Lithography

About: Lithography is a research topic. Over the lifetime, 23507 publications have been published within this topic receiving 348321 citations.

Microlithography: trends, challenges, solutions, and their impact on design

Abstract: With lithography parameters approaching their limits, continuous improvement requires increasing dialogues and compromises between the technology and design communities Only with such communication can semiconductor manufacturers reach the 30 nm physical-gate-length era with optical lithography Optical lithography is an enabling technology for transistor miniaturization With the wavelength and numerical aperture of exposure systems approaching their limits, the semiconductor industry needs continuous reduction of the k/sub 1/ factor Challenges include image quality improvement, proximity effect correction, and cost control An indispensable ingredient for future success is improvement in the design-manufacture interface

Devices and methods for pattern generation by ink lithography

Abstract: The present invention provides methods, devices and device components for fabricating patterns on substrate surfaces, particularly patterns comprising structures having microsized and/or nanosized features of selected lengths in one, two or three dimensions and including relief and recess features with variable height, depth or height and depth. Composite patterning devices comprising a plurality of polymer layers each having selected mechanical and thermal properties and physical dimensions provide high resolution patterning on a variety of substrate surfaces and surface morphologies. Gray-scale ink lithography photomasks for gray-scale pattern generation or molds for generating embossed relief features on a substrate surface are provided. The particular shape of the fabricated patterned can be manipulated by varying the three-dimensional recess pattern on an elastomeric patterning device which is brought into conformal contact with a substrate to localize patterning agent to the recess portion of the pattern.

Plasmonic nanostructures through DNA-assisted lithography

Abstract: Programmable self-assembly of nucleic acids enables the fabrication of custom, precise objects with nanoscale dimensions. These structures can be further harnessed as templates to build novel materials such as metallic nanostructures, which are widely used and explored because of their unique optical properties and their potency to serve as components of novel metamaterials. However, approaches to transfer the spatial information of DNA constructions to metal nanostructures remain a challenge. We report a DNA-assisted lithography (DALI) method that combines the structural versatility of DNA origami with conventional lithography techniques to create discrete, well-defined, and entirely metallic nanostructures with designed plasmonic properties. DALI is a parallel, high-throughput fabrication method compatible with transparent substrates, thus providing an additional advantage for optical measurements, and yields structures with a feature size of ~10 nm. We demonstrate its feasibility by producing metal nanostructures with a chiral plasmonic response and bowtie-shaped nanoantennas for surface-enhanced Raman spectroscopy. We envisage that DALI can be generalized to large substrates, which would subsequently enable scale-up production of diverse metallic nanostructures with tailored plasmonic features.

Fabrication of Square-Centimeter Plasmonic Nanoantenna Arrays by Femtosecond Direct Laser Writing Lithography: Effects of Collective Excitations on SEIRA Enhancement

Abstract: We demonstrate the use of femtosecond direct laser writing lithography for a fast and homogeneous large-area fabrication of plasmonic nanoantennas on a substrate by creating a patterned polymer as an etch mask on a metal layer. Subsequent argon ion beam etching provides plasmonic nanoantennas with feature sizes below the diffraction limit of the laser light. They exhibit tunable high-quality plasmon resonances in the mid-infrared spectral range, which are ideally suited for surface-enhanced infrared absorption (SEIRA). In the present work, we demonstrate reliable, fast, and low-cost fabrication of a wide variety of antenna arrays and examine particularly the influence of plasmonic coupling between neighboring antennas on the SEIRA enhancement effect. Specifically, we measure the enhanced infrared vibrational bands of a 5 nm thick 4,4′-bis(N-carbazolyl)-1,1′-biphenyl layer evaporated on arrays with different longitudinal and transversal spacings between antennas. An optimum SEIRA enhancement per antenna of...

Nanopatterns with biological functions.

Abstract: Both curiosity and a desire for efficiency have advanced our ability to manipulate materials with great precision on the micrometer and, more recently, on the nanometer scale. Certainly, the semiconductor and integrated circuit industry has put the pressure on scientist and engineers to develop better and faster nanofabrication techniques. Furthermore, our curiosity as to how life works, and how it can be improved from a medical perspective, stands to gain a great deal from advances in nanotechnology. Novel nanofabrication techniques are opening up the possibilities for mimicking the inherently nano-world of the cell, i.e., the nanotopographies of the extracellular matrix (ECM) and the nanochemistry presented on both the cell membrane and the ECM. In addition, biosensing applications that rely on fabrication of high-density, precision arrays, e.g., DNA or gene chips and protein arrays, will gain significantly in efficiency and, thus, in usefulness once it becomes possible to fabricate heterogeneous nanoarrays. Clearly, continued advances in nanotechnology are desired and required for advances in biotechnology. In this review, we describe the leading techniques for generating nanopatterns with biological function including parallel techniques such as extreme ultraviolet interference lithography (EUV-IL), soft-lithographic techniques (e.g., replica molding (RM) and microcontact printing (muCP)), nanoimprint lithography (NIL), nanosphere lithography (NSL) (e.g., colloid lithography or colloidal block-copolymer micelle lithography) and the nanostencil technique, in addition to direct-writing techniques including e-beam lithography (EBL), focused ion-beam lithography (FIBL) and dip-pen nanolithography (DPN). Details on how the patterns are generated, how biological function is imparted to the nanopatterns, and examples of how these surfaces can and are being used for biological applications will be presented. This review further illustrates the rapid pace by which advances are being made in the field of nanobiotechnology, owing to an increasing number of research endeavors, for an ever increasing number of applications.