Lithography

About: Lithography is a research topic. Over the lifetime, 23507 publications have been published within this topic receiving 348321 citations.

Nanoimprint lithography for the manufacturing of flexible electronics

Abstract: Flexible electronics have received considerable attention in academies and industries for their promising applications in enormous fields, such as flexible displays, wearable sensors, artificial skins, and flexible energy devices. Challenges remain in developing a flexible and scalable manufacturing method to facilitate the fabrication of multi-functional structures in a flexible electronic system. Nanoimprint lithography is a high resolution and low-cost approach to fabricate nanostructures over a large area. This paper reviews recent progress of nanoimprint lithography and its applications in flexible electronics. The basic principles, classification, research focus, and critical issues of nanoimprint lithography are elaborated. Then, the advantages of nanoimprint lithography are demonstrated in several typical applications related to flexible electronics, including conductive films, optoelectronic devices, flexible sensors, energy harvesting and storage devices, and bioinspired electronic devices. Finally, the challenges and perspectives of nanoimprint lithography in flexible electronic systems are discussed.

Two-photon Lithography for 3D Magnetic Nanostructure Fabrication

Abstract: Ferromagnetic materials have been utilised as recording media within data storage devices for many decades. Confinement of the material to a two dimensional plane is a significant bottleneck in achieving ultra-high recording densities and this has led to the proposition of three dimensional (3D) racetrack memories that utilise domain wall propagation along nanowires. However, the fabrication of 3D magnetic nanostructures of complex geometry is highly challenging and not easily achievable with standard lithography techniques. Here, by using a combination of two-photon lithography and electrochemical deposition, we show a new approach to construct 3D magnetic nanostructures of complex geometry. The magnetic properties are found to be intimately related to the 3D geometry of the structure and magnetic imaging experiments provide evidence of domain wall pinning at a 3D nanostructured junction.

General aspheric refractive micro‐optics fabricated by optical lithography using a high energy beam sensitive glass gray‐level mask

Abstract: General aspheric refractive microlens arrays with an almost 100% fill factor are useful in a wide range of applications ranging from display, optoelectronic interconnections, or improving the efficiency of detector arrays to lithography techniques utilizing microlens arrays. In this article a technique will be discussed which allows the microlithographic fabrication of general aspheric non rotationally symmetric refractive lenses with a 100% fill factor. A gray‐level mask based on high energy beam sensitive (HEBS) glass is used to pattern a thick (4–5 micron) photoresist layer. After development, the refractive structure is transferred into the substrate material using a chemically assisted ion beam etching (CAIBE) process. The HEBS‐glass gray‐level mask is generated by a electron‐beam writer, allowing for complete freedom in terms of the shape and location of the lenses.

Original film for lithographic printing plate, method of making lithographic printing plate using the same and method of printing

Abstract: PROBLEM TO BE SOLVED: To provide an original film for a lithographic printing plate having excellent on-press developability and high sensitivity, showing high plate wear and being excellent in scumming properties (ink clearing properties) in printing, a method of making the lithographic printing plate using the same and a method of printing. SOLUTION: The original film has a hydrophilic layer and a heat-sensitive layer containing microcapsules each containing a compound having a thermally reactive functional group, in this sequence, on a plastic film substrate. The film is subjected to image exposure by laser light and mounted, as it is, on a press to be subjected to printing. In another way, the film is subjected to the image exposure on the press by the laser light after it is mounted thereon, and subjected to printing as it is.

Fabrication of 100 nm metal lines on flexible plastic substrate using ultraviolet curing nanoimprint lithography

Abstract: Since polymer is flexible, lightweight, reliable and transparent and its material properties can easily be modified, it is a suitable substrate material for organic electronic devices, biomedical devices, and especially for flexible displays. To build a nano-device on a polymer substrate, nano to microsized patterning must be done. However, conventional photolithography cannot be used to fabricate patterns on flexible polymer substrate, due to the focusing and substrate handling issue associated with flexibility of polymer substrate and potential interaction between polymer and developer or other organic solvents used in photolithography. Degradation of polymer substrate during resist baking process over 120°C can be another problem. In this study, 100nm sized resist patterns were made on flexible polyethylene-terephthalate (PET) film using newly developed monomer based UV curing imprinting lithography. Compared to conventional imprint lithography, UV curing imprint lithography uses monomer based liquid p...