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Indium tin oxide

About: Indium tin oxide is a research topic. Over the lifetime, 17857 publications have been published within this topic receiving 402127 citations. The topic is also known as: indium tin oxide.


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Journal ArticleDOI
TL;DR: In this paper, the authors showed that the photocurrent increases as function of the number of bilayers by reaching the maximum with 6-bilayers of ITO/Cr-doped-TiO2.

99 citations

Journal ArticleDOI
TL;DR: In this paper, the gate dielectric of Al2O3+x was demonstrated to have a moderately high field mobility of 0.14 cm2/V and an outstanding sub-threshold slope of 2.88 V/dec, and an on/off ratio over 106.
Abstract: We report on the fabrication of pentacene thin-film transistors (TFTs) with Al2O3+x films as the gate dielectric that has been deposited on indium-tin-oxide glass by rf magnetron sputtering at room temperature. Although the Al2O3+x was expected to show lower capacitance and breakdown field than stoichiometric Al2O3, our pentacene TFTs with optimized thin Al2O3+x gate dielectric exhibited a moderately high field mobility of 0.14 cm2/V s, an outstanding subthreshold slope of 0.88 V/dec, and an on/off ratio over 106. Our work demonstrates that RT-deposited Al2O3+x is a promising gate dielectric material for organic TFTs.

99 citations

Journal ArticleDOI
TL;DR: In this article, the atmospheric plasma treatment of indium tin oxide (ITO) surfaces has been studied and demonstrated to be the most efficient method in improving the performance of vacuum-deposited double-layer organic light-emitting diode devices, among various plasma treatment methods including low-pressure Ar plasma and low pressure O2 plasma treatment.
Abstract: Atmospheric plasma treatment of indium tin oxide (ITO) surfaces has been studied and demonstrated to be the most efficient method in improving the performance of vacuum-deposited double-layer organic light-emitting diode devices, among various plasma treatment methods including low-pressure Ar plasma and low-pressure O2 plasma treatment. Although with a current–voltage characteristic close to low-pressure O2 plasma treatment, the atmospheric plasma treatment exhibits a 40% increase of electroluminescence efficiency. X-ray photoelectron spectroscopy results show that the atmospheric plasma treatment increases the work function and reduces the carbon contamination of ITO surfaces. Our results suggest that atmospheric plasma treatment is a cheaper, more convenient, and more efficient method than low-pressure O2 plasma treatment for improving device performance.

99 citations

Journal ArticleDOI
01 Nov 2006-Carbon
TL;DR: In this paper, thin multiwalled carbon nanotube (t-MWCNTs)-based field emitters are made by use of a spray method, where the number of tube walls is between 2 and 6, with the corresponding outer diameters between 3 and 6nm.

99 citations

Journal ArticleDOI
TL;DR: In this article, an inverted polymer solar cell using an ultrathin layer of low work function metal (Ca, Mg, Al, and Ag) on indium tin oxide (ITO) substrate as the cathode, MoO 3 /Au as the anode, and a blend of poly(3-hexylthiophene) (P3HT) and 1-(3-methoxycarbonyl)-propyl-1-phenyl-(6,6)C61 (PCBM) as the active layer were investigated.

99 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
2023343
2022730
2021537
2020684
2019804
2018838