Topic
Lithography
About: Lithography is a research topic. Over the lifetime, 23507 publications have been published within this topic receiving 348321 citations.
Papers published on a yearly basis
Papers
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TL;DR: Extreme ultraviolet lithography extends photolithography to much shorter wavelengths and is a cost-effective method of producing more-advanced integrated circuits as discussed by the authors. But some infrastructure challenges still remain, this technology is expected to begin high-volume microchip production within the next three years.
Abstract: Extreme ultraviolet lithography extends photolithography to much shorter wavelengths and is a cost-effective method of producing more-advanced integrated circuits. Although some infrastructure challenges still remain, this technology is expected to begin high-volume microchip production within the next three years.
472 citations
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TL;DR: In this paper, singlemode photonic wires in silicon-on-insulator with propagation loss as low as 2.4 dB/cm were demonstrated, fabricated with deep ultraviolet lithography and dry etching.
Abstract: We demonstrate single-mode photonic wires in silicon-on-insulator with propagation loss as low as 2.4 dB/cm, fabricated with deep ultraviolet lithography and dry etching. We have also made compact racetrack and ring resonators functioning as add-drop filters, attaining Q values larger than 3000 and low add-drop crosstalk.
472 citations
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TL;DR: In this paper, the authors give an overview of recent progress in passive spectral filters and demultiplexers based on silicon-on-insulator photonic wire waveguides: ring resonators, interferometers, arrayed waveguide gratings, and echelle diffraction gratings.
Abstract: We give an overview of recent progress in passive spectral filters and demultiplexers based on silicon-on-insulator photonic wire waveguides: ring resonators, interferometers, arrayed waveguide gratings, and echelle diffraction gratings, all benefit from the high-index contrast possible with silicon photonics. We show how the current generation of devices has improved crosstalk levels, insertion loss, and uniformity due to an improved fabrication process based on 193 nm lithography.
470 citations
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TL;DR: In this paper, the use of nanoimprint lithography to define arrays of vertical InP nanowires is demonstrated, where each nanowire is individually seeded from a catalyzing gold particle and then grown via vapor-liquid-solid growth in a metalorganic vapor phase epitaxy system.
Abstract: We demonstrate the use of nanoimprint lithography to define arrays of vertical InP nanowires. Each nanowire is individually seeded from a catalyzing gold particle and then grown via vapor-liquid-solid growth in a metal-organic vapor phase epitaxy system. The diameter and position of each nanowire can be controlled to create engineered arrays, demonstrated with a hexagonal photonic crystal pattern. This combination of nanoimprint and self-assembly of nanostructures is attractive for photonics and electronics, as well as in life sciences.
462 citations
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461 citations