-2, and 1.2 A cm-2. Thus obtained, PSi was mechanically pulverized in a mortar agate; then, the PSi powders were poured into different solutions to get the final Si-ncs colloidal solutions. The different optical, morphological, and structural characteristics of the colloidal solutions with Si-ncs were measured and studied. These Si-ncs colloidal solutions, measured by photoluminescence (PL), revealed efficient blue-green or violet emission intensities. The results of X-ray diffraction (XRD) indicate that the colloidal solutions are mainly composed of silicon nanocrystallites. The result of UV–vis transmittance indicates that the optical bandgap energies of the colloidal solutions varied from 2.3 to 3.5 eV for colloids prepared in methanol, ethanol, and acetone. The transmission electron microscopy (TEM) images showed the size of the nanocrystals in the colloidal solutions. Fourier transform infrared spectroscopy (FTIR) spectra showed different types of chemical bonds such as Si-O-Si, Si-CH2, and SiH x , as well as some kind of defects. 61.46Df.-a; 61.43.Gt; 61.05.cp; 78.55.-m; 81.15.Gh

Morphology and properties of nanotubular oxide layer on the “Ti–13Zr–13Nb” alloy

Abstract: The “Ti-13Zr-13Nb” alloy in solid and porous form was oxidised. The constant voltage 20 V, oxidation time 0.5 and 1 h, and 1 M H 3 PO 4 (orthophosphoric acid) with an addition of HF (hydrofluoric acid) as the test conditions were applied. SEM (Scanning Electron Microscope) examinations of surface, EDS (Energy Dispersive X-ray Spectroscopy) chemical analysis, nanohardness and nanoscratch tests, and corrosion potentiokinetic tests at various pH values were performed. Results show that an oxidation of this ternary alloy in acidic solution in the presence of fluoride ions results in the appearance of nanotubular oxide layer of high nanohardness, well adjacent to the base. Oxide film appears both on the surface and within the pores. Different colonies of nanotubes are observed. Obtained results prove that for such alloys, both as solid and porous material, nanotubular oxide layers of suitable morphology, high mechanical properties and enhanced bioactivity may be formed.

Functionalization of graphene and few-layer graphene films in an hydrofluoric acid aqueous solution

Abstract: The possibility of the controlled modification of the properties of graphene and few-layer graphene significantly extends the scope of their potential applications. Conditions for the chemical modification of graphene and few-layer graphene in an hydrofluoric acid aqueous (HF) solution were revealed in this work. The following changes in the properties of films upon their treatment in an aqueous HF solution were observed: a sharp (by 5–7 orders of magnitude) jump in the resistance of samples, the suppression of characteristic peaks in Raman spectra, the occurrence of peaks from fluorine ions F (687.7 eV) and C-F bonds (288 eV) in X-ray photoelectron spectroscopy (XPS) spectra, and the formation of a nanorelief on the surface. The reaction with HF possesses an activation character (with an energy of 1.4 eV), depending on the temperature; the reaction proceeds in a narrow range of concentrations of HF solution and is reversible. An array of experimental data made it possible to suggest that the functionalization of films was due to fluorination. The recovery of the conductivity of films after the annealing of samples at a temperature of 450°C (the energy of activation of the annealing ∼2 eV) is one of the confirmations of the fluorination process. It was shown that the fluorination reaction in an aqueous HF solution was initiated on the grain boundaries of polycrystalline films of graphene and few-layer graphene. It was found that the interaction of few-layer graphene with HF depended significantly on the thickness of samples and their preliminary treatment. A model for the fluorination of a few-layer film based on the corrugating of layers because of the difference in the lattice constants of graphene and fluorographene was suggested.

