Topic
Lithography
About: Lithography is a research topic. Over the lifetime, 23507 publications have been published within this topic receiving 348321 citations.
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TL;DR: In this paper, the authors describe the fabrication of three-dimensional photonic crystals using a reproducible and reliable procedure consisting of electron beam lithography followed by a sequence of dry etching steps.
Abstract: We describe the fabrication of three-dimensional photonic crystals using a reproducible and reliable procedure consisting of electron beam lithography followed by a sequence of dry etching steps. Careful fabrication has enabled us to define photonic crystals with 280 nm holes defined with 350 nm center to center spacings in GaAsP and GaAs epilayers. We construct these photonic crystals by transferring a submicron pattern of holes from 70-nm-thick polymethylmethacrylate resist layers into 300-nm-thick silicon dioxide ion etch masks, and then anisotropically angle etching the III-V semiconductor material using this mask. Here, we show the procedure used to generate photonic crystals with up to four lattice periods depth.
179 citations
TL;DR: In this article, a soft lithographic approach for fabricating low-cost, low-loss microlens arrays is described, where an accurate negative reproduction (stamp) of an existing high-quality lens surface (master) is made by thermally curing a prepolymer to a silicone elastomer against the master.
Abstract: This letter describes a soft lithographic approach for fabricating low-cost, low-loss microlens arrays. An accurate negative reproduction (stamp) of an existing high-quality lens surface (master) is made by thermally curing a prepolymer to a silicone elastomer against the master. Fabricating the stamp on a rigid backing plate minimizes distortion of its surface relief. Dispensing a liquid photocurable epoxy loaded to high weight percent with functionalized silica nanoparticles into the features of relief on the mold and then curing this material with UV radiation against a quartz substrate generates a replica lens array. The physical and optical characteristics of the resulting lenses suggest that the approach will be suitable for a range of applications in micro and integrated optics.
178 citations
TL;DR: In this article, a solid immersion lens (SIL) was used to focus a laser beam (λ =442 nm) in a photoresist, which was mounted on a flexible cantilever and scanned by a modified commercial atomic force microscope.
Abstract: We have exposed 190 nm lines in photoresist by focusing a laser beam (λ=442 nm) in a solid immersion lens (SIL) that is mounted on a flexible cantilever and scanned by a modified commercial atomic force microscope. The scan rate was 1 cm/s, which is several orders of magnitude faster than typical reports of near-field lithography using tapered optical fibers. The enhanced speed is a result of the high optical efficiency (about 10−1) of the SIL. Once exposed with the SIL, the photoresist was developed and the pattern was transferred to the silicon substrate by plasma etching.
178 citations
TL;DR: In this paper, photoluminescence from single silicon quantum dots have been recorded and spectrally resolved at room temperature using electron-beam lithography and spectroscopy.
Abstract: Photoluminescence (PL) from single silicon quantum dots have been recorded and spectrally resolved at room temperature. The Si nanocrystals (NCs) were fabricated using electron-beam lithography and ...
177 citations
TL;DR: In this article, a new approach for the realization of true 3D polymer structures is presented, which consists in adding, in a post-processing microstereolithography step, threeD polymer microstructures on top of a micropart patterned by means of planar processes such as thin films, bulk silicon etching or high aspect ratio structuration (LIGA, RIE, thick resist).
Abstract: A new approach for the realization of true 3D polymer structures is presented in this paper. It consists in adding, in a post-processing microstereolithography step, 3D polymer microstructures on top of a micropart patterned by means of planar processes such as thin films, bulk silicon etching or high aspect ratio structuration (LIGA, RIE, thick resist). In this way, some shape limitations of the planar technologies can be overcome for new functional applications. Moreover, the direct processing of microstereolithography on predefined structures eliminates manipulations which are associated with micro-assembly of separated parts. To demonstrate this combination of microstructuration processes, an example showing a conical axle added by microstereolithography on a SU-8 piece of gearing is presented.
176 citations