Topic
Lithography
About: Lithography is a research topic. Over the lifetime, 23507 publications have been published within this topic receiving 348321 citations.
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TL;DR: In this paper, the authors used interferometric lithography to fabricate arrays of cobalt and nickel pillars with periods of 200 nm over areas of 5 cm/spl times/5 cm using a UV laser.
Abstract: Patterned arrays of magnetic elements may be useful as media for high density magnetic storage applications. Interferometric lithography has been used to fabricate arrays of cobalt and nickel pillars with periods of 200 nm over areas of 5 cm/spl times/5 cm using a UV laser. This provides an economical and rapid method for manufacturing particle arrays.
75 citations
Patent•
04 Mar 1991
TL;DR: In this paper, a method for a raster scan particle or light beam lithography system for writing in multiple passes interleaved in such a manner as to achieve a composite result nearly identical to normal single-pass writing with overlapped spots is presented.
Abstract: A method for a raster scan particle or light beam lithography system for writing in multiple passes interleaved in such a manner as to achieve a composite result nearly identical to normal single pass raster scan writing with overlapped spots. Multiple pass writing, achieved with little or no degradation or throughput or lithography quality, provides an ideal platform for implementation of known image averaging techniques to improve lithography quality. This technique is combined with the known writing technique of "Virtual Addressing" to improve resolution with little or no degradation of throughput.
75 citations
TL;DR: Large number density Pt nanowires with typical dimensions of 12 microm x 20 nm x 5 nm (length x width x height) are fabricated on planar oxide supports by size reduction lithography and the Si nanowire pattern is replicated to produce a large number of Pt Nanowires by nanoimprint lithography.
Abstract: Large number density Pt nanowires with typical dimensions of 12 microm x 20 nm x 5 nm (length x width x height) are fabricated on planar oxide supports. First sub-20 nm single crystalline silicon nanowires are fabricated by size reduction lithography, and then the Si nanowire pattern is replicated to produce a large number of Pt nanowires by nanoimprint lithography. The width and height of the Pt nanowires are uniform and are controlled with nanometer precision. The nanowire number density is 4 x 10(4) cm(-1), resulting in a Pt surface area larger than 2 cm(2) on a 5 x 5 cm(2) oxide substrate. Bimodal nanowires with different width have been generated by using a Pt shadow deposition technique. Using this technique, alternating 10 and 19 nm wide nanowires are produced.
75 citations
TL;DR: In this paper, a subwavelength aluminum (Al) gratings with a period of 200nm using nanoimprint lithography and reactive ion etching (RIE) were demonstrated using the etch mask formed by NIL.
75 citations
TL;DR: In this article, optical and thermal effects are simultaneously used in this process to induce a phase change in a liquid resin, which can be used to write 3D shapes or patterns, such objects or patterns can involve macroscopic engineering prototypes through to nanostructures for exploitation in waveguiding and photonic crystals.
Abstract: A new fabrication process for rapid prototyping is proposed in this paper. Optical and thermal effects are simultaneously used in this process to locally induce a phase change in a liquid resin. This phase change phenomena is used to “write” three‐dimensional shapes or patterns. Such objects or patterns can involve macroscopic engineering prototypes through to nanostructures for exploitation in waveguiding and photonic crystals. Several advantages can be achieved through this new process, in terms of accuracy, cost and time.
75 citations