Lithography

About: Lithography is a research topic. Over the lifetime, 23507 publications have been published within this topic receiving 348321 citations.

Materials, components, and methods for use with extreme ultraviolet radiation in lithography and other applications

Abstract: Nanostructured photonic materials and associated components for use in devices and systems operating at ultraviolet (UV), extreme ultraviolet (EUV), and/or soft Xray wavelengths are described. Such a material may be fabricated with nanoscale features tailored for a selected wavelength range, such as at particular UV, EUV, or soft Xray wavelengths or wavelength ranges. Such a material may be used to make components such as mirrors, lenses or other optics, panels, lightsources, masks, photoresists, or other components for use in applications such as lithography, wafer patterning, biomedical applications, or other applications.

980-nm DBR lasers using higher order gratings defined by i-line lithography

Abstract: We report on the simultaneous definition and fabrication of Bragg gratings and ridge waveguides using wafer stepper lithography and reactive ion etching, respectively. Single-longitudinal mode emission from two-section ridge-waveguide distributed feedback lasers with sixth and seventh order gratings will be reported. This technology enables a cheap fabrication of wavelength-stabilized lasers and a simple variation of the parameters of the gratings on the wafer using optical lithography.

Parallel Scanning Near-Field Photolithography: The Snomipede.

Abstract: The “Millipede”, developed by Binnig and co-workers (Bining, G. K.; et al. IBM J. Res. Devel. 2000, 44, 323.), elegantly solves the problem of the serial nature of scanning probe lithography processes, by deploying massive parallelism. Here we fuse the “Millipede” concept with scanning near-field photolithography to yield a “Snomipede” that is capable of executing parallel chemical transformations at high resolution over macroscopic areas. Our prototype has sixteen probes that are separately controllable using a methodology that is, in principle, scalable to much larger arrays. Light beams generated by a spatial modulator or a zone plate array are coupled to arrays of cantilever probes with hollow, pyramidal tips. We demonstrate selective photodeprotection of nitrophenylpropyloxycarbonyl-protected aminosiloxane monolayers on silicon dioxide and subsequent growth of nanostructured polymer brushes by atom-transfer radical polymerization, and the fabrication of 70 nm structures in photoresist by a Snomipede probe array immersed under water. Such approaches offer a powerful means of integrating the top-down and bottom-up fabrication paradigms, facilitating the reactive processing of materials at nanometer resolution over macroscopic areas.

Patterning of Solid Surfaces by Photocatalytic Lithography Based on the Remote Oxidation Effect of TiO2

Abstract: A novel technique for solid surface patterning is developed on the basis of the remote oxidation effect of TiO2 photocatalysts. A TiO2-coated quartz plate was faced to a solid substrate, that is, a glass plate modified with an ultrathin organic layer or silicon, copper, or silver plate, separated by a small gap, and the TiO2 was irradiated with UV light in air through a photomask. As a result, two-dimensional images corresponding to the photomask are obtained. Those images are based on the contrasts of nonoxidized to oxidized surfaces.

Microfabrication of complex surface topographies using grey-tone lithography

Abstract: This paper reports on a study of a methodology for fabrication of relief shaped microstructures using technologies common to standard IC manufacturing processes. Particular emphasis is put on the design and use of halftone transmission masks for the lithography step required in the fabrication process of mechanical, optical or electronic components. The design and experimental investigation of grey-tone masks is supported by lithography simulation. Results are presented for both, simulated grey-tone patterns as well as experimental profiles.