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Lithography

About: Lithography is a research topic. Over the lifetime, 23507 publications have been published within this topic receiving 348321 citations.


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Journal ArticleDOI
TL;DR: The method presented will enable studies on magnetic bits packed at ultra-high densities, and can be combined with other scalable patterning methods such as templated self-assembly and nanoimprint lithography for high-volume manufacturing.
Abstract: We fabricated bit-patterned media (BPM) at densities as high as 3.3 Tbit/in(2) using a process consisting of high-resolution electron-beam lithography followed directly by magnetic film deposition. By avoiding pattern transfer processes such as etching and liftoff that inherently reduce pattern fidelity, the resolution of the final pattern was kept close to that of the lithographic step. Magnetic force microscopy (MFM) showed magnetic isolation of the patterned bits at 1.9 Tbit/in(2), which was close to the resolution limit of the MFM. The method presented will enable studies on magnetic bits packed at ultra-high densities, and can be combined with other scalable patterning methods such as templated self-assembly and nanoimprint lithography for high-volume manufacturing.

74 citations

Journal ArticleDOI
TL;DR: In this paper, the authors present current status, future directions and potential applications of these microcolumns, as well as a detailed review of the current and future applications of micro-columns.

74 citations

Journal ArticleDOI
TL;DR: In this paper, a shape memory polymer (SMP) photoresist based on Vero Clear achieving print features at a resolution of ~300nm half pitch using two-photon polymerization lithography (TPL).
Abstract: Four-dimensional (4D) printing of shape memory polymer (SMP) imparts time responsive properties to 3D structures. Here, we explore 4D printing of a SMP in the submicron length scale, extending its applications to nanophononics. We report a new SMP photoresist based on Vero Clear achieving print features at a resolution of ~300 nm half pitch using two-photon polymerization lithography (TPL). Prints consisting of grids with size-tunable multi-colours enabled the study of shape memory effects to achieve large visual shifts through nanoscale structure deformation. As the nanostructures are flattened, the colours and printed information become invisible. Remarkably, the shape memory effect recovers the original surface morphology of the nanostructures along with its structural colour within seconds of heating above its glass transition temperature. The high-resolution printing and excellent reversibility in both microtopography and optical properties promises a platform for temperature-sensitive labels, information hiding for anti-counterfeiting, and tunable photonic devices. Four-dimensional (4D) printing of shape memory polymer (SMP) imparts time responsive properties to 3D structures. Here, the authors explore 4D printing of a SMP in the submicron length scale, extending its applications to nanophononics.

74 citations

Journal ArticleDOI
TL;DR: This paper discusses some new approaches which seem to offer solutions to problems associated with earlier systems in projection electron‐beam lithography.
Abstract: Projection electron‐beam lithography is potentially one of the most attractive techniques available. It offers high resolution, high throughput, and good overlay and registration characteristics. In this paper we discuss some new approaches which seem to offer solutions to problems associated with earlier systems.

74 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
2023546
20221,116
2021336
2020502
2019612
2018608