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Lithography

About: Lithography is a research topic. Over the lifetime, 23507 publications have been published within this topic receiving 348321 citations.


Papers
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Journal ArticleDOI
TL;DR: In this paper, a deterministic fabrication of sub-μm mesa-structures containing single quantum dots (QDs) by in situ electron-beam lithography was reported.
Abstract: We report on the deterministic fabrication of sub-μm mesa-structures containing single quantum dots (QDs) by in situ electron-beam lithography. The fabrication method is based on a two-step lithography process: After detecting the position and spectral features of single InGaAs QDs by cathodoluminescence (CL) spectroscopy, circular sub-μm mesa-structures are defined by high-resolution electron-beam lithography and subsequent etching. Micro-photoluminescence spectroscopy demonstrates the high optical quality of the single-QD mesa-structures with emission linewidths below 15 μeV and g(2)(0) = 0.04. Our lithography method has an alignment precision better than 100 nm which paves the way for a fully deterministic device technology using in situ CL lithography.

102 citations

Journal ArticleDOI
TL;DR: In this paper, the effects of different plasma chemistries including O2, Ar/O2 and CF4 on etch selectivity and surface/sidewall roughness for PS and PMMA have been characterized.
Abstract: Polystyrene-block-poly(methyl methacrylate), (PS-b-PMMA) diblock copolymer is a promising lithography alternative for nanometer scale features. The two components segregate into nanoscale domains when the polymer solution is spun on to form a thin film and annealed above the glass transition temperatures of both components. Preferential removal of PMMA domains through plasma etching to leave behind a PS mask for subsequent etching of underlying layers is the focus of this work. The quality of the PS mask is characterized by the thickness and lateral dimension of the PS structures after removal of the PMMA, as well as the smoothness of their surfaces. The effects of different plasma chemistries including O2, Ar/O2, Ar, CF4, and CHF3/O2 on etch selectivity and surface/sidewall roughness for PS and PMMA have been characterized. Ar/O2 produced the overall best results for the range of conditions studied.

102 citations

Journal ArticleDOI
19 Aug 2010-ACS Nano
TL;DR: This work accomplished truly scalable, low cost, arbitrarily large-area block copolymer lithography, synergistically integrating the two principles of graphoepitaxy and epitaxial self-assembly.
Abstract: We accomplished truly scalable, low cost, arbitrarily large-area block copolymer lithography, synergistically integrating the two principles of graphoepitaxy and epitaxial self-assembly. Graphoepitaxy morphology composed of highly aligned lamellar block copolymer film that self-assembled within a disposable photoresist trench pattern was prepared by conventional I-line lithography and utilized as a chemical nanopatterning mask for the underlying substrate. After the block copolymer film and disposable photoresist layer were removed, the same lamellar block copolymer film was epitaxially assembled on the exposed chemically patterned substrate. Highly oriented lamellar morphology was attained without any trace of structure directing the photoresist pattern over an arbitrarily large area.

