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Lithography

About: Lithography is a research topic. Over the lifetime, 23507 publications have been published within this topic receiving 348321 citations.


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Journal ArticleDOI
TL;DR: In this paper, a 1 in. diameter curved surface with a 46 mm radius of curvature was demonstrated with step and flash imprint lithography (SFIL) using templates patterned by ion beam proximity printing (IBP).
Abstract: Submicron patterning of 1 in. diameter curved surfaces with a 46 mm radius of curvature has been demonstrated with step and flash imprint lithography (SFIL) using templates patterned by ion beam proximity printing (IBP). Concave and convex spherical quartz templates were coated with 700-nm-thick poly(methylmethacrylate) (PMMA) and patterned by step-and-repeat IBP. The developed resist features were etched into the quartz template and the remaining PMMA stripped. During SFIL, a low viscosity, photopolymerizable formulation containing organosilicon precursors was introduced into the gap between the etched template and a substrate coated with an organic transfer layer and exposed to ultraviolet illumination. The smallest features on the templates were faithfully replicated in the silylated layer.

202 citations

Journal ArticleDOI
TL;DR: In this article, the authors used a modular micromachined parallel atomic force microscope array in conjunction with large displacement scanners for high-resolution microscopy and lithography over large areas.
Abstract: We present a 4 mm2 image taken with a parallel array of 10 cantilevers, an image spanning 6.4 mm taken with 32 cantilevers, and lithography over a 100 mm2 area using an array of 50 cantilevers. All of these results represent scan areas that are orders of magnitude larger than that of a typical atomic force microscope (0.01 mm2). Previously, the serial nature and limited scan size of the atomic force microscope prevented large scale imaging. Our design addresses these issues by using a modular micromachined parallel atomic force microscope array in conjunction with large displacement scanners. High-resolution microscopy and lithography over large areas are important for many applications, but especially in microelectronics, where integrated circuit chips typically have nanometer scale features distributed over square centimeter areas.

201 citations

Journal ArticleDOI
TL;DR: This critical review summarizes recent developments in the fabrication of patterned polymer brushes as top-down lithography reaches the length scale of a single macromolecule and the combination with the bottom-up synthesis of polymer brushes by surface-initiated polymerization becomes one main avenue to design new materials for nanotechnology.
Abstract: This critical review summarizes recent developments in the fabrication of patterned polymer brushes. As top-down lithography reaches the length scale of a single macromolecule, the combination with the bottom-up synthesis of polymer brushes by surface-initiated polymerization becomes one main avenue to design new materials for nanotechnology. Recent developments in surface-initiated polymerizations are highlighted along with diverse strategies to create patterned polymer brushes on all length scales based on irradiation (photo- and interference lithography, electron-beam lithography), mechanical contact (scanning probe lithography, soft lithography, nanoimprinting lithography) and on surface forces (capillary force lithography, colloidal lithography, Langmuir–Blodgett lithography) (116 references).

201 citations

Book
31 Dec 1994
TL;DR: In this article, the authors present an overview of the chemical-physical deposition processes of semiconductor materials. But they do not discuss their application in contact and interconnect technology, as they do in this paper.
Abstract: 1: Semiconductor Crystals. 1.1. Crystals and Crystallographic Orientations. 1.2. The Silicon Crystal. 1.3. Wafer Preparation. 1.4. Compound Semiconductors. 2: Thermal Oxidation and Nitridation. 2.1. SiO2 and SiO2-Si Interface. 2.2. Thermal Oxidation. 3: Thin Film Deposition. 3.1. Chemical Vapor Deposition. 3.2. Chemical-Physical Deposition Processes. 3.3. Physical-Vapor Deposition. 4: Lithography. 4.1. Optical Lithography. 4.2. Resolution Enhancement Techniques. 4.3. Electron-Beam Lithography. 4.4. X-Ray Lithography. 4.5. Ion-Beam Lithography. 5: Contamination Control and Etch. 5.1. Clean Processes. 5.2. Etching. 6: Ion Implantation. 6.1. Principle of Operation. 6.2. Energy Loss and Range Distribution. 6.3. Crystal Damage and Dopant Activity. 7: Diffusion. 7.1. Point Defects. 7.2. Fick's Laws. 7.3. Non-Constant Diffusivity. 7.4. Diffusion in Polysilicon. 7.5. Diffusion in Insulators. 7.6. Diffusion Sources. 7.7. Gettering in Silicon. 8: Contact and Interconnect Technology. 8.1. Contact Metallurgy. 8.2. Poly-Metal Dielectrics. 8.3. Metal Interconnects. 8.4. Inter-Level Dielectrics. 8.5. Multi-Level Metals. 8.6. Reliability Considerations. Subject Index.

200 citations

Journal ArticleDOI
TL;DR: A new form of edge lithography, edge spreading lithography (ESL), has been demonstrated and applied to the formation of coinage metal rings, forming highly ordered SAMs in the form of a ring pattern.
Abstract: A new form of edge lithography, edge spreading lithography (ESL), has been demonstrated and applied to the formation of coinage metal rings. In this process, alkanethiols are delivered from a flat PDMS stamp to the surface of a metal film through a two-dimensional array of spherical silica colloids. The thiols further spread on the metal surface, forming highly ordered SAMs in the form of a ring pattern. Following lift-off of beads, the pattern in the SAMs can be transferred into the metal film through wet chemical etching, with SAMs serving as the resist. The dimensions of the rings can be readily controlled by several parameters such as the beads diameter, the concentration of the thiol solution, and the contact time between the stamp and the silica beads.

200 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
2023546
20221,116
2021336
2020502
2019612
2018608