Preparation method of fluoride fluorescent powder material

Abstract: The invention relates to a preparation method of a fluoride fluorescent powder material, and relates to a preparation method of a fluoride red-light luminescent material which is activated by Mn and can be stimulated by purple light and blue light, wherein A is selected from a combination of one or more of alkali metals, and M is selected from a combination of one or more of Ti, Si, Sn, Ge and Zr. The method is characterized by comprising the following steps: (1) preparing a solution containing Mn ions; and (2) adding an A2MF6 matrix material into the solution, making the adding amount greater than the solubility of the matrix material in the solution, then fully stirring the solution for a certain time at a certain temperature, allowing the Mn ions in the solution to go into matrix material lattices through an ion exchange reaction, and replacing Mn ions in the matrix. The method has the advantages of low preparation temperature, short time, easily controlled process and small hydrofluoric acid consumption amount, and is suitable for industrial large-scale preparation.

Heating-free non-alkali liquid accelerator for jetting concrete and preparation method of heating-free non-alkali liquid accelerator

Abstract: The invention discloses a heating-free non-alkali liquid accelerator for jetting concrete and a preparation method of the heating-free non-alkali liquid accelerator. The liquid accelerator is prepared from the following components in percentage by mass: 30%-55% of aluminum sulfate, 3%-10% of aluminium hydroxide, 10%-18% of hydrofluoric acid, 8%-25% of magnesium salt, 1%-8% of alkylol amine, 0.5%-4% of a stabilizer, and 10%-33% of water. The preparation method is characterized by comprising the following processing steps: putting aluminium hydroxide into a reaction kettle; adding water to the reaction kettle, and stirring aluminium hydroxide into paste; slowly adding hydrofluoric acid, and when the temperature reaches 50-55 DEG C, adding aluminum sulfate to stir in batches; after hydrofluoric acid is completely added, adding residual aluminum sulfate and supplementing residual water, so as to obtain reaction liquid; adding the magnesium salt to the reaction liquid, and then adding the alkylol amine and the stabilizer, so that the solution becomes evenly mixed liquid. The accelerator disclosed by the invention has strong adaptability with cement, low energy consumption and good performance, and does not need to be heated in the use procedure.

Microstructure and phase transformation of Ti3AC2 (A = Al, Si) in hydrofluoric acid solution

Abstract: In this paper, Ti3AC2 (A = Al, Si) were prepared by pressureless argon shielding synthesis technique. The microstructure and phase transformation of as-prepared Ti3AC2 (A = Al, Si) in hydrothermal hydrofluoric acid (HF) solution were investigated systematically. Results showed that the obtained Ti3AlC2 and Ti3SiC2 were closely aligned layered structure. In hydrothermal HF solution, Al or Si element was preferentially etched from the layered structure, inducing obvious transformation of microstructure and phase composition. For Ti3AlC2, Al atoms diffused out of the structure and reacted with HF to form AlF3•H2O, which induced the rearrangement of the Ti and C atoms, and finally resulted in the formation of TiCx cubic phase. With the hydrothermal temperature and reaction time increasing, the TiCx phase gradually disappeared and the grain size of AlF3•H2O gradually increased. When Ti3SiC2 was immersed in hydrothermal HF solution, the main products were TiC and SiC. Interestingly, with the hydrothermal treatment temperature and reaction time increasing, TiC gradually disappeared, while SiC nearly kept unchanged. This can be explained that SiC was covalently bonded carbide, while TiC was metallically bonded, having relatively weak bond energy and consequently being unstable in hydrothermal HF solution.

