Lithography

About: Lithography is a research topic. Over the lifetime, 23507 publications have been published within this topic receiving 348321 citations.

Silicon waveguides and ring resonators at 5.5 μm

Abstract: We demonstrate low loss ridge waveguides and the first ring resonators for the mid-infrared, for wavelengths ranging from 5.4 to 5.6 μm. Structures were fabricated using electron-beam lithography on the silicon-on-sapphire material system. Waveguide losses of 4.0±0.7 dB/cm are achieved, as well as Q-values of 3.0 k.

New Generation Electron Beam Resists: A Review

Abstract: The semiconductor industry has already entered the sub-10 nm region, which has led to the development of cutting-edge fabrication tools. However, there are other factors that hinder the best outcome of these tools, such as the substrate and resist materials, pre- and postfabrication processes, etc. Among the lithography techniques, electron beam lithography (EBL) is the prime choice when a job requires dimensions lower than 10–20 nm, since it can easily achieve such critical dimensions in reasonable time and effort. When obtaining pattern features in single nanometer regime, the resist material properties play an important role in determining the size. With this agenda in mind, many resists have been developed over the years suitable for attaining required resolution in lesser EBL writing time. This review article addresses the recent advancements made in EBL resists technology. It first describes the different lithography processes briefly and then progresses on to the parameters affecting the EBL fabric...

Nanolithography in microelectronics: A review

Abstract: The current status of basic photolithographic techniques allowing researchers to achieve results that seemed to be unrealistic even a short time ago is reviewed. For example, advanced DUV photolithography makes it possible to exactly reproduce IC elements 25 times smaller in size than the wavelength of an excimer laser used as a lithographic tool. Approaches owing to which optical lithography has pushed far beyond the Rayleigh-Abbe diffraction limit are considered. Among them are optical proximity correction, introduction of an artificial phase shift, immersion, double exposure, double patterning, and others. The prospects for further advancement of photolithography into the nanometer range are analyzed, and the capabilities of photolithography are compared with those of electronolithography, EUV lithography, and soft X-ray lithography

Fabrication of assembled micromechanical components via deep X-ray lithography

Abstract: A variant of deep X-ray lithography, the LIGA process, is described. The fundamental processing sequence has been augmented with a locally defined sacrificial polyimide layer. This requires alignment of the X-ray mask to the optically defined sacrificial pattern via specially developed align-and-clamping jigs. The end results of this process are either fully unsupported metal structures or components which are locally attached to the substrate. Attempts to use this type of processing to produce assembled devices have been successful. Thus, free gears and fully attached shafts have been connected to form a nickel gear box. More complex assembly experiments have been completed successfully and are encouraging enough to pursue this approach further. >