scispace - formally typeset
Search or ask a question
Topic

Lithography

About: Lithography is a research topic. Over the lifetime, 23507 publications have been published within this topic receiving 348321 citations.


Papers
More filters
Journal ArticleDOI
TL;DR: In this paper, the authors investigated the use of deep reactive ion etching (DRIE) and the tailoring of etch selectivity for precise fabrication and found that the non-uniformity and surface roughness characteristics are scaled by the etch selectsivity when the 3D profile is transferred into the silicon.
Abstract: Micromachining arbitrary 3D silicon structures for micro-electromechanical systems can be accomplished using gray-scale lithography along with dry anisotropic etching. In this study, we have investigated the use of deep reactive ion etching (DRIE) and the tailoring of etch selectivity for precise fabrication. Silicon loading, the introduction of an O 2 step, wafer electrode power, and wafer temperature are evaluated and determined to be effective for coarsely controlling etch selectivity in DRIE. The non-uniformity and surface roughness characteristics are evaluated and found to be scaled by the etch selectivity when the 3D profile is transferred into the silicon. A micro-compressor is demonstrated using gray-scale lithography and DRIE showing that etch selectivity can be successfully tailored for a specific application. © 2004 Elsevier B.V. All rights reserved.

171 citations

Journal ArticleDOI
TL;DR: In this paper, single-wall carbon nanotubes (SWNTs) suspended in an aqueous solution have been placed selectively between two metal electrodes separated by a few tens of nanometers.
Abstract: Single-wall carbon nanotubes (SWNTs) suspended in an aqueous solution have been placed selectively between two metal electrodes separated by a few tens of nanometers. After the initial patterning of the metal electrodes by electron beam lithography, no further fine-line lithography steps are necessary to achieve directed placement of SWNTs at these dimensions. An ac bias is applied between the two electrodes and the “nanoscale wiring” is completed within seconds. An additional advantage of using ac bias is the enhancement for selectively placing SWNTs between the electrode gap over competing contaminant species in the solution.

171 citations

Patent
22 May 2006
TL;DR: In this article, a photopolymerizable photosensitive layer on a support is proposed to provide a lithographic printing original plate which does not require overcoat layer, causes no blocking phenomenon between plates, does not have problem with storage stability under high temperature and high humidity conditions, and excels in dot reproducibility and printing durability.
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic printing original plate which has a photopolymerizable photosensitive layer on a support, does not require overcoat layer, causes no blocking phenomenon between plates, does not have problem with storage stability under high temperature and high humidity conditions, and excels in dot reproducibility and printing durability. SOLUTION: The lithographic printing original plate has the photopolymerizable photosensitive layer on the support, wherein the lithographic printing original plate contains two or more matting agents that are different in the particle diameter in the photosensitive layer. COPYRIGHT: (C)2008,JPO&INPIT

171 citations

Journal ArticleDOI
TL;DR: In this paper, a photolithography-based method capable of size reduction to produce sub-10nm Si nanowire arrays on a wafer scale is described, by conformally depositing a material (silicon oxide or silicon) that...
Abstract: A photolithography-based method capable of size reduction to produce sub-10-nm Si nanowire arrays on a wafer scale is described. By conformally depositing a material (silicon oxide or silicon) that...

171 citations

Journal ArticleDOI
TL;DR: In this paper, an array of nickel posts was used as magnetic elements in a microfiltration device that is compatible with microfluidic systems, and they were magnetized by a magnetic field from an external, permanent, neodymium-iron-boron magnet.
Abstract: Arrays of nickel posts were used as magnetic elements in a microfiltration device that is compatible with microfluidic systems. The combination of microtransfer molding—a soft lithography technique—and electrodeposition generated nickel posts ∼7 μm in height and ∼15 μm in diameter inside a microfluidic channel. Once magnetized by a magnetic field from an external, permanent, neodymium–iron–boron magnet, these nickel posts generated strong magnetic field gradients and efficiently trapped superparamagnetic beads moving past them in a flowing stream of water. These nickel post arrays were also used to separate magnetic beads from nonmagnetic beads.

171 citations


Network Information
Related Topics (5)
Silicon
196K papers, 3M citations
90% related
Thin film
275.5K papers, 4.5M citations
89% related
Quantum dot
76.7K papers, 1.9M citations
85% related
Photoluminescence
83.4K papers, 1.8M citations
85% related
Carbon nanotube
109K papers, 3.6M citations
84% related
Performance
Metrics
No. of papers in the topic in previous years
YearPapers
2023546
20221,116
2021336
2020502
2019612
2018608