Palladium Nanoparticles Supported on Magnesium Hydroxide Fluorides: A Selective Catalyst for Olefin Hydrogenation

Abstract: A one-pot synthesis of palladium nanoparticles supported on magnesium hydroxide fluoride has been performed with the fluorolytic sol–gel method. The prepared catalysts were characterized by using various physicochemical techniques. The sol–gel method led to high surface area (>135 m2 g−1), mesoporous catalysts (pore volume=0.19–0.23 cm3 g−1, pore diameter=3–5 nm) with uniformly dispersed palladium nanoparticles approximately 2 nm in diameter on the surface. The catalysts synthesized by using different concentrations of aqueous hydrofluoric acid exhibited changing surface and acidic properties. Very high dispersion of palladium on magnesium fluoride (47 %) was obtained with 1 wt % palladium loading. The catalysts were used for hydrogenation of various olefins in the presence of other organic functionalities at room temperature and atmospheric hydrogen pressure. Various substituted olefins were hydrogenated with almost 100 % conversion and selectivity. The catalysts were recycled efficiently over five cycles without appreciable loss in catalytic activity. There was no palladium leaching under the reaction conditions, which was confirmed by inductively coupled plasma atomic emission spectroscopy analysis. Activation of olefin on the catalyst surface could not be observed by in situ FTIR studies, indicating facile activation of hydrogen on the palladium supported on magnesium hydroxide fluoride.

Solid Formation during Composite-Ionic-Liquid-Catalyzed Isobutane Alkylation

Abstract: Composite ionic liquid (CIL) prepared from triethylamine hydrochloride, anhydrous aluminum(III) chloride, and cuprous chloride is a new catalyst for isobutane alkylation. This composite ionic liquid alkylation (CILA) technology yields an alkylate with favorable product distribution. CILA is a promising replacement for sulfuric acid and hydrofluoric acid alkylation technologies. However, some solids are formed during alkylation, and solid amount increases with time on stream. In a number of separation steps, the used CIL was divided into liquid and solid. Nuclear magnetic resonance, X-ray diffraction, X-ray photoelectron spectroscopy, and elemental analyses were applied to characterize these fractions. The content of acid-soluble oil (ASO) in solid was also investigated. The results showed that the solid was mainly cuprous chloride and contained about 1 wt % ASO. The loss of aluminum chloride and detachment of CuCl as a form of solid from CIL resulted in the decrease of CIL acidity and product selectivity.

EXAFS Study of the Speciation of Protactinium(V) in Aqueous Hydrofluoric Acid Solutions

Abstract: The speciation of protactinium(V) in hydrofluoric acid (HF) solutions was studied using X-ray absorption spectroscopy. Extended X-ray absorption fine structure measurements were performed on an aqueous solution of 0.05 M protactinium(V) with various HF concentrations ranging from 0.5 to 27 M in order to probe the protactinium coordination sphere with respect to the identity and number of coordinating ligands. The resulting fits to the spectra suggest the presence of an eight-coordinate homoleptic fluoro complex in highly concentrated fluoride solutions (27 M), with equilibrium between seven- and eight-coordinate fluoro complexes at moderate acidities, and in more dilute solutions, results indicate that one water molecule is likely to replace a fluoride in the first coordination sphere, at a distance of 2.54-2.57 A. Comparisons of this chemistry with group V metals, niobium and tantalum, are presented, and the potential implications for these results on the hydrolytic behavior of protactinium in aqueous systems are discussed.

Experimental Investigation of Acid-induced Sludge Precipitation: Using Acid Additives in Iran

Abstract: Dilute hydrochloric and hydrofluoric acid are used in the fracturing and acidizing of compact oil formations to dissolve the undesirable carbonate and silica deposits or scales, which interfere with the passage of oil in tubing or in the formation itself. A typical acid formulation is based on 15% hydrochloric for carbonate reservoirs and 12/3 wt% hydrochloric/hydrofluoric (regular mud acid) for sandstone reservoirs. But higher acid strengths are also used. Contact of acid with the crude oil generates a precipitate known as acid-induced sludge. Acid-induced sludge is becoming an increasing cause of oil well stimulation treatment failure. Acid stimulation experimental tests were conducted on the Marun crude oil sample from the Marun oil field for quantifying the amount of sludge precipitation as a consequence of an acidizing job. The potential of sludge precipitation by acid additives, such as iron ion concentration, standard dosage of mutual solvent, corrosion inhibitor, corrosion aid, suspended agent, an...

