Topic
Lithography
About: Lithography is a research topic. Over the lifetime, 23507 publications have been published within this topic receiving 348321 citations.
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TL;DR: Khire et al. as mentioned in this paper used step and flash print lithography to create and surface modification of nanopatterned thiol-ene substrates using step-and-flash imprint lithography.
Abstract: Formation and Surface Modification of Nanopatterned Thiol-ene Substrates using Step and Flash Imprint Lithography Vaibhav S. Khire, 1 Youngwoo Yi, Noel A. Clark, and Christopher N. Bowman Department of Chemical and Biological Engineering, University of Colorado, Boulder, Colorado 80309-0424. 2 Department of Physics and Liquid Crystal Materials Research Center, University of Colorado, Boulder, CO 80309 USA
90 citations
20 Mar 1996
TL;DR: In this article, the authors fabricated arrays of Co dots having diameters of 100 nm and 70 nm using interference lithography and magnetic force microscopy measurements indicate that the Co dots are single-domain with moments that can be controlled to point either inplane or out-of-plane.
Abstract: We have fabricated arrays of Co dots having diameters of 100 nm and 70 nm using interference lithography. The density of these arrays is 7.2/spl times/10/sup 9//in/sup 2/. Magnetic force microscopy measurements indicate that the Co dots are single-domain with moments that can be controlled to point either in-plane or out-of-plane. Interference lithography is a process that is easily scaled to large areas and is potentially capable of high throughput. Large, uniform arrays of single-domain structures are potentially useful for high-density, low-noise data storage.
90 citations
TL;DR: In this paper, the nanofabrication of two-dimensional photonic lattice structures in GaAs/AlGaAs was reported, which comprises a hexagonal array of air cylinders etched into a semiconductor surface with a refractive index contrast of 3.54.
Abstract: The nanofabrication of two‐dimensional photonic lattice structures in GaAs/AlGaAs is reported. The nanofabrication procedure combines direct‐write electron‐beam lithography and reactive‐ion‐beam etching to achieve etched features as small as 50 nm. The lattice comprises a hexagonal array of air cylinders etched into a semiconductor surface with a refractive index contrast of 3.54. A range of air volume fractions from 14% to 84% was investigated. The lithographic, masking, and etching processes necessary to fabricate the lattice are described along with practical limitations to achieving a lattice of arbitrary air volume fraction. Initial results from optical characterization of the lattice are also presented.
90 citations
TL;DR: A new paradigm of far-field optical lithography is introduced, optical force stamping lithography, which employs optical forces exerted by a spatially modulated light field on colloidal nanoparticles to rapidly stamp large arbitrary patterns comprised of single nanoparticles onto a substrate with a single-nanoparticle positioning accuracy well beyond the diffraction limit.
Abstract: Here we introduce a new paradigm of far-field optical lithography, optical force stamping lithography. The approach employs optical forces exerted by a spatially modulated light field on colloidal nanoparticles to rapidly stamp large arbitrary patterns comprised of single nanoparticles onto a substrate with a single-nanoparticle positioning accuracy well beyond the diffraction limit. Because the process is all-optical, the stamping pattern can be changed almost instantly and there is no constraint on the type of nanoparticle or substrates used.
90 citations
TL;DR: A three-dimensional direct-write lithography system capable of writing deeply buried, localized index structures into diffusion-mediated photopolymer, allowing for greater flexibility in the writing media and the ability to use low power, inexpensive, continuous-wave lasers.
Abstract: We demonstrate a three-dimensional direct-write lithography system capable of writing deeply buried, localized index structures into diffusion-mediated photopolymer. The system is similar to that used for femtosecond writing in glass, but has a number of advantages including greater flexibility in the writing media and the ability to use low power, inexpensive, continuous-wave lasers. This system writes index structures both parallel and perpendicular to the writing beam in different types of photopolymers, providing control over the feature size and shape. We demonstrate that this system can be used to create single-mode waveguides that are deeply embedded in the photopolymer medium.
90 citations