102 citations

Book
01 Jan 2003
TL;DR: In this paper, the authors proposed a method for nano-imprinting of point contacts using point contacts and stamp imprinting, which can be seen as a step-and-match approach.
Abstract: 1. Alternative Lithography.- 1.1 Introduction.- 1.2 Moulding polymers in the nanometer scale.- 1.3 Microcontact printing.- 1.4 Scanning probe aproaches.- 1.5 Applications.- 1.6 Recent nanofabrication experiments.- 1.7 Status and perspectives.- 2. Nanoimprint Lithography.- 2.1 Introduction.- 2.2 Nanoimprint lithography (NIL) Principle and process.- 2.3 Resolution.- 2.4 3-D patterning.- 2.5 Imprint over non-flat surfaces.- 2.6 Uniformity and submicron alignment over 4 inch wafers.- 2.7 Different imprint machines.- 2.8 Applications.- 2.9 Summary and future.- 3. Viscoelastic Properties of Polymers.- 3.1 Introduction.- 3.2 Squeezing flow of a Newtonian liquid in HEL.- 3.3 Viscoelastic properties of polymers.- 4. Nanorheology.- 4.1 Introduction.- 4.2 Basics of thin film rheology.- 4.3 Hot embossing in practice.- 4.4 Looking ahead.- 5. Wafer Scale Nanoimprint Lithography.- 5.1 Introduction.- 5.2 Special requirements for large wafer scale NIL.- 5.3 Fabrication of a nanoimprint lithography system.- 5.4 Nil Equipment design.- 5.5 Imprint processing.- 5.6 Discussion and conclusions.- 6. Step And Stamp Imprint Lithography.- 6.1 Introduction.- 6.2 Step and stamp imprinting lithography.- 6.3 Pattern transfer using step and stamp imprint lithography.- 6.4 Mix and match with UV lithography.- 6.5 Pattern reproduction.- 6.6 Conclusions.- 7. Step and Flash Imprint Lithography.- 7.1 Introduction.- 7.2 Process overview.- 7.3 Template fabrication.- 7.4 Surface treatment.- 7.5 Etch barrier.- 7.6 Reliability.- 7.7 Patterning results.- 8. Using PDMS as a thermocurable resist for a mold assisted imprint process.- 8.1 Introduction.- 8.2 PDMS material.- 8.3 Technological implementation.- 8.4 Results.- 8.5 Conclusions and domains of application.- 9. Molecules for Microcontact Printing.- 9.1 Introduction.- 9.2 Quality of printed SAMs.- 9.3 Microcontact printing of etch resists.- 9.4 Printing functional adsorbates.- 9.5 Printing on other substrates.- 9.6 Microcontact printing in bio-applications.- 9.7 Conclusions.- 10. Microcontact Printing Techniques.- 10.1 Introduction.- 10.2 The self-assembly of alkanethiols.- 10.3 The stamp.- 10.4 Properties of poly(dimethyl siloxane) elastomers.- 10.5 Stamps for microcontact printing.- 10.6 Stamp fabrication.- 10.7 The microcontact printing process.- 10.8 Substrates for microcontact printing.- 10.9 Printing conditions.- 10.10 Chemical etching.- 10.11 Microcontact printing using ultrathin stamps.- 10.12 A multilevel process: Mix and Match with accurate alignment of the RCP.- 11. Local Oxidation Nanolithography.- 11.1 Introduction.- 11.2 Local oxidation modes.- 11.3 Liquid meniscus.- 11.4 Kinetics.- 11.5 Mechanism.- 11.6 Substrates.- 11.7 Resolution.- 11.8 Applications.- 12. Combined Approaches for Nanoelectronic Device Fabrication.- 12.1 Introduction.- 12.2 Fabrication of nanoelectronic devices.- 12.3 Mold fabrication.- 12.4 Alignment.- 12.5 Alternative polymers.- 12.6 Characterization.- 13. Application of Nanoimprint Lithography in Magnetism.- 13.1 Introduction.- 13.2 Physics of patterned magnetic structures.- 13.3 Nanoimprint lithography parameters.- 13.4 Patterned magnetic nanostructures.- 13.5 Conclusion.- 14. Application of Microcontact Printing and Nanoimprint Lithography.- 14.1 Introduction.- 14.2 Process.- 14.3 Nanoimprinting of point contacts.- 15. Optical Applications of Nanoimprint Lithography.- 15.1 Introduction.- 15.2 Candidates for and examples of printed optical devices.- 15.3 Nanoimprint lithography of photonic devices.- 15.4 Outlook and conclusion.- 16. Biotechnology Applications of NIL.- 16.1 Introduction.- 16.2 Introduction to NIL.- 16.3 Biotechnical application areas for NIL.- 16.4 Examples.- 17. Soft Lithography and Imprint-Based Techniques for Microfluidics and Biological Analysis.- 17.1 Introduction.- 17.2 Soft lithography.- 17.3 Imprint-based techniques.- 17.4 Conclusions and perspectives.

102 citations

Journal ArticleDOI
TL;DR: In this paper, the authors show that photolithography at a wavelength of 193 nm in the deep UV with water immersion lenses can now produce microelectronics containing features with a half-pitch as small as 40 nm.
Abstract: Photolithography at a wavelength of 193 nm in the deep UV with water immersion lenses can now produce microelectronics containing features with a half-pitch as small as 40 nm. The big question is how much further can the technology be pushed?

102 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
2023546
20221,116
2021336
2020502
2019612
2018608