Nitric-acid-free stainless steel acid washing solution and preparation method thereof

Abstract: The invention discloses a nitric-acid-free stainless steel acid washing solution and a preparation method thereof. The nitric-acid-free stainless steel acid washing solution comprises the following components in percentage by mass: 5-30% of sulfuric acid, 3-10% of hydrofluoric acid, 0.1-10% of hydrogen peroxide, 1.0-5% of Fe , 0.05-1.0% of corrosion inhibitor, 0.01-1.0% of stabilizer, 0.05-1.0% of wetting agent and the balance of water. The acid washing solution is free of nitric acid, has the advantages of high acid washing speed, good quality and the like, and thoroughly solves a series of environmental problems of yellow smoke in the acid washing workshop, nitrogenous wastewater and the like.

Glass-reinforcing composition and method of manufacturing touchscreen glass using the same

Abstract: A glass-reinforcing composition and method of using the same, the composition including 1 weight % to 20 weight % of hydrofluoric acid, 0.1 weight % to 5 weight % of ammonium fluoride, 1 weight % to 20 weight % of an inorganic acid, an organic acid, or 1 weight % to 10 weight % of an organic acid salt, and a remainder of water.

etching of SiC with hydrofluoric acid in nonaqueous solvents

Abstract: Carbon films on SiC have many applications, ranging from tribology to electrical energy storage. Formation of epitaxial or heteroepitaxial layers of carbon on SiC by ‘‘soft solution process,’’ such as electro- or photochemical ones, is attractive for various fields of application, decreasing the energy consumption and making the process compatible with electronic device fabrication. We have demonstrated formation of a carbon layer on SiC ceramics by electrochemical etching in a nonaqueous electrolyte. The selective etching of Si from SiC in a single step reaction with hydrofluoric acid (HF) in different organic solvents has been carried out and the role of polarity, surface tension, density, and viscosity of the organic solvents in the formation of the carbon layer has been investigated. The solution of 1:4.6 ratio HF and ethanol at low current densities (10 and 20 mA/cm 2 ) allows the

Micro-shear bond strength and surface micromorphology of a feldspathic ceramic treated with different cleaning methods after hydrofluoric acid etching

Abstract: Objective: The aim of this study was to evaluate the effect of feldspathic ceramic surface cleaning on micro-shear bond strength and ceramic surface morphology. Material and Methods: Forty discs of feldspathic ceramic were prepared and etched with 10% hydrofluoric acid for 2 minutes. The discs were randomly distributed into five groups (n=8): C: no treatment, S: water spray + air drying for 1 minute, US: immersion in ultrasonic bath for 5 minutes, F: etching with 37% phosphoric acid for 1 minute, followed by 1-minute rinse, F+US: etching with 37% phosphoric acid for 1 minute, 1-minute rinse and ultrasonic bath for 5 minutes. Composite cylinders were bonded to the discs following application of silane and hydrophobic adhesive for micro-shear bond strength testing in a universal testing machine at 0.5 mm/min crosshead speed until failure. Stereomicroscopy was used to classify failure type. Surface micromorphology of each treatment type was evaluated by scanning electron microscopy at 500 and 2,500 times magnification. Results: One-way ANOVA test showed no significant difference between treatments (p=0.3197) and the most common failure types were cohesive resin cohesion followed by adhesive failure. Micro-shear bond strength of the feldspathic ceramic substrate to the adhesive system was not influenced by the different surface cleaning techniques. Absence of or less residue was observed after etching with hydrofluoric acid for the groups US and F+US. Conclusions: Combining ceramic cleaning techniques with hydrofluoric acid etching did not affect ceramic bond strength, whereas, when cleaning was associated with ultrasound, less residue was observed.

