Topic
Lithography
About: Lithography is a research topic. Over the lifetime, 23507 publications have been published within this topic receiving 348321 citations.
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296 citations
TL;DR: In this article, a single molecular monolayer of bistable rotaxanes sandwiched between two 40-nm metal electrodes was fabricated using imprint lithography, and it was observed that it has high on-off ratios and reversible switching properties.
Abstract: Nanoscale molecular-electronic devices comprising a single molecular monolayer of bistable [2]rotaxanes sandwiched between two 40-nm metal electrodes were fabricated using imprint lithography. Bistable current–voltage characteristics with high on–off ratios and reversible switching properties were observed. Such devices may function as basic elements for future ultradense electronic circuitry.
296 citations
TL;DR: The recent developments on large-scale, multiple-functional-layer metamaterials are discussed in detail, and alternative methods for 3D fabrication of complex structures are mentioned.
293 citations
TL;DR: In this article, the authors report on the fabrication of short-channel polymer organic thin-film transistors (OTFTs) using nano-imprint lithography, and the performance of these devices was studied as the channel length was reduced.
Abstract: We report on the fabrication of short-channel polymer organic thin-film transistors (OTFTs) using nanoimprint lithography. Currently, there is significant interest in OTFTs due to their potential application in inexpensive, large-area electronics. However, polymer carrier mobilities are typically poor, and thus to increase the OTFT drive current per unit area, there is a need for short-channel devices. We have fabricated working devices with channel lengths from 1 μm down to 70 nm with high yields. The performance of these devices was studied as the channel length was reduced. We find that drive current density increases as expected, while the on/off current ratio remains 104. However, at short-channel lengths, OTFTs no longer saturate due to space charge limiting current effects.
292 citations
TL;DR: This work compared the atomic force microscopy, ellipsometry, reflection-absorption infrared spectroscopy, and contact angle results collected from substrates treated by two different application processes and found that the vapor-phase process was superior.
Abstract: Resist adhesion to the mold is one of the challenges for nanoimprint lithography. The main approach to overcoming it is to apply a self-assembled monolayer of an organosilane release agent to the mold surface, either in the solution phase or vapor phase. We compared the atomic force microscopy, ellipsometry, reflection−absorption infrared spectroscopy, and contact angle results collected from substrates treated by two different application processes and found that the vapor-phase process was superior. The vapor-treated substrates had fewer aggregates of the silane molecules on the surface, because the lower density of the agent in the vapor phase was not conducive to aggregation formation, and received a superior coating of the releasing agent, because the vapor was more effective than the solution in penetrating into the nanoscale gaps of the mold. A pattern transfer of 20 parallel nanowires with a line width of 40 nm at 100 nm pitch-size was performed faithfully with the vapor-treated mold without any r...
291 citations