Topic
Lithography
About: Lithography is a research topic. Over the lifetime, 23507 publications have been published within this topic receiving 348321 citations.
Papers published on a yearly basis
Papers
More filters
TL;DR: In this article, a template-free strategy to fabricate concave microstructures with high resolution by inkjet imprinting is provided, where a sacrificial ink is inkjet-printed onto a precured viscoelastic surface and imprints its shapes to construct concave structures.
Abstract: Concave microstructures such as microwells and microgrooves are widely utilized in fields such as biochips, microfluidics, and functional devices. Previously, concave microstructure fabrication was mostly based on laser etching or lithography which is either costly or of multisteps. The inkjet etching method is a direct structuring technique, but limited by its inherent transverse ink diffusion that leads to low feature resolution. Nanoimprint lithography can reach submicro and even nano ranges, whereas an elaborate template is needed. Thus, it is still a challenge to realize controllable fabrication of concave microstructures in large areas with high efficiency and resolution. Here, a template-free strategy to fabricate concave microstructures with high resolution by inkjet imprinting is provided. In this method, a sacrificial ink is inkjet-printed onto a precured viscoelastic surface and imprints its shapes to construct concave microstructures. The morphology of the microstructures could be adjusted by controlling the interaction between the two immiscible phases. The microwells/microgrooves could be used to pattern single cells and functional materials such as optical, electronic, and magnetic nanoparticles. These results will open a new pathway to fabricate concave microstructures and broaden their applications in various functional devices.
78 citations
TL;DR: In this paper, three-dimensional periodic quasicrystals exhibiting quasiperiodicity of the Penrose structure in the x-y plane and periodic along the z axis were fabricated using ten-beam visible light holographic lithography.
Abstract: We have fabricated three-dimensional periodic quasicrystals exhibiting quasiperiodicity of the Penrose structure in the x-y plane and periodic along the z axis using ten-beam visible light holographic lithography. The quasicrystals show photonic band gaps in the visible range. The band gaps are found to follow a simple relation as a function of periodicity and polymeric volume fraction, in accord with the Bragg’s diffraction relation.
78 citations
TL;DR: In this paper, a fine Si-based mold is fabricated by a conventional VLSI process and the mold is directly pressed to a thin glass plate using a hot-press machine, the imprint conditions are designed based on the measured visco-elastic properties of the glass.
78 citations
03 Nov 2003
TL;DR: In this paper, the authors used direct-write electron-beam lithography to produce concave and concave diffraction gratings for co-ncentric imaging spectrometer forms.
Abstract: Convex and concave diffraction gratings are required for co ncentric imaging spectrometer forms. Direct-write electron-beam lithography has proven to be an effective method for fabricating high-efficiency blazed gratings on non-flat substrates. Recently fabricated convex gratings have demonstr ated relative efficiency greater than 90%, diffuse scatter and ghosts less than 5x10 -4 of the main diffraction order, and zeroth-order wavefront error less than ¼-wave at 633 nm. Such gratings can be fabricated on JPLs JEOL JBX-9300FS electron-beam lithography system with a writing speed of approximately 1 to 2 cm 2 per hour. The technique was recently used to fabricate flight-qualified gratings for the Compact Reconnaissance Imaging Spectrometer for Mars (CRISM) instrument that is scheduled to fly on the NASA Mars Reconnaissance Orbiter in 2005. Keywords: electron-beam lithography, diffractio n gratings, imaging spectrometers 1. INTRODUCTION Concentric imaging spectrometer forms have become popular in recent years owing to their compact size and high-performance.
78 citations
TL;DR: The Ag2Se/GeSe inorganic photoresist system has been used to produce submicron features by optical lithography as discussed by the authors, which is a practical process incorporating this material is the inorganic resist/polymer bilevel scheme.
Abstract: The Ag2Se/GeSe inorganic photoresist system has been used to produce submicron features by optical lithography. A practical process incorporating this material is the inorganic resist/polymer bilevel scheme. The successful printing of 0.5 μm lines and spaces is explained by the existence of an ’’edge sharpening’’ effect which accompanies the photo‐doping process. Conventionally accepted limitations of photolithography are circumvented by the Ag2Se/GeSe resist, whose properties also include high contrast, resistance to O2 plasma, and high absorbance of UV light.
78 citations