Wet etching method in silicon solar cell production

Abstract: The invention discloses a wet etching method in silicon solar cell production. The method comprises specific steps as follows. (1) A water film protective step. Deionized water is sprayed through a water spray system on a diffusion surface of a silicon wafer so as to form a water film protective layer, and the water film protective layer exists continuously until the silicon wafer completes an etching step. (2) A phosphorus silicon glass removing step. The silicon wafer after the water film protective step enters a hydrofluoric acid groove, the hydrofluoric acid groove is internally provided with hydrofluoric acid solution, the hydrofluoric acid solution is conveyed by a liquid rolling wheel to the back of the silicon wafer, and the phosphorus silicon glass at an edge and surface of the silicon wafer is removed, but the water film protective layer and a right side of the phosphorus silicon glass layer are not affected. (3) The etching step. The silicon wafer after the phosphorus silicon glass removing step enters an etching groove to etch a back and an edge of a PN junction; and the silicon wafer in the etching groove floats on etching solution for etching. According to the invention, the square resistance rise after the etching can be stably controlled, the effective area of the PN junction is increased, and the conversion efficiency of the battery plate improve.

The effect of hydrofluoric acid treatment of titanium and titanium dioxide surface on primary human osteoblasts.

Abstract: Objective The aim of the study was to investigate solely the effect of fluoride on the surface chemistry of polycrystalline ceramic titanium dioxide (TiO2) and metallic titanium (Ti) and its effect on proliferation and differentiation of primary human osteoblasts (NHO). Materials and methods The NHO cells were exposed to fluoride-modified and unmodified samples for 1, 3, 7, 14 and 21 days. The fluoride effect on the mRNA expression was quantified and measured. The secretion of cytokines and interleukins in the cell culture medium was measured by Luminex, gene expression by RT-PCR, and compared with untreated controls. The effect on cell growth after 1 and 3 days in culture was measured using [3H]-thymidine incorporation. Fluoride release was measured using an ion-selective electrode. The surfaces were examined by X-ray photoelectron spectroscopy and profilometry. Results The fluoride release study detected that fluoride content easily washed off in TiO2 coins when compared with Ti coins. No increase in cell proliferation was found among fluoride-modified TiO2 surfaces compared with controls, except for washed Ti coins with fluoride modification. The cell differentiation with regard to gene expression showed no significant differences in both fluoride-modified and unmodified samples and less effect on protein release for all groups. Conclusions The fluoride from hydrofluoric acid treatment on Ti and TiO2 surfaces gave no specific effect on primary human osteoblast cells. The study indicates that the released fluoride is not the unique factor for the bioactivity of Ti and TiO2 surfaces.

Wet process chemical preparation method for black silicon with pointed-cone-shaped surface

Abstract: The invention discloses a wet process chemical preparation method for black silicon with a pointed-cone-shaped surface. The preparation method comprises the steps that two kinds of etching liquid are prepared, wherein the first kind of etching liquid is mixing water solution of nitric acid copper, hydrogen peroxide and hydrofluoric acid, and the second kind of etching liquid is mixing water solution of nitric acid copper, ammonium hydrogen fluoride and hydrogen peroxide; a monocrystalline silicon piece is placed into the first kind of etching liquid for initial etching; the monocrystalline silicon piece is placed into the second kind of etching liquid for surface structural ornament; finally, surface metal granule residue is washed, and the black silicon materials with the pointed-cone-shaped surface are obtained. According to the preparation method, two steps of copper ion chemical auxiliary etching is utilized, and a pointed-cone-shaped nanometer structure is prepared on the surface of monocrystalline silicon. The structure has good light trapping performance, and can remarkably improve light absorbing efficiency when applied to a silicon substrate solar cell.

Hydrochloric acid purification process

Abstract: The invention relates to a process for the treatment of a gas stream containing hydrochloric acid, hydrofluoric acid and fluorinated/oxygenated compounds, in which the gas stream is successively subjected to: -a stage of catalytic hydrolysis; -a stage of washing with an acid solution; -a stage of adsorption of impurities by active charcoal; -a stage of adiabatic or isothermal absorption of the hydrochloric acid in an aqueous solution, making it possible to collect a hydrochloric acid solution.

Preparation method for high pure aluminium metallographic sample

Abstract: The invention discloses a preparation method for a high pure aluminium metallographic sample. The preparation method comprises the following steps of sampling; coarse grinding; fine grinding; electrolysis polishing and film mulching. A formula of a film mulching liquid is composed of hydrofluoric acid, fluoboric acid and distilled water. A volume ratio of hydrofluoric acid (mL) to fluoboric acid (g) to distilled water (mL) is 15:(5-6):400. A prepared high pure aluminium clear metallograph provides convenience for better studying structure and performance of internal tissues of high pure aluminium. The method is simple in operation, low in labor intensity, low in material consumption and high in efficiency.

Red-emitting phosphors, associated processes and devices

Abstract: A process for synthesizing a Mn4+ doped phosphor is presented. The process includes contacting a source of Mn4+ ions to a suspension comprising aqueous hydrofluoric acid and a complex fluoride compound of formula (II) in solid form, and then contacting a source of A+ ions to the suspension to form the Mn4+ doped phosphor, Ax[MFy] (II) Wherein, A is Li, Na, K, Rb, Cs, or a combination thereof; M is Si, Ge, Sn, Ti, Zr, Al, Ga, In, Sc, Hf, Y, La, Nb, Ta, Bi, Gd, or a combination thereof; x is the absolute value of the charge of the [MFy] ion; y is 5, 6 or 7.

Desorption and sublimation kinetics for fluorinated aluminum nitride surfaces

Abstract: The adsorption and desorption of halogen and other gaseous species from surfaces is a key fundamental process for both wet chemical and dry plasma etch and clean processes utilized in nanoelectronic fabrication processes. Therefore, to increase the fundamental understanding of these processes with regard to aluminum nitride (AlN) surfaces, temperature programmed desorption (TPD) and x-ray photoelectron spectroscopy (XPS) have been utilized to investigate the desorption kinetics of water (H2O), fluorine (F2), hydrogen (H2), hydrogen fluoride (HF), and other related species from aluminum nitride thin film surfaces treated with an aqueous solution of buffered hydrogen fluoride (BHF) diluted in methanol (CH3OH). Pre-TPD XPS measurements of the CH3OH:BHF treated AlN surfaces showed the presence of a variety of Al-F, N-F, Al-O, Al-OH, C-H, and C-O surfaces species in addition to Al-N bonding from the AlN thin film. The primary species observed desorbing from these same surfaces during TPD measurements included H2, H2O, HF, F2, and CH3OH with some evidence for nitrogen (N2) and ammonia (NH3) desorption as well. For H2O, two desorption peaks with second order kinetics were observed at 195 and 460 °C with activation energies (Ed) of 51 ± 3 and 87 ± 5 kJ/mol, respectively. Desorption of HF similarly exhibited second order kinetics with a peak temperature of 475 °C and Ed of 110 ± 5 kJ/mol. The TPD spectra for F2 exhibited two peaks at 485 and 585 °C with second order kinetics and Ed of 62 ± 3 and 270 ± 10 kJ/mol, respectively. These values are in excellent agreement with previous Ed measurements for desorption of H2O from SiO2 and AlFx from AlN surfaces, respectively. The F2 desorption is therefore attributed to fragmentation of AlFx species in the mass spectrometer ionizer. H2 desorption exhibited an additional high temperature peak at 910 °C with Ed = 370 ± 10 kJ/mol that is consistent with both the dehydrogenation of surface AlOH species and H2 assisted sublimation of AlN. Similarly, N2 exhibited a similar higher temperature desorption peak with Ed = 535 ± 40 kJ/mol that is consistent with the activation energy for direct sublimation of AlN.